Discussed is a photodiode and a method for manufacturing the photodiode. The photodiode can include a semiconductor substrate, an insulating layer on the semiconductor substrate, an electrode on the insulating layer; and a graphene layer on the semiconductor substrate, the insulating layer, and the electrode, wherein the insulating layer can include an ion gel.

Provided are a solid-state imaging element, which suppresses occurrence of a dark current and a white spot and even suppresses occurrence of a residual image, and a manufacturing method for the solid-state imaging element. A solid-state imaging element (1) is provided with: a gate electrode (4) above a substrate (2); a charge storage region (5) formed at a position inside the substrate (2) and apart from a top surface (2a) of the substrate (2); a read region (6) formed at a position inside the substrate (2) and on the opposite side to the charge storage region (5) with the gate electrode (4) interposed therebetween; a channel region (7, 8) formed inside the substrate (2) and immediately below the gate electrode (4); and a shield region (9) and an intermediate region (10) formed inside the substrate (2) and between the top surface (2a) of the substrate (2) and the charge storage region (5). The intermediate region (10) is formed at a position inside the substrate (2) and between the channel region (7, 8) and the shield region (9), and is in contact with each of the channel region (7, 8) and the shield region (9), and a concentration of first conductive type impurities in the intermediate region (10) is lower than a concentration of the first conductive type impurities in the shield region (9).

The present disclosure relates an integrated circuit (IC) and a method for manufacturing same. A polysilicon layer is formed over a first region of a substrate and has a plurality of polysilicon structures that are packed with respect to one another to define a first packing density. A dummy layer is formed over a second region of the substrate and has a plurality of dummy structures that are packed with respect to one another to define a second packing density, where the first packing density and second packing density are substantially similar. An inter-layer dielectric layer is formed over the first region and second region of the substrate. Dishing of at least the second region of the substrate concurrent with a chemical-mechanical polish is generally inhibited by the first packing density and second packing density after forming the inter-layer dielectric layer.

A photo transistor and a display device employing the photo transistor are provided. The photo transistor includes a gate electrode disposed on a substrate, a gate insulating layer that electrically insulates the gate electrode, a first active layer overlapping the gate electrode and including metal oxide, wherein the gate insulating layer is disposed between the gate electrode and the active layer, a second active layer disposed on the first active layer and including selenium, and a source electrode and a drain electrode respectively electrically connected to the second active layer.

A photo transistor and a display device employing the photo transistor are provided. The photo transistor includes a gate electrode disposed on a substrate, a gate insulating layer that electrically insulates the gate electrode, a first active layer overlapping the gate electrode and including metal oxide, wherein the gate insulating layer is disposed between the gate electrode and the active layer, a second active layer disposed on the first active layer and including selenium, and a source electrode and a drain electrode respectively electrically connected to the second active layer.

A photodetecting device includes a substrate, an array of sub-pixels, and a lens array covering the array of sub-pixels. Each sub-pixel includes a photosensitive layer supported by the substrate, the photosensitive layer being configured to absorb photons and generate photo-carriers, a first doped portion formed in the photosensitive layer of the respective sub-pixel, wherein the first doped portion includes dopants with a first conductivity type,; and a second doped portion formed in the substrate, wherein the second doped portion includes dopants with a second conductivity type different from the first conductivity type. The array further includes an isolation region separating two or more sub-pixels of the array, a routing layer formed on the substrate configured to electrically couple a circuit to multiple sub-pixels of the array. The lens array includes a spacer portion and a plurality of lenses arranged in a one-to-one correspondence with each of the sub-pixels.

A photodetecting device includes a substrate, an array of sub-pixels, and a lens array covering the array of sub-pixels. Each sub-pixel includes a photosensitive layer supported by the substrate, the photosensitive layer being configured to absorb photons and generate photo-carriers, a first doped portion formed in the photosensitive layer of the respective sub-pixel, wherein the first doped portion includes dopants with a first conductivity type,; and a second doped portion formed in the substrate, wherein the second doped portion includes dopants with a second conductivity type different from the first conductivity type. The array further includes an isolation region separating two or more sub-pixels of the array, a routing layer formed on the substrate configured to electrically couple a circuit to multiple sub-pixels of the array. The lens array includes a spacer portion and a plurality of lenses arranged in a one-to-one correspondence with each of the sub-pixels.

A light-emitting device and a lighting device each of which includes a plurality of light-emitting elements exhibiting light with different wavelengths are provided. The light-emitting device and the lighting device each have an element structure in which each of the light-emitting elements emits only light with a desired wavelength, and thus the light-emitting elements have favorable color purity. In the light-emitting element emitting light (λ.sub.R) with the longest wavelength of the light with different wavelengths, the optical path length from a reflective electrode to a light-emitting layer (a light-emitting region) included in an EL layer is set to λ.sub.R/4 and the optical path length from the reflective electrode to a semi-transmissive and semi-reflective electrode is set to λ.sub.R/2.

A touch screen panel using a thin film transistor (TFT) photodetector includes a touch panel including a plurality of unit patterns for sensing light reflected by a touch by using a TFT photodetector including an active layer formed of amorphous silicon or polycrystalline silicon on an amorphous transparent material, and a controller configured to scan the plurality of unit patterns and read touch coordinates as a result of the scanning.

A display panel and a display device are provided. In the display panel, an upconversion material layer is configured to convert interactive light from a first wave band into a second wave band. A light-sensing transistor of a light-sensing circuit is configured to convert a light intensity signal of the interactive light into an electrical signal after the wave band of the interactive light is converted. A position-detecting circuit is configured to identify a position where the interactive light is irradiated according to the electrical signal. Therefore, the display panel can interact with light having relatively long wavelengths.