A plasma spraying apparatus includes a supplier configured to carry powder of a spray material by a plasma generation gas and jet the powder of the spray material and the plasma generation gas from an opening at a leading end thereof; a plasma generator configured to form, by using the jetted plasma generation gas, a plasma having an axis center shared by the supplier; a magnetic field generator configured to generate a magnetic field in a space where the plasma is formed; and a controller configured to control the magnetic field generator to control a deflection of the plasma.

A plasma spraying apparatus includes a supplier configured to carry powder of a spray material by a plasma generation gas and jet the powder of the spray material and the plasma generation gas from an opening at a leading end thereof; a plasma generator configured to form, by using the jetted plasma generation gas, a plasma having an axis center shared by the supplier; a magnetic field generator configured to generate a magnetic field in a space where the plasma is formed; and a controller configured to control the magnetic field generator to control a deflection of the plasma.

A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.

A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.

Provided is a composite device for treatment including a power electrode, a ground electrode provided on one end of the power electrode, a coil surrounding the other end of the power electrode, a high voltage power source electrically connected to the power electrode, and a low voltage power source electrically connected to the coil. The power electrode includes a soft magnetic body, and the low voltage power source provides an AC voltage to the coil.

Provided is a composite device for treatment including a power electrode, a ground electrode provided on one end of the power electrode, a coil surrounding the other end of the power electrode, a high voltage power source electrically connected to the power electrode, and a low voltage power source electrically connected to the coil. The power electrode includes a soft magnetic body, and the low voltage power source provides an AC voltage to the coil.

A method and apparatus for making carbon black. A plasma gas is flowed into a plasma forming region containing at least one, magnetically isolated, plasma torch containing at least one electrode, and forming a plasma. Collecting the plasma formed in a cooled header and flowing the plasma through at least one reaction region to heat the reaction region, and injecting carbon black forming feedstock into the reaction region, resulting in the formation of at least one grade of carbon black. An apparatus for making carbon black is also described including a plasma forming section containing at least one, magnetically isolated plasma torch containing at least one electrode, in fluid flow communication with at least one carbon black forming reactor section, the plasma section and reactor section separated by a plasma formed collection header.

A method and apparatus for making carbon black. A plasma gas is flowed into a plasma forming region containing at least one, magnetically isolated, plasma torch containing at least one electrode, and forming a plasma. Collecting the plasma formed in a cooled header and flowing the plasma through at least one reaction region to heat the reaction region, and injecting carbon black forming feedstock into the reaction region, resulting in the formation of at least one grade of carbon black. An apparatus for making carbon black is also described including a plasma forming section containing at least one, magnetically isolated plasma torch containing at least one electrode, in fluid flow communication with at least one carbon black forming reactor section, the plasma section and reactor section separated by a plasma formed collection header.

This specification describes systems, methods, and architectures related to generating a plasma shield for laser operations. An example system for generating a plasma shield includes a laser head for directing a laser beam towards a target area on a workpiece. The path of the laser beam from the laser head to the target area on the workpiece is substantially surrounded by a plasma shield, which may form a gas-impermeable barrier. The plasma shield is configured to prevent the ingress of atmospheric or environmental gases, for example oxygen, into an area which would allow the gas to be in contact with the area of the workpiece being interacted with by a laser beam. The shape or location of the plasma shield may be controlled or altered using a magnetic field.

This specification describes systems, methods, and architectures related to generating a plasma shield for laser operations. An example system for generating a plasma shield includes a laser head for directing a laser beam towards a target area on a workpiece. The path of the laser beam from the laser head to the target area on the workpiece is substantially surrounded by a plasma shield, which may form a gas-impermeable barrier. The plasma shield is configured to prevent the ingress of atmospheric or environmental gases, for example oxygen, into an area which would allow the gas to be in contact with the area of the workpiece being interacted with by a laser beam. The shape or location of the plasma shield may be controlled or altered using a magnetic field.