A lateral double-diffused metal-oxide-semiconductor (LDMOS) transistor including a breakdown voltage clamp includes a drain n+ region, a source n+ region, a gate, and a p-type reduced surface field (PRSF) layer including one or more bridge portions. Each of the one or more bridge portions extends below the drain n+ region in a thickness direction. Another LDMOS transistor includes a drain n+ region, a source n+ region, a gate, an n-type reduced surface field (NRSF) layer disposed between the source n+ region and the drain n+ region in a lateral direction, a PRSF layer disposed below the NRSF layer in a thickness direction orthogonal to the lateral direction, and a p-type buried layer (PBL) disposed below the PRSF layer in the thickness direction. The drain n+ region is disposed over the PBL in the thickness direction.

An integrated circuit includes a signal pad, receiving an input signal during a normal mode, and receive an ESD signal during an ESD mode; an internal circuit, processing the input signal during the normal mode; a variable impedance circuit, comprising a first end coupled to the signal pad, a second end coupled to the internal circuit, wherein the variable impedance circuit provides a low or high impedance path between the signal pad and the internal circuit during the normal or ESD mode; and a switch circuit, comprising a first end coupled to a control end of the variable impedance circuit, a second end coupled to a reference voltage terminal, and a control end receiving a node voltage, wherein the switch circuit switches the control end of the variable impedance circuit to have a first specific voltage or be electrically floating during the normal or ESD mode.

The present disclosure relates to the technical field of semiconductors, and provides an electro-static discharge (ESD) protection structure and a chip. The ESD protection structure includes: a semiconductor substrate, a first P-type well, a first N-type well, a first N-type doped portion, a first P-type doped portion, a second N-type doped portion, a second P-type doped portion, a third doped well, a third P-type doped portion and a third N-type doped portion, wherein the first P-type well, the first N-type well and the third doped well are located in the semiconductor substrate; the first N-type doped portion and the first P-type doped portion are located in the first N-type well and spaced apart; the second N-type doped portion and the second P-type doped portion are located in the first P-type well and spaced apart.

The present disclosure provides an electrostatic protection device, and relates to the technical field of semiconductors. The electrostatic discharge protection device includes a first P-type heavily-doped region, a first N-type heavily-doped region, a second N-type heavily-doped region, a second P-type heavily-doped region, and a third N-type heavily-doped region. The first P-type heavily-doped region and the first N-type heavily-doped region are located in a P well, the second P-type heavily-doped region and the third N-type heavily-doped region are located in a first N well, one part of the second N-type heavily-doped region is located in the P well, the other part of the second N-type heavily-doped region is located in first N well, and the P well and the first N well are adjacent to each other and both located in the P-type substrate.

A semiconductor device includes an enhancement-mode first p-channel MISFET, an enhancement-mode second p-channel MISFET, a drain conductor electrically and commonly connected to the first p-channel MISFET and the second p-channel MISFET, a first source conductor electrically connected to a source of the first p-channel MISFET, a second source conductor electrically connected to a source of the second p-channel MISFET, and a gate conductor electrically and commonly connected to a gate of the first p-channel MISFET and a gate of the second p-channel MISFET.

This disclosure relates to a semiconductor device including a device with high clamping voltage (HVC device), and an OTS device. Such a semiconductor device provides very advantageous ESD protection. The semiconductor device can be realized in two ways: an OTS device and a device with high clamping voltage can be realized as discrete, independent devices that are combined in one semiconductor package, or an OTS device can be integrated into interconnect layers of a device with high clamping voltage by integration.

Embodiments provide an electrostatic protection structure and a method for fabricating the electrostatic protection structure. The electrostatic protection structure includes: a first diode structure, where a first terminal of the first diode structure is connected to a ground terminal, and a second terminal of the first diode structure is connected to a signal terminal; and a second diode structure adjacent to the first diode structure, where a first terminal of the second diode structure is connected to a power supply terminal, and a second terminal of the second diode structure is connected to the signal terminal. A breakdown voltage of the first diode structure and/or a breakdown voltage of the second diode structure is less than a preset threshold. The technical solutions improves electrostatic discharge protection capability of an input/output terminal of an integrated circuit by doping the first diode structure or the second diode structure.

Electrostatic discharge (ESD) protection devices with high current capability are described. The ESD protection device may include a pair of bidirectional diodes (first and second bidirectional diodes) connected in series. Each of the bidirectional diodes includes a low capacitance (LC) diode and a bypass diode connected in parallel. During ESD events, current flows through the LC diode of the first bidirectional diode and the bypass diode of the second bidirectional diode. Particular arrangements of the LC diodes and the bypass diodes are devised to facilitate uniform distribution of the current throughout an area occupied by the ESD protection device.

An integrated circuit is provided with a protected circuit wherein a first FinFET operably coupled to a signal node is protected against electrostatic discharge voltage damage by a standard cell electrostatic discharge protection circuit which is connected between first and second voltage supplies and which includes a first FinFET diode connected between the signal node and the first voltage supply, and a second FinFET diode connected between the signal node and the second voltage supply, where the first and second FinFET diodes are each formed with a FinFET device comprising (1) a body well region forming a first diode terminal connected to one of the first or second voltage supplies, and (2) a shorted gate, source, and drain regions forming a second diode terminal connected to the signal node.

A semiconductor device 100 has a power transistor N1 of vertical structure and a temperature detection element 10a configured to detect abnormal heat generation by the power transistor N1. The power transistor N1 includes a first electrode 208 formed on a first main surface side (front surface side) of a semiconductor substrate 200, a second electrode 209 formed on a second main surface side (rear surface side) of the semiconductor substrate 200, and pads 210a-210f positioned unevenly on the first electrode 208. The temperature detection element 10a is formed at a location of the highest heat generation by the power transistor N1, the location (near the pad 210b where it is easiest for current to be concentrated) being specified using the uneven positioning of the pads 210a-210f.