A multi-beam writing method includes performing the k-th tracking control (k being a natural number) by beam deflection in order to follow movement of the stage while collecting each beam of multiple beams, performing a plurality of shots of the multiple beams by the each beam simultaneously shifting in a rectangular or square irradiation region, which is surrounded by the size of the beam pitch and corresponding to the each beam, while performing the k-th tracking control, and returning, after the period of the k-th tracking control has passed, the tracking position to a position which is obtained by adding an offset of an integer multiple of the size of the beam pitch to the tracking starting position of the k-th tracking control where the k-th tracking control started, to be as a starting position of the (k+1)th tracking control.

Charged particle systems and methods for processing a sample using a multi-beam of charged particles are disclosed. In one arrangement, a column directs a multi-beam of sub-beams of charged particles onto a sample surface of a sample. A sample is moved in a direction parallel to a first direction while the column is used to repeatedly scan the multi-beam over the sample surface in a direction parallel to a second direction. An elongate region on the sample surface is thus processed with each sub-beam. The sample is displaced in a direction oblique or perpendicular to the first direction. The process is repeated to process further elongate regions with each sub-beam. The resulting plurality of processed elongate regions define a sub-beam processed area for each sub-beam.

A method of method of operating a multibeamlet charged particle device is disclosed. In the method, a target attached to a stage is translated, and each step of selecting beamlets, initializing beamlets, and exposing the target is repeated. The step of selecting beamlets includes passing a reconfigurable plurality of selected beamlets through the blanking circuit. The step of initializing beamlets includes pointing each of the selected beamlets in an initial direction. The step of exposing the target includes scanning each of the selected beamlets from the initial direction to a final direction, and irradiating a plurality of regions of the target on the stage with the selected beamlets.

In one embodiment, a charged particle beam writing method is for writing a pattern in a writing area on a substrate by irradiating a charged particle beam onto the substrate while moving the substrate to write stripes sequentially, each of the stripes having a width W and shapes obtained by dividing the writing area by the width W. The method includes performing S times (S is an integer greater than or equal to two) strokes, each of the strokes which is a process writing the stripes in a multiplicity of 2n (n is an integer greater than or equal to one) while shifting a reference point of each of the stripes in the width direction by a preset stripe shift amount and changing a moving direction of the substrate for each of the stripes, and writing while the reference point of the stripes in the each of the strokes in the width direction of the stripes is shifted by a preset stroke shift amount in each of the strokes.

A multi-beam writing method includes acquiring a plurality of deflection coordinates for deflecting a beam to each of a plurality of pixels which are in each beam pitch region of a plurality of beam pitch regions, a number of pixels to be exposed by a beam in the each beam pitch region during each of tracking control period performed such that the multiple beams collectively follow a movement of a stage, and a deflection movement amount of the multiple beams at a time of tracking reset for resetting a tracking starting position after each of the tracking control period has passed; and generating a deflection sequence defined using the plurality of deflection coordinates, the number of pixels to be exposed during each of the tracking control period, and the deflection movement amount of the multiple beams at the time of tracking reset.

A method of method of operating a multibeamlet charged particle device is disclosed. In the method, a target attached to a stage is translated, and each step of selecting beamlets, initializing beamlets, and exposing the target is repeated. The step of selecting beamlets includes passing a reconfigurable plurality of selected beamlets through the blanking circuit. The step of initializing beamlets includes pointing each of the selected beamlets in an initial direction. The step of exposing the target includes scanning each of the selected beamlets from the initial direction to a final direction, and irradiating a plurality of regions of the target on the stage with the selected beamlets.

A multiple charged particle writing method includes performing a tracking operation by shifting the main deflection position of multiple beams using charged particle beams in the direction of stage movement so that the main deflection position of the multiple beams follows the stage movement while a predetermined number of beam shots of the multiple beams are performed, and shifting the sub deflection position of the multiple beams so that each beam of the multiple beams straddles rectangular regions among plural rectangular regions obtained by dividing a writing region of a target object into meshes by the pitch size between beams of the multiple beams, and the each beam is applied to a different position in each of the rectangular regions straddled, and applying a predetermined number of shots per beam using plural beams in the multiple beams to each of the plural rectangular regions, during the tracking operation.

A multiple electron beam irradiation apparatus includes a first region setting circuit which sets a first frame region of a plurality of first frame regions which can be irradiated with remaining beams after excluding beams in one row and one column at end; a second region setting circuit which sets a second frame region of a plurality of second frame regions each having four corners equivalent to an irradiation position of the defective beam by using normal beams; and an electron beam irradiation mechanism which performs the first multiple electron beam irradiation processing for the each of the plurality of first frame regions of the target object by using the normal beams, and perform second multiple electron beam irradiation processing for each of the plurality of second frame regions by using at least beams at the four corners.

A multi-beam writing method includes performing the k-th tracking control (k being a natural number) by beam deflection in order to follow movement of the stage while collecting each beam of multiple beams, performing a plurality of shots of the multiple beams by the each beam simultaneously shifting in a rectangular or square irradiation region, which is surrounded by the size of the beam pitch and corresponding to the each beam, while performing the k-th tracking control, and returning, after the period of the k-th tracking control has passed, the tracking position to a position which is obtained by adding an offset of an integer multiple of the size of the beam pitch to the tracking starting position of the k-th tracking control where the k-th tracking control started, to be as a starting position of the (k+1)th tracking control.

A blanking deflector includes a first electrode being plate-like, a second electrode electrically separated from the first electrode, and arranged such that a first space is formed between the first and second electrodes, and a third electrode electrically separated from the first electrode, and arranged such that a second space, sufficiently wider than the first space, is formed between the first and third electrodes, wherein a transmission line, in which the second and third electrodes are electrically connected at, at least, input and output sides, is formed by the first, second, and third electrodes, multi-beams of a charged particle beam are made to pass through the second space between the first and third electrodes, and the multi-beams are deflected for blanking control by a voltage signal applied from the input side to between the first electrode, and a connected group of the second and third electrodes electrically connected.