The present invention discloses a transferring method, a manufacturing method, a device and an electronics apparatus of micro-LED. The method for transferring micro-LEDs comprises: forming a mask layer on the backside of a laser-transparent original substrate, wherein micro-LEDs are formed on the front-side of the original substrate; bringing the micro-LEDs on the original substrate in contact with preset pads on a receiving substrate; and irradiating the original substrate from the original substrate side with laser through the mask layer, to lift-off micro-LEDs from the original substrate.

There is provided a solid-state imaging device including: a first substrate including a first semiconductor substrate and a first wiring layer, the first semiconductor substrate having a pixel unit with pixels; a second substrate including a second semiconductor substrate and a second wiring layer, the second semiconductor substrate having a circuit with a predetermined function; and a third substrate including a third semiconductor substrate and a third wiring layer, the third semiconductor substrate having a circuit with a predetermined function, the first, second, and third substrates being stacked in this order, the first substrate and the second substrate being bonded together with the first wiring layer and the second wiring layer opposed to each other, a first coupling structure on bonding surfaces of the first substrate and the second substrate, and including an electrode junction structure with electrodes formed on the respective bonding surfaces in direct contact with each other.

A processing method of a workpiece includes a division step of dividing into a plurality of chips the workpiece held on a first surface of a sheet, a tightly bonding step of, after the division step, heating at least either the sheet or the workpiece to soften the sheet and tightly bonding the sheet to the chips, and a cleaning step of, after the tightly bonding step, cleaning the workpiece.

A processing method of a workpiece includes a division step of dividing into a plurality of chips the workpiece held on a first surface of a sheet, a tightly bonding step of, after the division step, heating at least either the sheet or the workpiece to soften the sheet and tightly bonding the sheet to the chips, and a cleaning step of, after the tightly bonding step, cleaning the workpiece.

A semiconductor device package includes: (1) a conductive base comprising a sidewall, a cavity defined from a first surface of the conductive base, the cavity having a bottom surface and a depth; (2) a semiconductor die disposed on the bottom surface of the cavity, the semiconductor die having a first surface and a second surface opposite the first surface, the second surface of the semiconductor die bonded to the bottom surface of the cavity; and (3) a first insulating material covering the sidewall of the conductive base and extending to a bottom surface of the conductive base.

A semiconductor device package includes: (1) a conductive base comprising a sidewall, a cavity defined from a first surface of the conductive base, the cavity having a bottom surface and a depth; (2) a semiconductor die disposed on the bottom surface of the cavity, the semiconductor die having a first surface and a second surface opposite the first surface, the second surface of the semiconductor die bonded to the bottom surface of the cavity; and (3) a first insulating material covering the sidewall of the conductive base and extending to a bottom surface of the conductive base.

The present invention provides a broken line repair method of a TFT substrate. The method first finds out a broken line in the TFT substrate and a position of a broken point on the broken line. Then, positions of the passivation layer intersecting with the broken line at two ends of the broken point are processed, respectively to expose a metal layer, where the broken line is. Then, a temporary material layer is covered on the passivation layer and the metal layer which is exposed at the two ends of the broken point. Finally, a metal growing film is formed on the temporary material layer to connect the broken line of the two ends of the broken point. With the temporary material layer, the issue of bad repair result due to the remain of the color resist layer and the folding of the passivation layer can be solved.

The present invention provides a broken line repair method of a TFT substrate. The method first finds out a broken line in the TFT substrate and a position of a broken point on the broken line. Then, positions of the passivation layer intersecting with the broken line at two ends of the broken point are processed, respectively to expose a metal layer, where the broken line is. Then, a temporary material layer is covered on the passivation layer and the metal layer which is exposed at the two ends of the broken point. Finally, a metal growing film is formed on the temporary material layer to connect the broken line of the two ends of the broken point. With the temporary material layer, the issue of bad repair result due to the remain of the color resist layer and the folding of the passivation layer can be solved.

A semiconductor device package includes a conductive base, and a cavity defined from a first surface of the conductive base, the cavity having a bottom surface and a depth. A semiconductor die is disposed on the bottom surface of the cavity, the semiconductor die having a first surface and a second surface opposite the first surface. The second surface of the semiconductor die is bonded to the bottom surface of the cavity. A distance between the first surface of the semiconductor die and the first surface of the conductive base is about 20% of the depth of the cavity.

A semiconductor device package includes a conductive base, and a cavity defined from a first surface of the conductive base, the cavity having a bottom surface and a depth. A semiconductor die is disposed on the bottom surface of the cavity, the semiconductor die having a first surface and a second surface opposite the first surface. The second surface of the semiconductor die is bonded to the bottom surface of the cavity. A distance between the first surface of the semiconductor die and the first surface of the conductive base is about 20% of the depth of the cavity.