A plasma generating apparatus may include a cathode assembly including a cathode, an anode assembly including an anode having therein a plasma generation space, and one or more magnetic force generators configured to generate a magnetic force. The anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space. The gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and said one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.

A novel plasma generation and containment system includes a first electrode, a second electrode, a power source, and an electromagnet. The first electrode and the second electrode are electrically coupled via a wire to form an open circuit. The voltage is asserted on the open circuit to form a spark between the first electrode and the second electrode to form a closed circuit. Then, a current is asserted on the closed circuit to form a plasma between the first electrode and the second electrode. The electromagnet provides a magnetic field to contain and compress the plasma.

A novel plasma generation and containment system includes a first electrode, a second electrode, a power source, and an electromagnet. The first electrode and the second electrode are electrically coupled via a wire to form an open circuit. The voltage is asserted on the open circuit to form a spark between the first electrode and the second electrode to form a closed circuit. Then, a current is asserted on the closed circuit to form a plasma between the first electrode and the second electrode. The electromagnet provides a magnetic field to contain and compress the plasma.

A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.

A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.

The present invention concerns a device for the production of hydrogen and solid carbon from C.sub.1 to C.sub.4-alkane-containing gas by means of thermal plasma, a process for the production of hydrogen and solid carbon from C.sub.1 to C.sub.4-alkane-containing gas by means of thermal plasma, and the use of a device in a process for the production of hydrogen and solid carbon from C.sub.1 to C.sub.4-alkane-containing gas by means of a process of the invention.

The present invention concerns a device for the production of hydrogen and solid carbon from C.sub.1 to C.sub.4-alkane-containing gas by means of thermal plasma, a process for the production of hydrogen and solid carbon from C.sub.1 to C.sub.4-alkane-containing gas by means of thermal plasma, and the use of a device in a process for the production of hydrogen and solid carbon from C.sub.1 to C.sub.4-alkane-containing gas by means of a process of the invention.

An atomic beam generator includes a cathode constituted as a housing having an emission surface provided with an irradiation port through which an atomic beam is emissive; an anode disposed inside the cathode to generate plasma between the cathode and the anode; and a magnetic field generating unit including a first magnetic field generating unit that generates a first magnetic field and a second magnetic field generating unit that generates a second magnetic field, and guiding positive ions produced in the cathode to the emission surface by generating, in the cathode, the first magnetic field and the second magnetic field both parallel to the emission surface such that a magnetic field direction is leftward in the first magnetic field and is rightward in the second magnetic field when viewed from an emission surface side on condition of the first magnetic field being positioned above the second magnetic field.

An atomic beam generator includes a cathode constituted as a housing having an emission surface provided with an irradiation port through which an atomic beam is emissive; an anode disposed inside the cathode to generate plasma between the cathode and the anode; and a magnetic field generating unit including a first magnetic field generating unit that generates a first magnetic field and a second magnetic field generating unit that generates a second magnetic field, and guiding positive ions produced in the cathode to the emission surface by generating, in the cathode, the first magnetic field and the second magnetic field both parallel to the emission surface such that a magnetic field direction is leftward in the first magnetic field and is rightward in the second magnetic field when viewed from an emission surface side on condition of the first magnetic field being positioned above the second magnetic field.

Design advances for improving the performance of a plasma torch. The use of one or more of various advances described herein can improve the efficiency and effectiveness of the torch, the reactor and the manufacturing process. The use of the torch with hydrogen plasma gas, natural gas feedstock, and carbon black production are also described.