H01L21/4807

SEMICONDUCTOR APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS

A semiconductor apparatus includes: a base plate; an insulating circuit board including a ceramic substrate, a circuit pattern formed on an upper surface of the ceramic substrate, a metal layer formed on a lower surface of the ceramic substrate and fixed on an upper surface of the base plate with a first joint material; a semiconductor device having a first surface fixed on the circuit pattern with a second joint material and a second surface which is an opposite surface of the first surface; a lead frame fixed on the second surface with a third joint material; and a case fixed to an outer edge portion of the base plate and enclosing the semiconductor device, wherein restoring force acts on the insulating circuit board in a direction of warpage that is convex upward, and restoring force acts on the base plate in a direction of warpage that is convex downward.

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

A semiconductor device includes an insulating substrate and a semiconductor element. The insulating substrate includes an insulating layer and a front surface circuit pattern disposed on a surface of the insulating layer. The semiconductor element is bonded to a mount of a surface of the front surface circuit pattern via solder. A groove is provided in a region including a portion of the mount.

High Dielectric Constant Carrier Based Packaging with Enhanced WG Matching for 5G and 6G Applications
20230207498 · 2023-06-29 · ·

A wafer-scale die packaging device is fabricated by providing a high-k glass carrier substrate having a ceramic region which includes a defined waveguide area and extends to a defined die attach area, and then forming, on a first glass carrier substrate surface, a differential waveguide launcher having a pair of signal lines connected to a radiating element that is positioned adjacent to an air cavity and surrounded by a patterned array of conductors disposed over the ceramic region in a waveguide conductor ring. After attaching a die to the glass carrier substrate to make electrical connection to the differential waveguide launcher, a molding compound is formed to cover the die, differential waveguide launcher, and air cavity, and an array of conductors is formed in the molding compound to define a first waveguide interface perimeter surrounding a first waveguide interface interior.

Insulated metal substrate and method for manufacturing same

An insulated metal substrate (IMS) and a method for manufacturing the same are disclosed. The IMS includes an electrically conductive line pattern layer, an encapsulation layer, a first adhesive layer, a second adhesive layer, and a heat sink element. The encapsulation layer fills a gap between a plurality of electrically conductive lines of the electrically conductive line pattern layer. An upper surface of the encapsulation layer is flush with an upper surface of the electrically conductive line pattern layer. The first and second adhesive layer are disposed between the electrically conductive line pattern layer and the heat sink element. A bonding strength between the first adhesive layer and the second adhesive layer is greater than 80 kg/cm.sup.2.

DOUBLE-SIDED HEAT DISSIPATION POWER SEMICONDUCTOR MODULE AND METHOD OF MANUFACTURING THE SAME
20230187309 · 2023-06-15 · ·

The present disclosure relates to a technology relating to a power semiconductor module of which heat is dissipated through both sides thereof and provides a technology for maintaining a distance between an upper substrate and a lower substrate by a metal bump formed on one side of a power semiconductor die.

SUBSTRATE STRUCTURES AND METHODS OF MANUFACTURE

A power electronic substrate includes a metallic baseplate having a first and second surface opposing each other. An electrically insulative layer also has first and second surfaces opposing each other, its first surface coupled to the second surface of the metallic baseplate. A plurality of metallic traces each include first and second surfaces opposing each other, their first surfaces coupled to the second surface of the electrically insulative layer. At least one of the metallic traces has a thickness measured along a direction perpendicular to the second surface of the metallic baseplate that is greater than a thickness of another one of the metallic traces also measured along a direction perpendicular to the second surface of the metallic baseplate. In implementations the electrically insulative layer is an epoxy or a ceramic material. In implementations the metallic traces are copper and are plated with a nickel layer at their second surfaces.

SEMICONDUCTOR DEVICE, POWER CONVERTER, MOVING VEHICLE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
20230170323 · 2023-06-01 · ·

It is an object to provide technology enabling suppression of scattering of metal powder during ultrasonic bonding to suppress discharge and abnormal operation of a semiconductor device. A semiconductor device includes: an insulating substrate including an insulating layer and a metal pattern disposed on the insulating layer; and an electrode bonded on the metal pattern. The electrode includes, in a portion inward of a peripheral portion of a bonded surface being a surface of the electrode bonded on the metal pattern, a receiving portion recessed upward and capable of receiving metal powder generated during bonding of the electrode and the metal pattern, and the peripheral portion of the bonded surface of the electrode is bonded on the metal pattern.

Multi-piece wiring substrate, electronic component housing package, electronic device, and electronic module
11264967 · 2022-03-01 · ·

A multi-piece wiring substrate includes a matrix substrate including first and second insulating layers, and interconnection substrate regions arranged in a matrix. The matrix substrate includes dividing grooves opposing each other and disposed along boundaries between the interconnection substrate regions, and through-holes penetrating the matrix substrate in a thickness direction at positions where the dividing grooves are disposed. The inner surface conductor gradually decreases in thickness from a thick portion in a middle of the inner surface conductor, to thin portions disposed on a side of a boundary between the first and second insulating layers and on a first main surface side, and includes inclination portions each of which gradually increases in thickness from a boundary between corresponding one of the dividing grooves and the inner surface conductor to an inner surface of the inner surface conductor, in vertical sectional view.

CERAMIC PACKAGE, METHOD OF MANUFACTURING THE SAME, ELECTRONIC COMPONENT, AND MODULE
20170309533 · 2017-10-26 ·

A method of manufacturing a ceramic package is provided. An electrically conductive paste is applied to an inside of the first hole and an inside of the second hole of a ceramic green sheet. A ceramic member including first and second electrically conductive members is formed by burning the ceramic green sheet. The ceramic member is divided so as to divide each of the first and second electrically conductive members. A distance between first and second connecting portions is smaller than each of a length of the first connecting portion in a first direction and a length of the second connecting portion in a second direction. The length of the first connecting portion in the first direction is larger than a length of the first connecting portion in a third direction. The length of the second connecting portion has a similar relation.

WAFER LEVEL STACKED STRUCTURES HAVING INTEGRATED PASSIVE FEATURES

A method includes obtaining an active feature layer having a first surface bearing one or more active feature areas. A first capacitor plate of a first capacitor is formed on an interior surface of a cap. A second capacitor plate of the first capacitor is formed on an exterior surface of the cap. The first capacitor plate of the first capacitor overlays and is spaced apart from the second capacitor plate of the first capacitor along a direction that is orthogonal to the exterior surface of the cap to form the first capacitor. The cap is coupled with the first surface of the active feature layer such that the second capacitor plate of the first capacitor is in electrical communication with at least a first active feature of the active feature layer. The cap is bonded with the passive layer substrate.