In a light receiving device, a light receiving element includes a first photoelectric conversion unit (PD) that converts light into electric charges, a first electric charge storage unit (MEM) to which the electric charges are transferred from the first photoelectric conversion unit, a first distribution gate, a second electric charge storage unit (MEM) to which the electric charges are transferred from the first photoelectric conversion unit, and a second distribution gate, in which the first and second distribution gates are provided at positions axially symmetric to each other with respect to a first center axis extending so as to pass through the center of the first photoelectric conversion unit, in a direction intersecting the column direction at a predetermined angle, when viewed from above the semiconductor substrate.

The present disclosure pertains to an image sensor, including: a first photosensitive layer (2) for sensing blue light; a second photosensitive layer (3) for sensing green light; a third photosensitive layer (4) for sensing red light; and a fourth photosensitive layer (5) for sensing infrared light, wherein the first, second, third and fourth photosensitive layer are stacked on each other and each comprise a Perovskite material.

An infrared solid state imaging device includes: a first PN junction diode has a first shortest length that is a shortest length from a first junction surface to a second junction surface; a PN junction diode has a second shortest length that is a shortest length from the second junction surface to a third junction surface, the second shortest length being different from the first shortest length; an insulating film serving as an element isolation region which establishes electrical isolation between a first region of the first PN junction diode and a fourth region of the second PN junction diode, and so on; and a metal wire provided on a second region of the first PN junction diode and a third region of the second PN junction diode, wherein the first PN junction diode and the second PN junction diode are connected in series.

An infrared image sensor includes: a plurality of reference circuits configured to provide a plurality of reference analog values to a plurality of bolometer cells, respectively; a front-end analog circuit configured to collect a plurality of output analog values according to the plurality of reference analog values; and a noise suppression circuit configured to switch a correspondence between the plurality of bolometer cells and the plurality of reference analog values at unit time intervals.

Provided are an imaging element, a distance measuring device, and an electronic device capable of improving resolution of a distance image while preventing generation of electromagnetic noise.

An imaging element according to the present disclosure includes: a signal generator configured to generate a clock signal; a plurality of flip-flops connected in a cascade manner; a circuit block configured to supply a first signal to a clock terminal of each of the plurality of flip-flops and to supply a second signal to an input terminal of a first-stage flip-flop of the plurality of flip-flops in accordance with the clock signal; and a pixel array including pixels configured to be driven using pulse signals supplied from different stages of the plurality of flip-flops.

Provided is a solid-state imaging device capable of improving sensitivity of near-infrared wavelengths and suppressing color mixing without being restricted by a wiring layout. A solid-state imaging device includes: a substrate on which a plurality of photoelectric conversion units are formed corresponding to different light wavelengths; a wiring layer including a transistor on a surface opposite to a surface on a light incident side of the substrate and on a photoelectric conversion unit side to execute signal processing on a charge output from the photoelectric conversion unit and a wiring on a side opposite to the photoelectric conversion unit side of the transistor so as to transfer an electrical signal obtained by the transistor; and a reflection design film on a transistor side from at least a junction between the substrate and the wiring layer, which has higher reflectivity than the wiring layer and reflects a vertical component of incident light.

An electrical device includes a substrate with a compressive layer, a neutral stress buffer layer and a tensile stress compensation layer. The stress buffer layer and the stress compensation layer may each be formed with aluminum nitride using different processing parameters to provide a different intrinsic stress value for each layer. The aluminum nitride tensile layer is configured to counteract stresses from the compressive layer in the device to thereby control an amount of substrate bow in the device. This is useful for protecting fragile materials in the device, such as mercury cadmium telluride. The aluminum nitride stress compensation layer also can compensate for forces, such as due to CTE mismatches, to protect the fragile layer. The device may include temperature-sensitive materials, and the aluminum nitride stress compensation layer or stress buffer layer may be formed at a temperature below the thermal degradation temperature of the temperature-sensitive material.

A method includes forming a dielectric layer over a first surface of a semiconductor layer, the dielectric layer including a metallization layer. The method includes forming an opening to expose a portion of the dielectric layer. The method includes forming a buffer oxide layer lining the opening. The method includes forming, according to a patternable layer, a recess in the buffer oxide layer partially extending from a second surface of the buffer oxide layer. The method includes removing the patternable layer. The method includes extending the recess through the buffer oxide layer and a portion of the dielectric layer to expose a portion of the metallization layer. The method includes filling the recess with a conductive material to form a pad structure configured to provide electrical connection to the metallization layer.

In at least one embodiment an imaging system comprises a light emitter, a detector array and a synchronization circuit. The detector array comprises pixels, which have a built-in modulation function. The synchronization circuit is operable to synchronize acquisition performed by detector array with emission by means of the light source.

An imaging device that has an image processing function and is capable of a high-speed operation is provided. The imaging device, which has an additional function such as image processing, can retain analog data obtained by an image capturing operation in a pixel and extract data obtained by multiplying the analog data by a predetermined weight coefficient. In the imaging device, some of potentials used for an arithmetic operation in pixels are generated by redistribution of charge with which wirings are charged. This enables an arithmetic operation to be performed at high speed with low power consumption, compared with the case where the potentials are supplied from another circuit to the pixels.