H01L2223/6622

Through-substrate waveguide

Embodiments may relate to a semiconductor package that includes a die and a package substrate. The package substrate may include one or more cavities that go through the package substrate from a first side of the package substrate that faces the die to a second side of the package substrate opposite the first side. The semiconductor package may further include a waveguide communicatively coupled with the die. The waveguide may extend through one of the one or more cavities such that the waveguide protrudes from the second side of the package substrate. Other embodiments may be described or claimed.

FLIP-CHIP BALL GRID ARRAY-TYPE INTEGRATED CIRCUIT PACKAGE FOR VERY HIGH FREQUENCY OPERATION
20220375885 · 2022-11-24 ·

The invention relates to a flip-chip integrated circuit package of the ball array type, wherein: the underside of the package includes a plurality of receiving pads for signal, ground and solder balls; stacks of signal and ground vias, electrically connected to respective receiving pads, pass vertically through the package's dielectric body forming a quasi-coaxial structure. In an upper part of the package body: the signal vias are electrically connected to a lesser number of signal conductive bumps protruding from the upper surface of the package's dielectric body; and at least two ground vias are connected by means of conductive projections to respective ground conductive bumps, forming a ring around the signal conductive bumps.

WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
20230034867 · 2023-02-02 · ·

A wiring substrate capable of providing a through electrode having an insulating layer with a small dielectric loss is provided. A wiring substrate (50) includes a silicon substrate (40) formed of silicon whose electrical resistivity is 1000 Ω.Math.cm or larger and a through electrode (100) formed in the silicon substrate (40). The through electrode (100) is formed of a central conductor (110) that penetrates through the silicon substrate (40) and an external conductor (120, 130, 140) formed around the central conductor (110). The central conductor (110) and the external conductor (120, 130, 140) are electrically insulated from each other by the silicon substrate (40).

WIRING BOARD AND SEMICONDUCTOR PACKAGE
20230127676 · 2023-04-27 ·

A semiconductor package includes a wiring board including at least one pair of connection structures electrically connecting at least one pair of differential signal transmission lines and at least one pair of differential signal transmission terminals, respectively. The at least one pair of connection structures includes first via structures staggered in a vertical direction, at least one first connection line electrically connecting the first via structures, second via structures staggered in the vertical direction, and at least one second connection line electrically connecting the second via structures. The at least one first connection line is spaced apart from the at least one second connection line in the vertical direction and electrically insulated therefrom, and intersects the at least one second connection line in the vertical direction.

Methods and apparatus for via last through-vias

Methods for forming via last through-vias. A method includes providing an active device wafer having a front side including conductive interconnect material disposed in dielectric layers and having an opposing back side; providing a carrier wafer having through vias filled with an oxide extending from a first surface of the carrier wafer to a second surface of the carrier wafer; bonding the front side of the active device wafer to the second surface of the carrier wafer; etching the oxide in the through vias in the carrier wafer to form through oxide vias; and depositing conductor material into the through oxide vias to form conductors that extend to the active carrier wafer and make electrical contact to the conductive interconnect material. An apparatus includes a carrier wafer with through oxide vias extending through the carrier wafer to an active device wafer bonded to the carrier wafer.

Coaxial through via with novel high isolation cross coupling method for 3D integrated circuits

A semiconductor package includes a first semiconductor device, a second semiconductor device vertically positioned above the first semiconductor device, and a ground shielded transmission path. The ground shielded transmission path couples the first semiconductor device to the second semiconductor device. The ground shielded transmission path includes a first signal path extending longitudinally between a first end and a second end. The first signal path includes a conductive material. A first insulating layer is disposed over the signal path longitudinally between the first end and the second end. The first insulating layer includes an electrically insulating material. A ground shielding layer is disposed over the insulating material longitudinally between the first end and the second end of the signal path. The ground shielding layer includes a conductive material coupled to ground. The ground shielding layer drives radiation signals received therein to ground to prevent induced noise in the first signal path.

MULTILEVEL PACKAGE SUBSTRATE DEVICE WITH BGA PIN OUT AND COAXIAL SIGNAL CONNECTIONS

An electronic device includes a multilevel package substrate with first and second levels extending in planes of first and second directions and spaced apart from one another along a third direction, the first level having a first side with landing areas and the second level having a second side with conductive landing pads. The electronic device includes a die with conductive terminals electrically coupled to respective ones of the landing areas, as well as solder balls attached to respective ones of the landing pads, and a package structure that encloses the die and a portion of the multilevel package substrate.

PACKAGING ARCHITECTURE FOR DISAGGREGATED INTEGRATED VOLTAGE REGULATORS

A microelectronic assembly is provided comprising a first integrated circuit (IC) die having an electrical load circuit, a second IC die having a portion of a voltage regulator (VR), and a third IC die comprising inductors of the VR. The third IC die is between the first IC die and the second IC die, and the VR receives power at a first voltage and provides power at a second voltage to the electrical load circuit, the second voltage being lower than the first voltage. In various embodiments, the inductors in the third IC die comprise magnetic thin films. The third IC die may be a passive die without any active elements in some embodiments. In some embodiments, the microelectronic assembly further comprises a package substrate having conductive pathways, and the second IC die is between the third IC die and the package substrate.

COAXIAL VIA SHIELDED INTERPOSER
20230063808 · 2023-03-02 ·

A coaxial interposer may shield certain signals (e.g., noisy signals, high speed signals, radio frequency (RF) signals) transmitted through an electronic device. The coaxial interposer may include a coaxial via that includes an outer barrel of non-conductive material and an inner barrel of non-conductive material separated by a conductive barrel. Further, the outer barrel of non-conductive material may be enclosed by an outer metal coating. The coaxial via serves to internally shield each signals transmitted between layers of a printed circuit board (PCB) within the electronic device.

CROSSTALK CANCELATION STRUCTURES IN SEMICONDUCTOR PACKAGES
20220319980 · 2022-10-06 ·

The embodiments herein are directed to technologies for crosstalk cancellation structures. One semiconductor package includes conductive metal layers separated by insulating layers, the conductive metal layers for routing signals between external package terminals and pads on an integrated circuit device. Signal lines formed in the conductive metal layers have electrode structure (capacitor electrode-like structures) formed for at least adjacent signaling lines of the package terminals. Two of the electrode structures from the adjacent signaling lines are formed opposite each other on different metal layers.