A semiconductor device including a substrate, an insulating layer on the substrate and including a trench, at least one via structure penetrating the substrate and protruding above a bottom surface of the trench, and a conductive structure surrounding the at least one via structure in the trench may be provided.

A method includes patterning a cavity through a first passivation layer of a first package component, the first package component comprising a first semiconductor substrate and bonding the first package component to a second package component. The second package component comprises a second semiconductor substrate and a second passivation layer. Bonding the first package component to the second package component comprises directly bonding the first passivation layer to the second passivation layer; and reflowing a solder region of a conductive connector disposed in the cavity to electrically connect the first package component to the second package component.

A method includes patterning a cavity through a first passivation layer of a first package component, the first package component comprising a first semiconductor substrate and bonding the first package component to a second package component. The second package component comprises a second semiconductor substrate and a second passivation layer. Bonding the first package component to the second package component comprises directly bonding the first passivation layer to the second passivation layer; and reflowing a solder region of a conductive connector disposed in the cavity to electrically connect the first package component to the second package component.

The present disclosure relates to a multi-ring bonding pad, a semiconductor structure having the multi-ring bonding pad, and a method of manufacturing the semiconductor structure. The bonding pad includes an inner ring member, an outer ring member, and multiple bridge members. The inner ring member has a pair of first inner edges opposite to each other, a pair of second inner edges opposite to each other, and multiple third inner edges for connecting the first inner edges to the second inner edges. The outer ring member surrounds the inner ring member and has a pair of first outer edges opposite to each other, a pair of second outer edges opposite to each other, and multiple third outer edges for connecting the first outer edges to the second outer edges. The bridge members are disposed between the inner ring member and the outer ring member for connecting the inner ring member to the outer ring member.

The present disclosure relates to a multi-ring bonding pad, a semiconductor structure having the multi-ring bonding pad, and a method of manufacturing the semiconductor structure. The bonding pad includes an inner ring member, an outer ring member, and multiple bridge members. The inner ring member has a pair of first inner edges opposite to each other, a pair of second inner edges opposite to each other, and multiple third inner edges for connecting the first inner edges to the second inner edges. The outer ring member surrounds the inner ring member and has a pair of first outer edges opposite to each other, a pair of second outer edges opposite to each other, and multiple third outer edges for connecting the first outer edges to the second outer edges. The bridge members are disposed between the inner ring member and the outer ring member for connecting the inner ring member to the outer ring member.

Provided are a three-dimensional integrated circuit (3DIC) and a method of manufacturing the same. The 3DIC includes a first wafer, a second wafer, and a hybrid bonding structure. The second wafer is bonded to the first wafer by the hybrid bonding structure. The hybrid bonding structure includes a blocking layer between a hybrid bonding dielectric layer and a hybrid bonding metal layer.

Three-dimensional memory devices in the form of a memory die includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, and memory stack structures extending through the alternating stack, in which each of the memory stack structures includes a memory film and a vertical semiconductor channel contacting an inner sidewall of the memory film. Bit lines are electrically connected to an end portion of a respective one of the vertical semiconductor channels. Bump connection via structures contact a top surface of a respective one of the bit lines, in which each of the bump connection via structures has a greater lateral dimension along a lengthwise direction of the bit lines than along a widthwise direction of the bit lines. Metallic bump structures of another semiconductor die contact respective ones of the bump connection via structures to make respective electrical connections between the two dies.

Three-dimensional memory devices in the form of a memory die includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, and memory stack structures extending through the alternating stack, in which each of the memory stack structures includes a memory film and a vertical semiconductor channel contacting an inner sidewall of the memory film. Bit lines are electrically connected to an end portion of a respective one of the vertical semiconductor channels. Bump connection via structures contact a top surface of a respective one of the bit lines, in which each of the bump connection via structures has a greater lateral dimension along a lengthwise direction of the bit lines than along a widthwise direction of the bit lines. Metallic bump structures of another semiconductor die contact respective ones of the bump connection via structures to make respective electrical connections between the two dies.

A semiconductor device including a substrate, an insulating layer on the substrate and including a trench, at least one via structure penetrating the substrate and protruding above a bottom surface of the trench, and a conductive structure surrounding the at least one via structure in the trench may be provided.

A semiconductor device including a substrate, an insulating layer on the substrate and including a trench, at least one via structure penetrating the substrate and protruding above a bottom surface of the trench, and a conductive structure surrounding the at least one via structure in the trench may be provided.