Patent classifications
H01L2224/92222
Package structures
A package structure includes a semiconductor package, a thermal conductive gel, a thermal conductive film and a heat spreader. The thermal conductive gel is disposed over the semiconductor package. The thermal conductive film is disposed over the semiconductor package and the thermal conductive gel. A thermal conductivity of the thermal conductive film is different from a thermal conductivity of the thermal conductive gel. The thermal conductive film is surrounded by the heat spreader.
Fan-Out Package Having a Main Die and a Dummy Die
A fan-out package having a main die and a dummy die side-by-side is provided. A molding material is formed along sidewalls of the main die and the dummy die, and a redistribution layer having a plurality of vias and conductive lines is positioned over the main die and the dummy die, where the plurality of vias and the conductive lines are electrically connected to connectors of the main die.
Fan-Out Package Having a Main Die and a Dummy Die
A fan-out package having a main die and a dummy die side-by-side is provided. A molding material is formed along sidewalls of the main die and the dummy die, and a redistribution layer having a plurality of vias and conductive lines is positioned over the main die and the dummy die, where the plurality of vias and the conductive lines are electrically connected to connectors of the main die.
PHOTONIC DIE PACKAGE WITH EDGE LENS
Embodiments herein may include apparatuses, systems, and processes related to a photonic die package with an edge lens that includes a photonic integrated circuit (IC) die, a lens coupled to the photonic IC die and disposed at an edge of the package to provide an optical path at the edge of the package for photon signals generated or received by the photonic IC die, and an electronic IC die coupled to the photonic IC die, where the electronic IC die is to process electrical signals received from the photonic IC die, and where the electronic IC die and the photonic IC die are in a stack formation to facilitate thermal energy conduction from the electronic IC die to the photonic IC die. Other embodiments may be described and/or claimed.
PHOTONIC DIE PACKAGE WITH EDGE LENS
Embodiments herein may include apparatuses, systems, and processes related to a photonic die package with an edge lens that includes a photonic integrated circuit (IC) die, a lens coupled to the photonic IC die and disposed at an edge of the package to provide an optical path at the edge of the package for photon signals generated or received by the photonic IC die, and an electronic IC die coupled to the photonic IC die, where the electronic IC die is to process electrical signals received from the photonic IC die, and where the electronic IC die and the photonic IC die are in a stack formation to facilitate thermal energy conduction from the electronic IC die to the photonic IC die. Other embodiments may be described and/or claimed.
DIE ENCAPSULATION IN OXIDE BONDED WAFER STACK
Structures and methods of fabricating semiconductor wafer assemblies that encapsulate one or die in a cavity etched into an oxide bonded semiconductor wafer stack. The methods generally include the steps of positioning the die in the cavity, mechanically and electrically mounting the die to the wafer stack, and encapsulating the die within the cavity by bonding a lid wafer to the wafer stack in one of multiple ways. Semiconductor processing steps are applied to construct the assemblies (e.g., deposition, annealing, chemical and mechanical polishing, etching, etc.) and connecting the die (e.g., bump bonding, wire interconnecting, ultrasonic bonding, oxide bonding, etc.) according to the embodiments described above.
DIE ENCAPSULATION IN OXIDE BONDED WAFER STACK
Structures and methods of fabricating semiconductor wafer assemblies that encapsulate one or die in a cavity etched into an oxide bonded semiconductor wafer stack. The methods generally include the steps of positioning the die in the cavity, mechanically and electrically mounting the die to the wafer stack, and encapsulating the die within the cavity by bonding a lid wafer to the wafer stack in one of multiple ways. Semiconductor processing steps are applied to construct the assemblies (e.g., deposition, annealing, chemical and mechanical polishing, etching, etc.) and connecting the die (e.g., bump bonding, wire interconnecting, ultrasonic bonding, oxide bonding, etc.) according to the embodiments described above.
INTEGRATED CIRCUIT PACKAGE AND METHOD OF FORMING SAME
An integrated circuit package and a method of forming the same are provided. The method includes attaching an integrated circuit die to a first substrate. A dummy die is formed. The dummy die is attached to the first substrate adjacent the integrated circuit die. An encapsulant is formed over the first substrate and surrounding the dummy die and the integrated circuit die. The encapsulant, the dummy die and the integrated circuit die are planarized, a topmost surface of the encapsulant being substantially level with a topmost surface of the dummy die and a topmost surface of the integrated circuit die. An interior portion of the dummy die is removed. A remaining portion of the dummy die forms an annular structure.
INTEGRATED CIRCUIT PACKAGE AND METHOD OF FORMING SAME
An integrated circuit package and a method of forming the same are provided. The method includes attaching an integrated circuit die to a first substrate. A dummy die is formed. The dummy die is attached to the first substrate adjacent the integrated circuit die. An encapsulant is formed over the first substrate and surrounding the dummy die and the integrated circuit die. The encapsulant, the dummy die and the integrated circuit die are planarized, a topmost surface of the encapsulant being substantially level with a topmost surface of the dummy die and a topmost surface of the integrated circuit die. An interior portion of the dummy die is removed. A remaining portion of the dummy die forms an annular structure.
Face-to-face through-silicon via multi-chip semiconductor apparatus with redistribution layer packaging and methods of assembling same
Reduced-profile semiconductor device apparatus are achieved by thinning a semiconductive device substrate at a backside surface to expose a through-silicon via pillar, forming a recess to further expose the through-silicon via pillar, and by seating an electrical bump in the recess to contact both the through-silicon via pillar and the recess. In an embodiment, the electrical bump contacts a semiconductor package substrate to form a low-profile semiconductor device apparatus. In an embodiment, the electrical bump contacts a subsequent die to form a low-profile semiconductor device apparatus.