A method of manufacturing a semiconductor device is provided. The method includes providing a semiconductor die at least partially encapsulated with an encapsulant. A first non-conductive layer is deposited over an active side of the semiconductor die and a surface of the encapsulant. A first opening is formed in the first non-conductive layer exposing a portion of a bond pad of the semiconductor die. A conductive interconnect trace is formed over a portion of the first non-conductive layer and the exposed portion of the bond pad. A second non-conductive layer is formed over the conductive interconnect trace and exposed portions of first non-conductive layer with a second opening formed in the second non-conductive layer exposing a portion of the conductive interconnect trace. A laser ablated structure is formed at a surface of the second non-conductive layer proximate to a perimeter of the second opening.

A manufacturing method a chip package structure. The carrier board includes a substrate and a stainless steel layer sputtered on the substrate. The substrate has multiple first cavities and at least one second cavity. The stainless steel layer conformally covers the first cavities and the second cavity to define multiple third cavities and at least one fourth cavity. Conductive blocks fill the third cavities. At least one metal layer covers the stainless steel layer, the conductive blocks, and the fourth cavity to define at least one fifth cavity. At least one chip is disposed inside the fifth cavity. At least one circuit structure layer is formed on the carrier board. A patterned circuit layer of the circuit structure layer is electrically connected with multiple electrodes of the chip. The carrier board and the circuit structure layer are separated to expose the conductive blocks and the metal layer.

A package that includes a first redistribution portion, a second redistribution portion, a third redistribution portion, a first encapsulation layer coupled to the first redistribution portion and the third redistribution portion, a first discrete device encapsulated by the first encapsulation layer, wherein the first discrete device is located between the first redistribution portion and the third redistribution portion, a second encapsulation layer coupled to the first redistribution portion and the second redistribution portion, and a second discrete device encapsulated by the second encapsulation layer, wherein the second discrete device is located between the first redistribution portion and the second redistribution portion.

An apparatus is provided which comprises: a first die having a first surface and a second surface, the first die comprising: a first layer formed on the first surface of the first die, and a second layer formed on the second surface of the first die; a second die coupled to the first layer; and a plurality of structures to couple the apparatus to an external component, wherein the plurality of structures is coupled to the second layer.

A semiconductor device includes lower circuit patterns on a lower substrate; lower bonding patterns on the lower circuit patterns, the lower bonding patterns including a conductive material and being electrically connected to the lower circuit patterns; upper bonding patterns on and contacting the lower bonding patterns, and including a conductive material; a passive device on the upper bonding patterns, and including a conductive material and contacting one of the upper bonding patterns; a gate electrode structure on the passive device, and including gate electrodes spaced apart from each other in a first direction, each of which extends in a second direction, and extension lengths in the second direction of the gate electrodes increasing from a lowermost level toward an uppermost level in a stepwise manner; a channel extending through at least a portion of the gate electrode structure; and an upper substrate on the channel.

An electronic package is provided, where a circuit layer and a metal layer having a plurality of openings are formed on a dielectric layer of a circuit portion to reduce the area ratio of the metal layer to the dielectric layer, so as to reduce stress concentration and prevent warping of the electronic package.

Exemplary embodiments for redistribution layers of integrated circuits are disclosed. The redistribution layers of integrated circuits of the present disclosure include one or more arrays of conductive contacts that are configured and arranged to allow a bonding wave to displace air between the redistribution layers during bonding. This configuration and arrangement of the one or more arrays minimize discontinuities, such as pockets of air to provide an example, between the redistribution layers during the bonding.

A package comprising a first integrated device comprising a plurality of first pillar interconnects; an encapsulation layer at least partially encapsulating the first integrated device; a metallization portion located over the first integrated device and the encapsulation layer, wherein the metallization portion includes at least one passivation layer and a plurality of metallization layer interconnects, wherein the plurality of first pillar interconnects is coupled to the plurality of metallization layer interconnects; and a second integrated device comprising a plurality of second pillar interconnects, wherein the second integrated device is coupled to the plurality of metallization layer interconnects through a plurality of second pillar interconnects and a plurality of solder interconnects.

A semiconductor package including a semiconductor chip having a chip pad thereon; a first insulating layer; a redistribution line pattern on the first insulating layer; a redistribution via pattern through the first insulating layer to connect the chip pad to the redistribution line pattern; a second insulating layer covering the redistribution line pattern and including a first part having a first thickness and a second part having a second thickness. the second part being inward relative to the first part; a first conductive pillar through the first part and connected to the redistribution line pattern; a second conductive pillar through the second part and connected to the redistribution line pattern; a first connection pad on the first conductive pillar; a second connection pad on the second conductive pillar; a first connection terminal contacting the first connection pad; and a second connection terminal contacting the second connection pad.

A described example includes: a reconstituted semiconductor device flip chip mounted on a device side surface of a package substrate, the package substrate having terminals for connecting the package substrate to a circuit board, the reconstituted semiconductor device further including: a semiconductor die mounted in a dielectric layer and having bond pads spaced from one another by at least a first pitch distance that is less than 100 microns; a redistribution layer formed over the bond pads having conductors in passivation layers; solder bumps on the redistribution layer coupled to the bond pads of the semiconductor die, the solder bumps spaced from one another by at least a second pitch distance that is greater than the first pitch distance; and solder joints formed between the package substrate and the solder bumps, the solder joints coupling the package substrate to the semiconductor die in the reconstituted semiconductor device.