The present invention provides a corrosion-resistant CuZn alloy, the alloy having a Zn content of from 15 to 55% by mass, the balance being Cu and inevitable impurities, wherein a total content of Zn and Cu is 99.995% by mass or more, and wherein a number of pores is 1/cm.sup.2 or less based on optical microscopic observation.

A line-narrowed KrF excimer laser apparatus includes a laser chamber, a line narrow optical system, an actuator, an output coupling mirror, a wavelength detecting unit, and a wavelength controller. The actuator is capable of changing a wavelength of light selected by the line narrow optical system. The wavelength detecting unit includes a low-pressure mercury lamp accommodating mercury, a getter material that adsorbs at least a part of the mercury, and a hot cathode that excites at least a part of the mercury, an etalon provided at a position where reference light emitted from the low-pressure mercury lamp and detected light emitted from the output coupling mirror are incident on the etalon, and a light intensity distribution sensor configured to detect an intensity distribution profile of interference fringes of the reference light and an intensity distribution profile of interference fringes of the detected light.

A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.

A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.

A narrowband laser apparatus may be provided with a laser resonator including optical elements for narrowing a spectral linewidth, a spectrometer configured to detect spectral intensity distributions of multiple pulses included in a pulsed laser beam output from the laser resonator, a spectral waveform producer configured to produce a spectral waveform by adding up the spectral intensity distributions of the multiple pulses, a device function storage configured to store a device function of the spectrometer, a wavelength frequency function generator configured to generate a wavelength frequency function which represents a frequency distribution of center wavelengths of the multiple pulses, and a deconvolution processor configured to perform deconvolution processing on the spectral waveform with the device function and the wavelength frequency function.

A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.

A copper electrode material comprising Cu and unavoidable impurities, wherein the content of the unavoidable impurities is 1 ppm by mass or less and the average crystal grain diameter is 100 m or less. A copper-containing electrode material having improved corrosion resistance is provided by the copper electrode material.

The present architecture utilizes a Nonlinear Scattering Aperture Combiner that does not need to be optically multiplexed and then drives a Direct Compressor stage that produces a large temporal compression ratio to pump a Fast Compressor. This eliminates the need for a separate array of ATDMs, multiplexing optical elements, and, at the approximate 10.sup.7 joule energy output required for ICF, reduces the number of mechanical elements and gas interfaces from the order of 10.sup.3 to about 10. In addition, this provides a large reduction of the volume of the gas containment region. In order to accomplish this, a technique for transversely segmenting by color and/or polarization of the optical extraction beams of the Direct Compressor has been invented. In particular, it is directed towards the integration of the Direct Compressor with the Primary Laser Source and Fast Compressor. The embodiments describe how the high operating fluence are addressed in terms of avoiding optical damage and how to integrate the stages in fluid mechanical and optical aspects.

Methods and systems for sterilizing a room are disclosed, including using a laser to generate a pulsed laser beam; using a robotic arm to direct the pulsed laser beam to a scattering optical element and to change the position of the scattering optical element; and using the scattering optical element to substantially isotropically scatter the radiation of the pulsed laser beam to sterilize the room. The scattering optical element comprises a hollow fused silica bulb filled with solid fused silica spheres or a fiber optic bundle and in some embodiments the scattering optical element is rotated. The pulsed laser beam comprises a wavelength ranging between about 200 nm to about 320 nm and in some embodiments comprises nanosecond or picosecond light pulses. Other embodiments are described and claimed.

The laser system may include first and second laser apparatuses and a beam delivery device. The first laser apparatus may be provided so as to emit a first laser beam to the beam delivery device in a first direction. The second laser apparatus may be provided so as to emit a second laser beam to the beam delivery device in a direction substantially parallel to the first direction. The beam delivery device may be configured to bundle the first and second laser beams and to emit the first and second laser beams from the beam delivery device to a beam delivery direction different from the first direction.