According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.

According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.

A material processing system for performing a processing operation includes a processor that receives information from a user relating to a proposed processing operation to be performed by the material processing system. The processor determines, responsive to the information received from the user, two or more configurations of consumable components for performing the proposed processing operation and estimates processing performance capabilities associated with using each configuration of consumable components. An interactive display presents the estimated processing performance capabilities to the user for selection.

A material processing system for performing a processing operation includes a processor that receives information from a user relating to a proposed processing operation to be performed by the material processing system. The processor determines, responsive to the information received from the user, two or more configurations of consumable components for performing the proposed processing operation and estimates processing performance capabilities associated with using each configuration of consumable components. An interactive display presents the estimated processing performance capabilities to the user for selection.

A novel plasma generation and containment system includes a first electrode, a second electrode, a power source, and an electromagnet. The first electrode and the second electrode are electrically coupled via a wire to form an open circuit. The voltage is asserted on the open circuit to form a spark between the first electrode and the second electrode to form a closed circuit. Then, a current is asserted on the closed circuit to form a plasma between the first electrode and the second electrode. The electromagnet provides a magnetic field to contain and compress the plasma.

A novel plasma generation and containment system includes a first electrode, a second electrode, a power source, and an electromagnet. The first electrode and the second electrode are electrically coupled via a wire to form an open circuit. The voltage is asserted on the open circuit to form a spark between the first electrode and the second electrode to form a closed circuit. Then, a current is asserted on the closed circuit to form a plasma between the first electrode and the second electrode. The electromagnet provides a magnetic field to contain and compress the plasma.

This DC pulse power supply device comprises a voltage clamper including a capacitor that is connected in parallel to a DC reactor in a chopper circuit provided in a pulsing unit in order to suppress increases in the surge voltage resulting from the leakage inductance of the DC reactor. During the start-up of pulsing operation, which is the initial stage of the pulse mode, the frequency of the pulsing operation of the chopper circuit is controlled over the period until the capacitor voltage is charged to a sufficient voltage to reset the magnetic saturation of the DC reactor.

In a DC pulse power supply device according to the present invention, at the time of starting pulsing operation, the duty of the pulsing operation of a chopper circuit is controlled, a switching element is set to an ON state, and the pulse width at which the DC reactor is in an energized state is made variable over the period until the capacitor voltage is charged to a sufficient voltage to reset the magnetic saturation of the DC reactor. Gradually increasing the pulse width suppresses the degree of increase in the DC reactor current, and suppresses the DC reactor current below the magnetic saturazion level. As a result, the magnetic saturation of the DC reactor is suppressed at the time of starting pulsing operation.

The present disclosure discloses a numerically-controlled plasma special-shaped cutting machine tool including a bracket, a cross beam, a feeding mechanism, a clamping mechanism, a gun head moving mechanism, a material conveying system, a material receiving device, a dedusting system, an electrical control system, and an outer cover. The present disclosure adopts plasma cutting, and the surface quality is obviously improved. Material conveying and cutting are performed by a predetermined program programmed in advance, and the dimensional precision of the machining is well ensured. Workers only need to place a workpiece material on the material conveying system, and the machine tool can perform automatic cutting. The labor intensity of the workers is greatly reduced, the cutting is continuously performed, and the machining efficiency is remarkably improved.

The invention relates to an electrode arrangement for a plasma jet device comprising a first and a second printed circuit board each having an exposed surface of a circuit path serving as electrode and facing the other printed circuit board, a spacer arranged between the first and second circuit board and a plasma cell arranged between the first and second printed circuit board and the spacer wherein the plasma cell has a gas inlet and a plasma outlet. The invention further relates to a plasma head comprising said electrode arrangement.