A linear electrical machine including a frame with a level reference plane, an array of electromagnets connected to the frame and coupled to an alternating current power source energizing each electromagnet, at least one reaction platen of paramagnetic, diamagnetic, or non-magnetic conductive material disposed to cooperate with the electromagnets of the array of electromagnets so that excitation of the electromagnets with alternating current generates levitation and propulsion forces against the reaction platen that controllably levitate and propel the reaction platen along at least one drive line, in a controlled attitude relative to the drive plane, and a controller operably coupled to the array of electromagnets and the alternating current power source and configured so as to sequentially excite the electromagnets with multiphase alternating current with a predetermined excitation characteristic so that each reaction platen is levitated and propelled with up to six degrees of freedom.

A warning is issued about an irregularity concerning a wafer stored in a cassette if a difference between a value of an apparent thickness of the wafer and the previously obtained value of an actual thickness of the wafer exceeds a threshold value, the value of the apparent thickness of the wafer being obtained by a non-contact-type sensor for detecting a front portion of the wafer laterally of the wafer. Consequently, the wafer is prevented from being damaged when it is taken out of the cassette.

An apparatus for transferring a substrate to a substrate processing chamber is provided. The apparatus comprises: a substrate transfer chamber having a floor provided with a first magnet and a sidewall connected to the substrate processing chamber and having an opening through which a substrate is loaded into and unloaded from the substrate processing chamber; a substrate transfer module including a substrate holder configured to hold the substrate and a second magnet having a repulsive force against the first magnet, and configured to move in the substrate transfer chamber by magnetic levitation using the repulsive force; and a heating device configured to heat the substrate transfer module to release contaminants adhered to a surface of the substrate transfer module.

The present invention provides an apparatus for treating a substrate. The apparatus for treating a substrate comprises: a first module; and a treating module configured to treat the substrate, and the first module includes: a load port on which a container having the substrate accommodated therein is placed; a transfer unit having a hand that transfers the substrate between the load port and the treating module; and an observation unit mounted in the transfer unit and configured to observe a state of the substrate accommodated in the container.

Provided is an electrostatic capacitance sensor which can remove an influence of a noise occurring from a static eliminator or a driving source and accurately perform measurement even on electrostatic capacitance detected by a thin-type detection unit which can be passed to a finger surface of a wafer transfer robot. The present invention is provided with an AC supply source which supplies an AC voltage to a detection unit, a parasitic capacitance compensation circuit, an operational amplifier, a differential amplifier, a phase detection means, and a low pass filter. An operational amplification output terminal is connected to an inversion input terminal of the differential amplifier through a first band pass filter, the AC supply source is connected to a non-inversion input terminal of the differential amplifier through a second band pass filter, an output terminal of the differential amplifier is connected to an input terminal of the phase detection means, and the phase detection means takes, as a reference signal, an AC signal output from the AC supply source.

In an embodiment, a wafer pod includes: a cavity configured to receive and store a wafer; an alignment fiducial within the cavity, wherein: the alignment fiducial comprises two lines orthogonal to each other, and the alignment fiducial is configured to be detected by a robotic arm alignment sensor disposed on a robotic arm, wherein the alignment fiducial defines an alignment orientation for a robotic arm gripper hand to enter into the cavity.

Generation of dust from a peripheral portion of a substrate can be suppressed, and a processed substrate can be suppressed from being adversely affected by a pre-processed substrate. Further, an actual elevation state of the member configured to be moved up and down to support the substrate can be investigated. A substrate transfer device includes a first supporting portion, a second supporting portion and an elevating mechanism. The first supporting portion and the second supporting portion are configured to support a substrate from below the substrate. The elevating mechanism is configured to elevate the second supporting portion up and down between a first position higher than a height of the first supporting portion and a second position lower than the height of the first supporting portion. The substrate transfer device further includes a detecting mechanism configured to detect an elevation state of the second supporting portion.

Apparatus and methods for handling die carriers are disclosed. In one example, a disclosed apparatus includes: a load port configured to load a die carrier operable to hold a plurality of dies into a processing tool; and a lane changer coupled to the load port and configured to move at least one die in the die carrier to an input of the processing tool and transfer the at least one die into the processing tool for processing the at least one die.

A detection system configured to detect a state of a structure within a processing space of a substrate processing apparatus, includes: a detection substrate including a state detector that detects the state of the structure; a transfer device that loads and unloads each of a substrate to be processed and the detection substrate into and from the processing space; and a control device, wherein the detection substrate further includes at least one acceleration detector that detects an acceleration in each of two directions intersecting each other in a surface of the substrate, and wherein the control device estimates an orientation of the state detector on the detection substrate within the processing space based on a detection result obtained by the at least one acceleration detector when the detection substrate is moved in a loading/unloading direction during loading or unloading of the detection substrate into or from the processing space.

A wafer handling apparatus includes at least one load port, an image capturing device and a processor. The load port is configured to receive a wafer carrier. The image capturing device is configured to capture an image of the wafer carrier received in the load port before one or more wafers are inserted into the wafer carrier. The processor is communicably connected to the image capturing device and is configured to determine whether the wafer carrier is in a condition that is unsafe for wafer placement based on the image captured by the image capturing device.