A display apparatus includes: a circuit substrate; and a pixel array on the circuit substrate and including a plurality of pixels. The pixel array includes: light emitting diode (LED) cells constituting the plurality of pixels, each of the LED cells including a first conductivity-type semiconductor layer, an active layer, and a second conductivity-type semiconductor layer; wavelength converters on the LED cells; an upper semiconductor layer on the LED cells and having a partition structure; a passivation layer on side surfaces of the LED cells; a first electrode along a region of the LED cells to have a grid shape; second electrodes connected to the second conductivity-type semiconductor layers; and reflective layers between the first electrode and the second electrode along the passivation layer on the side surfaces of the LED cells and having surfaces inclined toward outside of the LED cells.

A display device includes a display panel including a display area and a pad area. The display panel includes a base substrate, a pixel, a pad group, an alignment mark, and a protective layer. The pad group includes a plurality of pads arranged in a first direction. The alignment mark is spaced apart from the pad group in the first direction. The protective layer covers the pads and the alignment mark and a plurality of openings respectively exposing upper surfaces of the pads is defined in the protective layer. Each of the pads includes at least one pad pattern, and the alignment mark is disposed in a same layer as a pad pattern spaced farthest from the base substrate among the at least one pad pattern.

The present application discloses a method for fabricating a semiconductor device with a pad structure. The method includes providing a substrate, forming a capacitor structure above the substrate, forming a plurality of passivation layers above the capacitor structure, forming a pad opening in the plurality of passivation layers, performing a passivation process comprising soaking the pad opening in a precursor, and forming a pad structure in the pad opening. The precursor is dimethylaminotrimethylsilane or tetramethylsilane. Forming the pad structure in the pad opening comprises forming a pad bottom conductive layer comprising nickel in the pad opening and forming a pad top conductive layer on the pad bottom conductive layer. The pad top conductive layer comprises palladium, cobalt, or a combination thereof.

A light emitting diode (LED) includes a n-doped semiconductor material layer, a p-doped semiconductor material layer, an active region disposed between the n-doped semiconductor layer and the p-doped semiconductor layer, and a photonic crystal grating configured to increase the light extraction efficiency of the LED.

Wafer processing techniques, or methods for forming semiconductor rides, are disclosed for fabricating plated pillar dies having die-level electromagnetic interference (EMI) shield layers. In embodiments, the method includes depositing a metallic seed layer over a semiconductor wafer and contacting die pads thereon. An electroplating process is then performed to compile plated pillars on the metallic seed layer and across the semiconductor wafer. Following electroplating, selected regions of the metallic seed layer are removed to produce electrical isolation gaps around a first pillar type, while leaving intact portions of the metallic seed layer to yield a wafer-level EMI shield layer. The semiconductor wafer is separated into singulated plated pillar dies, each including a die-level EMI shield layer and plated pillars of the first pillar type electrically isolated from the EMI shield layer.

A light emitting substrate is provided. The light emitting substrate includes a plurality of light emitting controlling units arranged in M rows and N columns, M is an integer equal to or greater than one, N is an integer equal to or greater than one. A respective column of the N columns of light emitting controlling units includes M number of groups of second voltage signal lines, a respective group of the M number of groups of second voltage signal lines connected to a respective one of the M number of light emitting controlling units, the respective group of the M number of groups of second voltage signal lines including k number of second voltage signal lines, k is an integer equal to or greater than one.

An inorganic light emitting diode is disclosed. The inorganic light emitting diode includes a first semiconductor layer, a second semiconductor layer having a light emitting surface composed of four sides, an active layer disposed between the first semiconductor layer and the second semiconductor layer, a first electrode coupled to the first semiconductor layer, and a second electrode coupled to the second semiconductor layer, wherein the light emitting surface has a trapezoid shape in which two opposing sides are symmetric with respect to each other.

A semiconductor structure includes: a first substrate, with a first opening being provided on a surface of first substrate; and a first bonding structure positioned in the first opening. The first bonding structure includes a first metal layer and a second metal layer with a melting point lower than that of the first metal layer. The first metal layer includes a first surface in contact with a bottom surface of the first opening and a second surface opposite to the first surface, the second surface is provided with a first groove, an area, not occupied by the first metal layer and the first groove, of the first opening constitutes a second groove, the second metal layer is formed in the first groove and the second groove, and a surface, exposed from the second groove, of the second metal layer constitutes a bonding surface of the first bonding structure.

A semiconductor device according to some example embodiments includes a substrate, an insulating structure covering the substrate, a transistor between the substrate and the insulating structure, a via insulating layer extending through the insulating structure and the substrate, a plurality of via structures extending through the via insulating layer, a plurality of conductive structures respectively connected to the plurality of via structures, and a plurality of bumps respectively connected to the conductive structures.

A display device includes a first base layer including a first opening; a first barrier layer located on a surface of the first base layer, and including a second opening; and a pad electrode located on the first barrier layer and overlapping the second opening in a plan view. At least one first groove is formed at a surface of the first barrier layer, a second groove is formed at a surface of the pad electrode, and the first opening exposes the at least one first groove and the second groove.