The present invention provides a silicone skeleton-containing polymer including a silicone skeleton shown by the following formula (1) and having a weight average molecular weight of 3,000 to 500,000.

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This can provide a silicone skeleton-containing polymer that can easily form a fine pattern with a large film thickness, and can form a cured material layer (cured film) that is excellent in various film properties such as crack resistance and adhesion properties to a substrate, electronic parts, and a semiconductor device, particularly a base material used for a circuit board, and has high reliability as a film to protect electric and electronic parts and a film for bonding substrates; and a photo-curable resin composition that contains the polymer, a photo-curable dry film thereof, a laminate using these materials, and a patterning process.

Semiconductor packages may include a molded interposer and semiconductor dice mounted on the molded interposer. The molded interposer may include two redistribution layer structures on opposite sides of a molding compound. Electrically conductive vias may connect the RDL structures through the molding compound, and passive devices may be embedded in the molding compound and electrically connected to one of the RDL structures. Each of the semiconductor dice may be electrically connected to, and have a footprint covering, a corresponding one of the passive devices to form a face-to-face connection between each of the semiconductor dice and the corresponding one of the passive devices.

A semiconductor package including a first package substrate, a first semiconductor chip on the first package substrate, a first conductive connector on the first package substrate and laterally spaced apart from the first semiconductor chip, an interposer substrate on the first semiconductor chip and electrically connected to the first package substrate through the first conductive connector, the interposer substrate including a first portion overlapping the first semiconductor chip and a plurality of upper conductive pads in the first portion, a plurality of spacers on a lower surface of the first portion of the interposer substrate and positioned so as not to overlap the plurality of upper conductive pads in a plan view, and an insulating filler between the interposer substrate and the first package substrate may be provided.

A semiconductor structure includes a semiconductor substrate; a first pad and a second pad on a first top surface of the semiconductor substrate; a circuit board including a second top surface, a recess indented from the second top surface into the circuit board, a polymeric pad disposed on the second top surface and corresponding to the first pad, and an active pad disposed within the recess and corresponding to the second pad; a first bump disposed between and contacting the polymeric pad and the first pad; and a second bump disposed between and contacting the active pad and the second pad, wherein a height of the first bump is substantially shorter than a height of the second bump.

The present disclosure relates to thin-form-factor reconstituted substrates and methods for forming the same. The reconstituted substrates described herein may be utilized to fabricate homogeneous or heterogeneous high-density 3D integrated devices. In one embodiment, a silicon substrate is structured by direct laser patterning to include one or more cavities and one or more vias. One or more semiconductor dies of the same or different types may be placed within the cavities and thereafter embedded in the substrate upon formation of an insulating layer thereon. One or more conductive interconnections are formed in the vias and may have contact points redistributed to desired surfaces of the reconstituted substrate. The reconstituted substrate may thereafter be integrated into a stacked 3D device.

A flexible sensing device includes a flexible substrate selected from a bismaleimide-triazine resin substrate, an ajinomoto build-up film substrate, and a polyimide film substrate. A plurality of first sensing stripes are formed on the flexible substrate and are spaced apart from each other in a first direction. A dielectric film is superposed on the first sensing stripes. A plurality of second sensing stripes are formed on the dielectric film and are spaced apart from each other in a second direction. Each second sensing stripe crosses over the first sensing stripes and is spaced apart from the first sensing stripes by the dielectric film. A method of making the same is also disclosed.

Disclosed are wiring substrates, methods of fabricating the same, and methods of fabricating semiconductor packages. The wiring substrate includes a dielectric layer that includes a plurality of unit regions, a sawing region that surrounds each of the unit regions, and an edge region that surrounds the unit regions and the sawing region, a first upper protection pattern on a top surface of the dielectric layer on the unit regions and the sawing region, and a second upper protection pattern on a top surface of the dielectric layer on the edge region. The second upper protection pattern surrounds the first upper protection pattern when viewed in plan and includes a dielectric material different from a dielectric material of the first upper protection pattern.

Flexible modules and methods of manufacture are described. In an embodiment, a flexible module includes a flex board formed in which a passivation layer is applied in liquid form in a panel level process, followed by exposure and development. An electronic component is then mounted onto the flex board and encapsulated in a molding compound that is directly on a top surface of the passivation layer.

An organic interposer includes: a first organic insulating layer including a groove; a first metal wire located in the groove; a barrier metal material covering the first metal wire; and a second metal wire located above the first metal wire, wherein the barrier metal material includes: a first barrier metal film interposed between the first metal wire and an inner surface of the groove; and a second barrier metal film located on the first metal wire, and wherein the second metal wire is in contact with both of the first barrier metal film and the second barrier metal film.

An interposer includes: a base substrate; an interconnection structure on a top surface of the base substrate and including a metal interconnection pattern; an upper passivation layer on the interconnection structure and having compressive stress; a lower passivation layer under a bottom surface of base substrate, the lower passivation layer having compressive stress that is less than the compressive stress of the upper passivation layer; a lower conductive layer under the lower passivation layer; and a through electrode penetrating the base substrate and the lower passivation layer. The through electrode electrically connects the lower conductive layer to the metal interconnection pattern of the interconnection structure.