H01S3/1115

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
20180242441 · 2018-08-23 · ·

An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm.sup.2 and equal to or lower than a fluence of the main pulse laser beam.

PLANAR LIGHTWAVE CIRCUIT-BASED INTEGRATED OPTICAL CHIP

In an embodiment, an integrated optical chip comprises: a substrate; a plurality of planar lightwave circuit-based optical components that are formed on one surface of the substrate; and a plurality of optical waveguides that are formed on the one surface of the substrate and that connect the plurality of optical components to one another. In the embodiment, the plurality of optical components includes a saturable absorber having nonlinear loss characteristics. The saturable absorber may comprise: a core layer that is formed on the one surface of the substrate; an overcladding layer that wraps around at least a part of the core layer; and a saturable absorption layer that is formed on at least a part of the overcladding layer and that is arranged so as to interact with an evanescent field of light guided through at least a part of the core layer.

COMPACT MODE-LOCKED LASER MODULE

Apparatus and methods for producing ultrashort optical pulses are described. A high-power, solid-state, passively mode-locked laser can be manufactured in a compact module that can be incorporated into a portable instrument. The mode-locked laser can produce sub-50-ps optical pulses at a repetition rates between 200 MHz and 50 MHz, rates suitable for massively parallel data-acquisition. The optical pulses can be used to generate a reference clock signal for synchronizing data-acquisition and signal-processing electronics of the portable instrument.

Method for generating femtosecond vortex beams with high spatial intensity contrast

A method for generating femtosecond vortex beams with high spatial intensity contrast, where a noncollinearly pumped HG beam femtosecond laser generates femtosecond HG beam and a cylindrical lens mode converter converts the femtosecond HG beam to femtosecond LG vortex beam. The HG beam femtosecond laser comprises a pump source, a gain medium, a saturable absorption mirror as mode-locker, and an output coupler with a noncollinear angle between the laser beam and the pump beam in the gain medium, which enables the laser to generate pure, order-tunable femtosecond HG beams. Femtosecond vortex beams obtained after the cylindrical lens converter have high-intensity-contrast, and are topological charge-tunable.

Extreme ultraviolet light generation system
09980360 · 2018-05-22 · ·

An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm.sup.2 and equal to or lower than a fluence of the main pulse laser beam.

Tuning multi-input complex dynamic systems using sparse representations of performance and extremum-seeking control

Systems and methods for tuning multi-input complex dynamic systems in order to automatically obtain optimal performance are provided. Training is performed by measuring performance of the complex system using an objective function for a sparse sampling of input values over a variety of dynamic regimes. A sparse representation of the performance for each dynamic regime is stored in a library. At run-time, performance is measured and matched to a sparse representation in the library, and the complex system is configured with the optimal input values associated with the matching sparse representation from the library. Performance may then be optimized using an extremum-seeking controller. In some embodiments, the disclosed techniques are applied to a self-tuning mode-locked laser. In some embodiments, the disclosed techniques are applied to other complex systems such as phased array antennas and neurostimulation systems.

High pulse energy and high beam quality mini laser
09966723 · 2018-05-08 · ·

A laser including a solid state laser gain medium having a D-shaped cross section and an unstable resonator laser cavity including the solid state laser gain medium configured with a geometric magnification in a range of 1 to 5 under the intended operating conditions, including the effects of thermal lensing in the gain medium. An optical switching device in the unstable resonator laser cavity generates a pulse duration in the range of 0.05 to 100 nanoseconds. A diode-pump source is configured to inject pump light through the curved or barrel surface of the D-shaped gain medium.

Ultra-low noise mode-locked laser, methods, and applications

A mode-locked laser (MLL) that produces ultra-low phase noise optical and RF outputs, includes two nested resonant optical cavities including an optical fiber-based cavity and an etalon, and a three bandwidth Pound-Drever-Hall (PDH) frequency stabilizer assembly incorporating three different optical bandpass filters. The optical fiber-based cavity is characterized by a free spectral range, FSR.sub.fiber, and the etalon is characterized by a free spectral range, FSR.sub.filter, wherein FSR.sub.filter/FSR.sub.fiber is an integer equal to or greater than 2. A method of generating ultra-low phase noise optical and RF outputs is disclosed. Optical and RF outputs have a phase noise that is less than 100 dBc/Hz at 1 Hz and less than 150 dBc at 10 KHz.

SATURABLE-ABSORBER-BASED LASER SYSTEM

Provided are a saturable absorber including at least one material selected from a group of MXenes, and a Q-switching and mode-locked pulsed laser system using the same.

Passively mode-locking semiconductor disk laser (SDL)

A passively mode-locking laser and corresponding method is described. The laser comprises a resonator (2) terminated by first (3) and second (4) mirrors and folded by a third (5) and fourth (6) mirror. The third mirror comprises a reflector (14) surmounted by a multilayer semiconductor gain medium (15) including at least one quantum well layer while the second mirror (4) comprises an intensity saturable mirror. The resonator is configured to provide a cross sectional area of an intra cavity resonating field on the intensity saturable mirror that is greater than or equal to a cross sectional area of the intra cavity resonating field on the multilayer semiconductor gain medium. This arrangement provides a passively mode-locking laser that exhibits increased stability when compared to those systems known in the art.