A acoustic wave resonator comprises a piezoelectric substrate and a plurality of interdigital transducer (IDT) electrodes disposed on the piezoelectric substrate, the plurality of IDT electrodes formed of a mixture of tungsten and chromium to provide for reduction in size and increase in quality factor of the acoustic wave resonator.

An elastic wave device includes a piezoelectric film, a high acoustic velocity member, a low acoustic velocity film located between the piezoelectric film and the high acoustic velocity member and through which an elastic wave propagates at a lower acoustic velocity than an elastic wave that propagates through the piezoelectric film, and an interdigital transducer electrode including electrode fingers separated from each other and disposed side by side in a first direction. At least one of the electrode fingers includes a first metal layer including first and second main body portions. A recessed portion is located in a central region in the first direction of the electrode finger and is recessed in the thickness direction of the piezoelectric film. A protrusion portion protrudes from at least a portion of the first main body portion in the first direction.

Disclosed is a device that includes a crystalline substrate and a patterned aluminum-based material layer disposed onto the crystalline substrate. The patterned aluminum-based material layer has a titanium-alloyed surface. A titanium-based material layer is disposed over select portions of the titanium-alloyed surface. In an exemplary embodiment, the patterned aluminum-based material layer forms a pair of interdigitated transducers to provide a surface wave acoustic (SAW) device. The SAW device of the present disclosure is usable to realize SAW-based filters for wireless communication equipment.

An acoustic wave device includes a support substrate, a piezoelectric film, and an IDT electrode. When a wavelength defined by an electrode finger pitch of the IDT electrode is λ, a thickness of the piezoelectric film is about 1λ or less. The piezoelectric film has crystal axes. The support substrate includes first and second silicon layers. A plane orientation of the first and second silicon layers is (100), (110), or (111). When angles α1 and β2 are defined between the plane orientations of the first and second silicon layers and the crystal axes, each of the angles α1 and α2 is one of three types of angles of an angle α.sub.100, an angle α.sub.110, and an angle α.sub.111. A type of the angle α1 is different from a type of the angle α2 and/or a value of the angle α1 is different from a value of the angle α2.

When a current flowing in a series circuit including an equivalent resistance, an equivalent inductor, and an equivalent capacitance in an electric equivalent circuit of a specific resonator in each filter is defined as an acoustic path current, under conditions that a phase of an acoustic path current of a first transmission filter at a side of a common terminal at a frequency within a first transmission band is represented as θ1.sub.Tx, a phase of an acoustic path current of the first transmission filter at the side of the common terminal at a frequency within a second transmission band is represented as θ2.sub.Tx, a phase of an acoustic path current of a first reception filter at the side of the common terminal at a frequency within the first transmission band is represented as θ1.sub.Rx, and a phase of an acoustic path current of the first reception filter at the side of the common terminal at a frequency within the second transmission band is represented as θ2.sub.Rx, a multiplexer satisfies a first condition: |(2.Math.θ1.sub.Tx−θ2.sub.Tx)−(2.Math.θ1.sub.Rx−θ2.sub.Rx)|=180°±90°, or a second condition: |(2.Math.θ2.sub.Tx−θ1.sub.Tx)−(2.Math.θ2.sub.Rx−θ1.sub.Rx)|=180°±90°.

An elastic wave device includes a piezoelectric substrate made of LiNbO.sub.3, interdigital transducer electrodes on the piezoelectric substrate, and a first dielectric film provided on the piezoelectric substrate and the first dielectric film to cover the IDT electrodes and made of a silicon oxide. The IDT electrodes include a first metal film made of one metal selected from Pt, Cu, Mo, Au, W, and Ta. The Euler angles (ϕ, θ, ψ) of the piezoelectric substrate are (0±5°, −90°≤θ≤−70°, 0°±5°). The metal for the first metal film and the thickness hm/λ (%) match any of the combinations as follows: TABLE-US-00001 Metal for the first metal film Thickness hm/λ (%) of the first metal film Pt 6.5 ≤ hm/λ ≤ 25 Cu  13 ≤ hm/λ ≤ 25 Mo 15.5 ≤ hm/λ ≤ 25  Au 6.5 ≤ hm/λ ≤ 25 W 7.5 ≤ hm/λ ≤ 25 Ta .sup.  7 ≤ hm/λ ≤ 25.

An elastic wave device includes a piezoelectric substrate, an IDT electrode on the piezoelectric substrate, and a silicon oxide film arranged on the piezoelectric substrate to cover the IDT electrode. The IDT electrode includes first and second electrode layers laminated on each other, the first electrode layer is made of metal or an alloy with a density higher than a density of metal of the second electrode layer and a density of silicon oxide of the silicon oxide film, the piezoelectric substrate is made of LiNbO.sub.3 and θ is in a range of equal to or greater than about 8° and equal to or less than about 32° with Euler Angles (0°±5°, θ, 0°±10°) of the piezoelectric substrate, and the silicon oxide film contains hydrogen atoms, hydroxyl groups, or silanol groups.

An acoustic wave device includes first and second IDT electrodes electrically connected in series with each other by a common busbar common to the first and second IDT electrodes. In each of a first acoustic impedance layer and a second acoustic impedance layer, at least one of at least one high acoustic impedance layer and at least one low acoustic impedance layer is a conductive layer. At least a portion of the conductive layer in the first acoustic impedance layer and at least a portion of the conductive layer in the second acoustic impedance layer do not overlap with the common busbar when viewed in plan from a thickness direction of a piezoelectric layer. The conductive layer in the first acoustic impedance layer and the conductive layer in the second acoustic impedance layer are electrically insulated from each other.

An acoustic wave device includes a support substrate including silicon, a piezoelectric layer provided directly or indirectly on the support substrate, and an interdigital transducer (IDT) electrode provided on the piezoelectric layer. When a wavelength defined by an electrode finger pitch of the IDT electrode is λ, a thickness of the piezoelectric layer is about 1λ or less. V.sub.L, which is an acoustic velocity of a longitudinal wave component of a bulk wave propagating through the piezoelectric layer, satisfies Unequal Equation (2) below in relation to an acoustic velocity V.sub.Si-1 determined by Equation (1) below:
V.sub.Si-1=(V.sub.2).sup.1/2 (m/sec)  Equation (1),
V.sub.Si-1≤V.sub.L  Unequal Equation (2), V.sub.2 in Equation (1) is a solution of Equation (3), and
Ax.sup.3+Bx.sup.2+Cx+D=0  Equation (3).

When a current flowing in a series circuit including an equivalent resistance, an equivalent inductor, and an equivalent capacitance in an electric equivalent circuit of a specific resonator in each filter is defined as an acoustic path current, under conditions that a phase of an acoustic path current of a first transmission filter at a side of a common terminal at a frequency within a first pass band is represented as θ1.sub.Tx1, a phase of an acoustic path current of the first transmission filter at the side of the common terminal at a frequency within a second pass band is represented as θ2.sub.Tx1, a phase of an acoustic path current of a second transmission filter at the side of the common terminal at a frequency within the first pass band is represented as θ1.sub.Tx2, and a phase of an acoustic path current of the second transmission filter at the side of the common terminal at a frequency within the second pass band is represented as θ2.sub.Tx2, a multiplexer satisfies a first condition: |(2.Math.θ1.sub.Tx1−θ2.sub.Tx1)−(2.Math.θ1.sub.Tx2−θ2.sub.Tx2)|=180°±90°, or a second condition: |(2.Math.θ2.sub.Tx1−θ1.sub.Tx1)−(2.Math.θ2.sub.Tx2−θ1.sub.Tx2)|=180°±90°.