Disclosed herein is a method comprising: forming a doped region of a semiconductor substrate by doping a surface of the semiconductor substrate with dopants; driving the dopants into the semiconductor substrate by annealing the semiconductor substrate; controlling doping profile of the doped region by repeating doping and annealing the semiconductor substrate; forming a first electrode on the semiconductor substrate, wherein the first electrode is in electrical contact with the doped region; forming an outer electrode arranged around the first electrode, wherein the outer electrode is electrically insulated from the first electrode.

A radiation detector tile includes a single crystal compound semiconductor tile having a zinc blende crystal structure, a (111) plane first major (i.e. prominent) surface and four side surfaces which are rotated by an angle of 13° to 17° to a {110} family of planes. The tile may be formed by dicing a (111) oriented wafer at directions which are rotated by an angle of 13° to 17° from <110> in-plane slipping directions to reduce or eliminate the side surface chipping and sub surface dislocation defects.

An imaging device which offers an image with high quality and is suitable for high-speed operation is provided. The imaging device includes a first region to an n-th region (n is a natural number of 2 or more and 16 or less) each including a first circuit, a second circuit, a third circuit, and a fourth circuit. The first to third circuits each include a transistor in which silicon is used in an active layer or an active region. The fourth circuit includes a photoelectric conversion element and a transistor in which an oxide semiconductor is used in an active layer. The first circuit includes a region overlapping with the fourth circuit. The third circuit includes a region overlapping with the fourth circuit.

The present disclosure relates to a solid-state image sensor capable of suppressing deterioration of the noise characteristics and the dark characteristics when capturing an image of radiation, a manufacturing method, and a radiation imaging device. A scintillator converts radiation to visible light. Pixels each including a photodiode are formed in a semiconductor substrate. The photodiode photoelectrically converts the visible light that has been converted by the scintillator. Only a silicon oxide film or a negative fixed charge film is formed on the substrate in an element isolation area of the pixel. The present disclosure can be applied to, for example, a radiation imaging device that captures an image of an X-ray with which an object is irradiated.

The present technology relates to a solid-state imaging element and an electronic device capable of improving image quality of the solid-state imaging element. The solid-state imaging element includes a photoelectric conversion unit adapted to photoelectrically convert incident light incident from a predetermined incident surface. Also, the solid-state imaging element includes a wire arranged on a bottom surface side that is an opposite surface of the incident surface of the photoelectric conversion unit, and formed with a protruding pattern on a surface facing the photoelectric conversion unit. The present technology can be applied to, for example, a solid-state imaging element such as a CMOS image sensor, and an electronic device including the solid-state imaging element.

Disclosed herein is an apparatus suitable for detecting x-ray, comprising: an X-ray absorption layer configured to generate an electrical signal from an X-ray photon incident on the X-ray absorption layer; an electronics layer comprising an electronics system configured to process or interpret the electrical signal; and an interposer chip embedded in a board of an electrically insulating material; wherein the X-ray absorption layer is bonded to the electronics layer; wherein the electronics layer is bonded to the interposer chip.

Disclosed herein is a method for forming a radiation detector. The method comprises forming a radiation absorption layer and bonding an electronics layer to the radiation absorption layer. The electronics layer comprises an electronic system configured to process electrical signals generated in the radiation absorption layer upon absorbing radiation photons. The method for forming the radiation absorption layer comprises forming a trench into a first surface of a semiconductor substrate; doping a sidewall of the trench; forming a first electrical contact on the first surface; forming a second electrical contact on a second surface of the semiconductor substrate. The second surface is opposite the first surface. The method further comprises dicing the semiconductor substrate along the trench.

Disclosed herein is a method of recovering performance of a radiation detector, the radiation detector comprising: a radiation absorption layer configured to absorb radiation particles incident thereon and generate an electrical signal based on the radiation particles; an electronic system configured to process the electrical signal, the electronic system comprising a transistor, the transistor comprising a gate insulator with positive charge carriers accumulated therein due to exposure of the gate insulator to radiation; the method comprising: removing the positive charge carriers from the gate insulator by establishing an electric field across the gate insulator.

A radiation imaging apparatus includes a unit constituted by arranging blocks in line and an information processing unit. Each of the blocks includes a conversion element configured to generate an image signal corresponding to radiation, a switching element connected between the conversion element and a column signal line, a detection element configured to detect radiation, and a detection signal line connected to the detection element. The information processing unit corrects a signal from the detection element, by using a value of the signal based on a parasitic capacitance between the conversion elements arranged on the same column as a column of the detection element.

A detector for detecting a single x-ray photon with high temporal resolution and high efficiency includes a semiconductor substrate, the semiconductor substrate including element(s) from each of Groups III and V of the Periodic Table of Elements, and pixels on the substrate. Each pixel includes a semiconductor transistor including an epitaxial layer having element(s) from each of Groups III and V of the Periodic Table of Elements, an anode electrically connected to a gate of the semiconductor transistor, and a cathode electrically connected to a drain of the semiconductor transistor. Photon(s) are caused to impinge the single-photon detector along a y-direction (long side of pixel) to provide adequate stopping power, and electron-hole pairs generated by the photon(s) are collected along an x-direction or z-direction (short sides of pixel) to provide short transit time. Detectors form an array of pixels for x-ray imaging with temporal resolution of single photons.