H05H1/3494

TORCH INDICATOR APPARATUS AND METHODS
20210086285 · 2021-03-25 ·

According to one embodiment, a welding or plasma cutting system is provided that includes a torch having a torch body. Located on or in the torch body are one or more status indicators that provide, for example, a status of a process parameter (e.g. current data, pressure data, etc.) and/or of an operating mode of the torches. Control circuitry coupled to the one or more status indicators is configured to activate the one or more status indicators prior to a carrying out of a welding or plasma cutting operation through use of the torch and to deactivate the one or more status indicators during a time when the welding or plasma cutting operation is being carried out by the torch. An associated method of operating the torch includes activating the one or more status indicators prior to a carrying out of a welding or plasma cutting operation by use of the torch, and during a time when the welding or plasma cutting operation is being carried out by use of the torch, deactivating the one or more status indicators.

PLASMA CUTTING MACHINE AND METHOD FOR CONTROLLING PLASMA CUTTING MACHINE
20210053141 · 2021-02-25 ·

A plasma torch moves to a piercing position. The plasma torch generates a plasma arc and starts a piercing step at the piercing position. Whether the piercing step is completed is determined based on the arc voltage. The plasma torch is held at the piercing position in the horizontal direction from the start of the piercing step until the completion of the piercing step. The plasma torch is moved in a predetermined direction including at least the horizontal direction after the piercing step is completed.

Configuring Signal Devices in Thermal Processing Systems
20230419055 · 2023-12-28 ·

In some aspects, material processing head can include a body; an antenna disposed within the body; a first tag, associated with a first consumable component, disposed within a flux communication zone of the body at a first distance from the antenna, the first tag having a first resonant frequency; and a second tag, associated with a second consumable component, disposed within the flux communication zone of the body at a second distance from the antenna, the second tag having a second resonant frequency that is different than the first resonant frequency, where the first and second resonant frequencies are tuned based upon at least one of: i) a difference between the first distance and the second distance; or ii) a characteristic (e.g., shape) of the flux communication zone in which the first tag and/or the second tag is disposed.

METHODS AND APPARATUS FOR FORMING A PIERCE HOLE IN A WORKPIECE
20210205913 · 2021-07-08 ·

Methods for forming pierce holes in a metal workpiece are disclosed. According to one implementation, upon a plasma torch be energized, the cutting axis of the torch is rotated repeatedly between first and second angular positions to produce successively deeper pierces in a workpiece until a pierce hole is produced through a thickness of the workpiece. According to other implementations pierce holes are produced by rotating the cutting axis of the plasma torch tip around a designated central axis of the pierce hole in a diametrically reducing manner so that the produced pierce hole has a tapered profile with a cross-sectional area of the pierce hole at a top surface of the workpiece being greater than a cross-sectional area of the pierced hole at a bottom surface of the workpiece.

Substrate support with electrically floating power supply

Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC voltage, and methods of applying a pulsed DC voltage, to a substrate during plasma assisted or plasma enhanced semiconductor manufacturing processes.

PLASMA EXPOSURE DEVICE

A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply device. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.

Configuring Signal Devices in Thermal Processing Systems
20200293727 · 2020-09-17 ·

In some aspects, material processing head can include a body; an antenna disposed within the body; a first tag, associated with a first consumable component, disposed within a flux communication zone of the body at a first distance from the antenna, the first tag having a first resonant frequency; and a second tag, associated with a second consumable component, disposed within the flux communication zone of the body at a second distance from the antenna, the second tag having a second resonant frequency that is different than the first resonant frequency, where the first and second resonant frequencies are tuned based upon at least one of: i) a difference between the first distance and the second distance; or ii) a characteristic (e.g., shape) of the flux communication zone in which the first tag and/or the second tag is disposed.

Plasma generation device
10772181 · 2020-09-08 · ·

A plasma generation device including an electric power supply device to supply electric power to multiple electrodes arranged in a reaction chamber; a processing gas supply device to supply a processing gas to the reaction chamber; and a control device to control operation of the electric power supply device and the processing gas supply device in either of a first operation mode in which, when a stop signal is received while electric power is being supplied to the electrodes in a state with the processing gas being supplied to the reaction chamber, supply of electric power to the electrodes is stopped and supply of the processing gas to the reaction chamber is stopped, and a second operation mode in which supply of electric power to the electrodes is stopped, but the processing gas continues to be supplied to the reaction chamber.

Reducing restart cycle time of a plasma blow back torch for improved marking

Techniques for extinguishing a plasma arc in a blowback plasma torch are provided. The plasma arc can be extinguished by bringing the electrode into contact with the nozzle and out of contact with the nozzle while the power supply and flow of gas are left on. In particular, while current is flowing through the electrode, the electrode may be brought into contact with the nozzle to extinguish the plasma arc.

Controlling plasma arc torches and related systems and methods

In some aspects, methods for limiting damage to a plasma arc torch body resulting from a consumable failure within the torch can include determining a specified conductivity parameter set point of a current to be provided to the plasma arc torch for a material processing operation; measuring a detected conductivity parameter of plasma arc current being provided to the plasma torch to perform the material processing operation; comparing the specified conductivity parameter set point to the detected conductivity parameter of plasma arc current and calculating an error term signal; and based on a determination that the error term signal exceeds a threshold amount, initiating a plasma arc shut down sequence to extinguish the plasma arc to limit damage to the plasma arc torch body.