This method for producing a structure wherein base materials are bonded by atomic diffusion comprises: a step for applying a liquid resin on the base material; a step for smoothing the surface of the liquid resin by surface tension; a step for forming a resin layer by curing; a step for forming a metal thin film on the resin layer; a step for forming a metal thin film on the base material; and a step for bringing the metal thin film of the base material and the metal thin film of the base material into close contact with each other, thereby bonding the metal thin film of the resin layer and the metal thin film of the base material with each other by atomic diffusion

This method for producing a structure wherein base materials are bonded by atomic diffusion comprises: a step for applying a liquid resin on the base material; a step for smoothing the surface of the liquid resin by surface tension; a step for forming a resin layer by curing; a step for forming a metal thin film on the resin layer; a step for forming a metal thin film on the base material; and a step for bringing the metal thin film of the base material and the metal thin film of the base material into close contact with each other, thereby bonding the metal thin film of the resin layer and the metal thin film of the base material with each other by atomic diffusion

A semiconductor device is disclosed including an integrated memory module. The integrated memory module may include a pair of semiconductor die, which together, operate as a single, integrated flash memory. In one example, the first die may include the memory cell array and the second die may include the logic circuit such as CMOS integrated circuits. In one example, the second die may be flip-chip bonded to the first die. The flip-chip bond pads on the first and second dies may be made small, with a small pitch, to allow a large number of electrical interconnections between the first and second semiconductor dies.

A semiconductor device is disclosed including an integrated memory module. The integrated memory module may include a pair of semiconductor die, which together, operate as a single, integrated flash memory. In one example, the first die may include the memory cell array and the second die may include the logic circuit such as CMOS integrated circuits. In one example, the second die may be flip-chip bonded to the first die. The flip-chip bond pads on the first and second dies may be made small, with a small pitch, to allow a large number of electrical interconnections between the first and second semiconductor dies.

A 3D IC package includes a bottom die having a back interconnect side opposing a front device side, the back interconnect side having a plurality of bottom die interconnects extending thereto. A top die has a front device side opposing a back side, the front device side having a plurality of top die interconnects. An interposer includes a redistribution layer (RDL) between the bottom die and the top die, the RDL including a plurality of wiring layers extending from back side RDL interconnects thereof to front side RDL interconnects thereof. An under bump metallization (UBM) couples the back side RDL interconnects to the plurality of top die interconnects at a first location, and the front side RDL interconnects are coupled to the plurality of bottom die interconnects at a second location. The first location and second location may not overlap.

A 3D IC package includes a bottom die having a back interconnect side opposing a front device side, the back interconnect side having a plurality of bottom die interconnects extending thereto. A top die has a front device side opposing a back side, the front device side having a plurality of top die interconnects. An interposer includes a redistribution layer (RDL) between the bottom die and the top die, the RDL including a plurality of wiring layers extending from back side RDL interconnects thereof to front side RDL interconnects thereof. An under bump metallization (UBM) couples the back side RDL interconnects to the plurality of top die interconnects at a first location, and the front side RDL interconnects are coupled to the plurality of bottom die interconnects at a second location. The first location and second location may not overlap.

A substrate bonding method includes: forming first plasma on a bonding surface of a first substrate at atmospheric pressure by using a mixed gas including an inert gas and water vapor, to thereby perform surface activation treatment on the bonding surface of the first substrate; forming second plasma on a bonding surface of a second substrate at atmospheric pressure by using the mixed gas, to thereby perform surface activation treatment on the bonding surface of the second substrate; bonding the bonding surface of the first substrate and the bonding surface of the second substrate to each other; and moving each of the first substrate and the second substrate at a constant speed in a region above a linear reactor in which the first plasma and the second plasma are formed.

A 3D IC package includes a bottom die having a back interconnect side opposing a front device side, the back interconnect side having a plurality of bottom die interconnects extending thereto. A top die has a front device side opposing a back side, the front device side having a plurality of top die interconnects. An interposer includes a redistribution layer (RDL) between the bottom die and the top die, the RDL including a plurality of wiring layers extending from back side RDL interconnects thereof to front side RDL interconnects thereof. An under bump metallization (UBM) couples the back side RDL interconnects to the plurality of top die interconnects at a first location, and the front side RDL interconnects are coupled to the plurality of bottom die interconnects at a second location. The first location and second location may not overlap.

A 3D IC package includes a bottom die having a back interconnect side opposing a front device side, the back interconnect side having a plurality of bottom die interconnects extending thereto. A top die has a front device side opposing a back side, the front device side having a plurality of top die interconnects. An interposer includes a redistribution layer (RDL) between the bottom die and the top die, the RDL including a plurality of wiring layers extending from back side RDL interconnects thereof to front side RDL interconnects thereof. An under bump metallization (UBM) couples the back side RDL interconnects to the plurality of top die interconnects at a first location, and the front side RDL interconnects are coupled to the plurality of bottom die interconnects at a second location. The first location and second location may not overlap.

A 3D IC package includes a bottom die having a back interconnect side opposing a front device side, the back interconnect side having a plurality of bottom die interconnects extending thereto. A top die has a front device side opposing a back side, the front device side having a plurality of top die interconnects. An interposer includes a redistribution layer (RDL) between the bottom die and the top die, the RDL including a plurality of wiring layers extending from back side RDL interconnects thereof to front side RDL interconnects thereof. An under bump metallization (UBM) couples the back side RDL interconnects to the plurality of top die interconnects at a first location, and the front side RDL interconnects are coupled to the plurality of bottom die interconnects at a second location. The first location and second location may not overlap.