The present technique relates to a light-receiving element that enables a dark current to be suppressed while improving quantum efficiency using Ge or SiGe, a method of manufacturing the light-receiving element, and an electronic device. The light-receiving element includes: a pixel array region where pixels in which at least a photoelectric conversion region is formed of a SiGe region or a Ge region are arrayed in a matrix pattern; and an AD converting portion provided in pixel units of one or more pixels. The present technique can be applied to, for example, a ranging module that measures a distance to a subject, and the like.

A monolithic sensor for detecting infrared and visible light according to an example includes a semiconductor substrate and a semiconductor layer coupled to the semiconductor substrate. The semiconductor layer includes a device surface opposite the semiconductor substrate. A visible light photodiode is formed at the device surface. An infrared photodiode is also formed at the device surface and in proximity to the visible light photodiode. A textured region is coupled to the infrared photodiode and positioned to interact with electromagnetic radiation.

An imaging element according to an embodiment of the present disclosure includes: a semiconductor substrate having an effective pixel region in which a plurality of pixels is disposed and a peripheral region provided around the effective pixel region; a photoelectric converter; a first hydrogen block layer; an interlayer insulating layer; and a separation groove. The photoelectric converter includes a first electrode, a second electrode, and an electric charge accumulation layer and a photoelectric conversion layer. The first electrode is provided on a light receiving surface side of the semiconductor substrate and includes a plurality of electrodes. The second electrode is disposed to be opposed to the first electrode. The electric charge accumulation layer and the photoelectric conversion layer are stacked and provided in order between the first electrode and the second electrode and extend in the effective pixel region. The first hydrogen block layer covers a top and a side surface of the photoelectric conversion layer and a side surface of the electric charge accumulation layer. The interlayer insulating layer is provided between the semiconductor substrate and the photoelectric converter. The separation groove separates the interlayer insulating layer in at least a portion of a region between the effective pixel region and the peripheral region. The separation groove has a side surface and a bottom surface covered with the first hydrogen block layer.

Disclosed is an image sensor including a substrate having a first surface and a second surface opposite to each other, a first photoelectric conversion region and a second photoelectric conversion region in the substrate, a through electrode between the first and second photoelectric conversion regions, an insulation structure on the second surface of the substrate, a first color filter and a second color filter respectively provided on the first and second photoelectric conversion regions, and a photoelectric conversion layer on the insulation structure and electrically connected to the through electrode. The through electrode include a first end adjacent to the first surface and a second end adjacent to the second surface. The first end has a non-planar shape.

There is provided a solid state image sensor including a photoelectric conversion unit formed and embedded in a semiconductor substrate, an impurity region that retains an electric charge generated by the photoelectric conversion unit, and a transfer transistor that transfers the electric charge to the impurity region. A gate electrode of the transfer transistor is formed in a depth direction toward the photoelectric conversion unit in the semiconductor substrate, from a surface of the semiconductor substrate on which the impurity region is formed. A channel portion of the transfer transistor is surrounded by the gate electrode in two or more directions other than a direction of the impurity region, as seen from the depth direction.

A photoelectric conversion element according to an embodiment of the present disclosure includes: a first electrode; a second electrode opposed to the first electrode; and an organic photoelectric conversion layer provided between the first electrode and the second electrode and formed using a plurality of materials having average particle diameters different from each other, the plurality of materials including at least fullerene or a derivative thereof.

To prevent a part of charges from flowing into an electrode during accumulation of photoelectric-converted charges. A solid-state imaging device including a first substrate that performs photoelectric conversion and a second substrate that reads photoelectric-converted photocurrent, the first substrate and the second substrate being stacked, in which the first substrate includes: a photoelectric conversion part; a first insulating film that is disposed closer to the second substrate than the photoelectric conversion part and accumulates and transfers charge photoelectric-converted by the photoelectric conversion part; a first electrode disposed closer to the second substrate than the first insulating film and disposed facing the photoelectric conversion part; a second electrode disposed closer to the second substrate than the first insulating film and disposed apart from the first electrode; and an impurity ion diffusion region disposed facing the second electrode and disposed in a depth direction of the photoelectric conversion part from an interface between the photoelectric conversion part and the first insulating film.

A photodetector having a small form factor and having high detection efficiency with respect to both visible light and infrared rays may include a first electrode, a collector layer on the first electrode, a tunnel barrier layer on the collector layer, a graphene layer on the tunnel barrier layer, an emitter layer on the graphene layer, and a second electrode on the emitter layer. The photodetector may be included in an image sensor. An image sensor may include a substrate, an insulating layer on the substrate, and a plurality of photodetectors on the insulating layer. The photodetectors may be aligned with each other in a direction extending parallel or perpendicular to a top surface of the insulating layer. The photodetector may be included in a LiDAR system.

In a signal processing apparatus, a photoelectric conversion member includes a first photoelectric conversion layer configured to photoelectrically convert at least one of blue light or red light, and a second photoelectric conversion layer on an incident light surface of the first photoelectric conversion layer and configured to photoelectrically convert green light. An interpolation circuit is configured to interpolate at least one of a blue light signal or a red light signal obtained by photoelectric conversion in the first photoelectric conversion layer L1, using a green light signal obtained by photoelectric conversion in the second photoelectric conversion layer L2. An absorption correction circuit is configured to perform absorption correction on the green light signal, using at least one of the blue light signal or the red light signal that are interpolated by the interpolation circuit.

[Problem] Provided are: a solid-state imaging element capable of actualizing a phase difference detection pixel that enables a finer pattern of pixels and also enables improvement in quality of a captured image in a stacked structure including a plurality of photodiodes; a method for manufacturing the solid-state imaging element; and an electronic apparatus.

[Solution] Provided is a solid-state imaging element including a plurality of pixels including at least two phase difference detection pixels for focus detection. In the solid-state imaging element, each pixel has a stacked structure including a plurality of photoelectric conversion elements that are stacked on top of each other and absorb light beams different in wavelength from one another to generate electrical charges, and each phase difference detection pixel includes, in the stacked structure, a color filter that partially covers an upper face of one of the photoelectric conversion elements and absorbs a light beam with a specific wavelength.