Patent classifications
H01L27/14696
Photosensitive field-effect transistor
A photosensitive field-effect transistor which can be configured to provide an electrical response when illuminated by electromagnetic radiation incident on the transistor. The field-effect transistor has a channel (13) made from a two-dimensional material and comprises a photoactive layer (22) which can be configured to donate charge carriers to the transistor channel (13) when electromagnetic radiation is absorbed in the photoactive layer (22). The photosensitive field-effect transistor comprises a top electrode (21) which is in contact with the photoactive layer on one or more contact areas which together form a contact pattern. With a suitably patterned top electrode (21), a voltage applied to the electrode can function as an electrical shutter which can switch the photosensitive field-effect transistor between a light-sensitive state and a light-immune state.
RADIATION DETECTOR CORE ASSEMBLY
The present invention is directed towards a moisture resistant radiation detector core assembly which was constructed by first assembling the photon-electron conversion layer, integrated circuit and the connection elements between and then encapsulating the whole assembly. This provides improved moisture barrier properties, since the encapsulation also covers the connection elements and does not have to be opened to apply the electrical connections, as is done for known radiation detector core assemblies.
SOLID-STATE IMAGING DEVICE AND INFRARED-ABSORBING COMPOSITION
Provided is a solid-state imaging device that includes: first pixels provided with a color filter layer having a transmission band in a visible light wavelength region on a light-receiving surface of a first light-receiving element; second pixels provided with an infrared pass filter layer having a transmission band in an infrared wavelength region on a light-receiving surface of a second light-receiving element; and an infrared cut filter layer that is provided on a lower surface side of the color filter layer and transmits light in the visible light wavelength region by blocking light in the infrared wavelength region; wherein the infrared cut filter layer is formed with an infrared-absorbing composition containing a compound having a maximum absorption wavelength in an wavelength range of from 600 to 2000 nm, and at least one kind selected from a binder resin and a polymerizable compound.
PHOTODETECTION DEVICE WITH OVERDOPED INTERDIODE NETWORK AND MANUFACTURING METHOD
The invention relates to a photodetection device comprising a substrate and a diodes network, the substrate comprising an absorption layer (1) and each diode comprising a collection region with a first type of doping in the absorption layer (2). The device comprises a conduction mesh (7) under the surface of the substrate, comprising at least one conduction channel inserted between the collection regions (2) of two adjacent diodes, the at least one conduction channel (7) having a second doping type opposite the first type and a higher doping density than the absorption layer. The doping density of the at least one conduction channel (7) is derived from metal diffusion in the absorption layer from a metal mesh present on the substrate surface. The absorption layer has the first doping type. The invention also relates to a method of making such a device.
IMAGING ELEMENT, SEMICONDUCTOR ELEMENT, AND ELECTRONIC APPARATUS
An imaging element including: a photoelectric conversion layer including a compound semiconductor material; a contact layer disposed to be stacked on the photoelectric conversion layer and including a diffusion region of first electrically-conductive type impurities in a selective region; a first insulating layer provided to be opposed to the photoelectric conversion layer with the contact layer interposed therebetween and having a first opening at a position facing the diffusion region; and a second insulating layer provided to be opposed to the contact layer with the first insulating layer interposed therebetween and having a second opening that communicates with the first opening and is smaller than the first opening.
COMPOUND SEMICONDUCTOR X-RAY DETECTOR TILES AND METHOD OF DICING THEREOF
A radiation detector tile includes a single crystal compound semiconductor tile having a zinc blende crystal structure, a (111) plane first major (i.e. prominent) surface and four side surfaces which are rotated by an angle of 13° to 17° to a {110} family of planes. The tile may be formed by dicing a (111) oriented wafer at directions which are rotated by an angle of 13° to 17° from <110> in-plane slipping directions to reduce or eliminate the side surface chipping and sub surface dislocation defects.
Two-terminal electronic devices and their methods of fabrication
Two-terminal electronic devices, such as photodetectors, photovoltaic devices and electroluminescent devices, are provided. The devices include a first electrode residing on a substrate, wherein the first electrode comprises a layer of metal; an I-layer comprising an inorganic insulating or broad band semiconducting material residing on top of the first electrode, and aligned with the first electrode, wherein the inorganic insulating or broad band semiconducting material is a compound of the metal of the first electrode; a semiconductor layer, preferably comprising a p-type semiconductor, residing over the I-layer; and a second electrode residing over the semiconductor layer, the electrode comprising a layer of a conductive material. The band gap of the material of the semiconductor layer, is preferably smaller than the band gap of the I-layer material. The band gap of the material of the I-layer is preferably greater than 2.5 eV.
Imaging device, operating method thereof, and electronic device
An imaging device with low power consumption is provided. The pixel of the imaging device includes first and second photoelectric conversion elements, and first to fifth transistors. A cathode of the first photoelectric conversion element is electrically connected to the first transistor. An anode of a second photoelectric conversion element is electrically connected to the second transistor. Imaging data of a reference frame is obtained using the first photoelectric conversion element, and then imaging data of a difference detection frame is obtained using the second photoelectric conversion element. After the imaging data of the difference detection frame is obtained, a first potential that is a potential of a signal output from the pixel and a second potential that is a reference potential are compared. Whether or not there is a difference between the imaging data of the reference frame and the imaging data of the difference detection frame is determined using the first potential and the second potential.
METAL OXIDE INTERFACE PASSIVATION FOR PHOTON COUNTING DEVICES
Described herein are photon counting devices comprising direct mode detectors with improved signal to noise ratios which are suitable for use in X-ray imaging devices, and other imaging devices.
Monolithic multi-metallic thermal expansion stabilizer
A monolithic multi-metallic thermal expansion stabilizer (MTES) has a coefficient of thermal expansion (CTE) differential between a first surface and a second surface, and a transition region extending between for mitigating the CTE differential.