Patent classifications
H10K10/486
Layer, multilevel element, method for fabricating multilevel element, and method for driving multilevel element
A layer according to one embodiment of the present invention may exhibit a first number of electron states in a low-level electron energy range in a conduction band, and exhibit a second number of electron states in a high-level electron energy range higher than the low-level electron energy level in the conduction band, wherein localized states may exist between the low-level electron energy range and the high-level electron energy level.
Organic electroluminescent transistor
The present teachings relate to an organic electroluminescent transistor with improved light-emission characteristics. More specifically, the present organic electroluminescent transistor has an emissive ambipolar channel including at least one layer of an n-type semiconductor material, at least one layer of a p-type semiconductor material, and at least one layer of an emissive material arranged between the layers of the p-type and n-type semiconductor materials, where the multilayer emissive ambipolar channel includes, among various layers, a layer of a p-type semiconductor material comprising a benzothieno-benzothiophene compound, and/or a layer of an emissive material comprising a blend material that includes an organic carbazole derivative as the host matrix compound and an iridium complex as the guest emitter.
TFT ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
The invention provides a TFT array substrate and manufacturing method thereof. The manufacturing method adopts a dual-layer structure for the active layer. The first active layer adopts a new semiconductor material of carbon nanotubes, graphene, silicon carbide, molybdenum disulfide or organic semiconductor materials. The second active layer is disposed on the first active layer to protect the first active layer of the new semiconductor material from the wet etching and CVD process as an etch stop layer and facilitates the active layer of the TFT device to possess combined excellent properties of two semiconductor materials.
Nanofilm, thin film transistor, and manufacture methods thereof
Disclosed is a nanofilm, a thin film transistor and manufacture methods thereof. The nanofilm of the present disclosure comprises a plurality of regions distributed in a film plane dimension, wherein each of the regions is composed of one kind of nanomaterial, and nanomaterials of adjacent regions are different from each other and contact with each other to form a heterojunction or a Schottky junction.
MULTI-LEVEL DEVICE AND METHOD OF MANUFACTURING THE SAME
Disclosed herein are a multi-level device which has a ternary characteristic and can reduce hysteresis, and a method of manufacturing the same. The multi-level device can have a plurality of turn-on voltages, that is, a plurality of threshold voltages, thereby providing multi-level conductivity as a ternary device characteristic. In addition, a double insulating layer made of a dielectric layer and an organic polymer layer is used as a separation layer for channel layer separation, and by removing the hysteresis due to a trap charge at an interface between a channel layer and an insulating layer, a uniform ternary characteristic can always be maintained, and by forming the channel layer on an organic polymer layer, the channel layer can be more stably formed on the insulating layer.
Transistors with channels formed of low-dimensional materials and method forming same
A method includes forming a first low-dimensional layer over an isolation layer, forming a first insulator over the first low-dimensional layer, forming a second low-dimensional layer over the first insulator, forming a second insulator over the second low-dimensional layer, and patterning the first low-dimensional layer, the first insulator, the second low-dimensional layer, and the second insulator into a protruding fin. Remaining portions of the first low-dimensional layer, the first insulator, the second low-dimensional layer, and the second insulator form a first low-dimensional strip, a first insulator strip, a second low-dimensional strip, and a second insulator strip, respectively. A transistor is then formed based on the protruding fin.
System on chip (SoC) based on neural processor or microprocessor
System on chips (SoCs) based on a microprocessor or a neural processor (e.g., brain-inspired processor) electrically coupled with electronic memory devices and/or optically coupled with an optical memory device, along with embodiment(s) of a building block (an element) of the microprocessor/neural processor, the electronic memory device and the optical memory device are disclosed. It should be noted that a microprocessor can include a graphical processor.
ORGANIC FIELD EFFECT TRANSISTOR COMPRISING SEMICONDUCTING SINGLE-WALLED CARBON NANOTUBES AND ORGANIC SEMICONDUCTING MATERIAL
The present invention provides organic field effect transistors comprising a double layer consisting of i) a first layer comprising a percolating network of single-walled carbon nanotubes having a content of at least 95% by weight of semiconducting single-walled carbon nanotubes, and ii) a second layer comprising an organic semiconducting material, as well as a process for the preparation of the organic field effect transistor.
SELF-ALIGNED SHORT-CHANNEL ELECTRONIC DEVICES AND FABRICATION METHODS OF SAME
A self-aligned short-channel SASC electronic device includes a first semiconductor layer formed on a substrate; a first metal layer formed on a first portion of the first semiconductor layer; a first dielectric layer formed on the first metal layer and extended with a dielectric extension on a second portion of the first semiconductor layer that extends from the first portion of the first semiconductor layer, the dielectric extension defining a channel length of a channel in the first semiconductor layer; and a gate electrode formed on the substrate and capacitively coupled with the channel. The dielectric extension is conformally grown on the first semiconductor layer in a self-aligned manner. The channel length is less than about 800 nm, preferably, less than about 200 nm, more preferably, about 135 nm.
Semiconductor thin-film and manufacturing method thereof, thin-film transistor, and display apparatus
A method for manufacturing a semiconductor thin film includes sequentially forming a first semiconductor layer, an intermediate layer, and a second semiconductor layer over a substrate. The first semiconductor layer and the second semiconductor layer can be one and another of an n-type semiconductor layer and a p-type semiconductor layer. At least one of the first semiconductor layer, the intermediate layer, or the second semiconductor layer is formed via a solution process. The n-type semiconductor layer can include indium oxide. The intermediate layer can include a self-assembly material. The p-type semiconductor layer can include a p-type organic semiconductor material, and can be pentacene. On the basis, a semiconductor thin film manufactured thereby, a semiconductor thin film transistor, and a display apparatus, are also disclosed.