Patent classifications
H
H01
H01L
2224/00
H01L2224/01
H01L2224/02
H01L2224/03
H01L2224/035
H01L2224/03515
H01L2224/03515
METHODS AND ARCHITECTURES FOR SHALLOW FIDUCIAL AND METAL DEFINED PAD DESIGNS
20250273607
·
2025-08-28
·
·
- Xiao Liu ,
- Bohan Shan ,
- Haobo Chen ,
- Gang Duan ,
- Xiyu Hu ,
- Jose Fernando Waimin Almendares ,
- Bin Mu ,
- Yiqun Bai ,
- Hongxia Feng ,
- Sheng Li ,
- Kyle J. Arrington ,
- Ryan Joseph Carrazzone ,
- Srinivas Venkata Ramanuja Pietambaram ,
- Xiaoying Guo ,
- Dingying Xu ,
- Jeremy D. Ecton ,
- Brandon Christian Marin ,
- Ziyin Lin ,
- Hiroki Tanaka
Methods and architectures for shallow fiducial and metal defined pad designs. Embodiments utilize a thinnable dielectric process. The architecture includes a substrate comprising a dielectric material with one or more conductive contacts on the surface. A layer of a thinnable dielectric or non-conductive material is over the substrate and over the one or more conductive contacts. The layer of dielectric or non-conductive material has a thinned region around individual conductive contacts. The thinned region has a thickness of 4 to 5 microns.