H01L2224/05599

Fault tolerant memory systems and components with interconnected and redundant data interfaces
11709736 · 2023-07-25 · ·

A memory system includes dynamic random-access memory (DRAM) components that include interconnected and redundant component data interfaces. The redundant interfaces facilitate memory interconnect topologies that accommodate considerably more DRAM components per memory channel than do traditional memory systems, and thus offer considerably more memory capacity per channel, without concomitant reductions in signaling speeds. The memory components can be configured to route data around defective data connections to maintain full capacity and continue to support memory transactions.

Fault tolerant memory systems and components with interconnected and redundant data interfaces
11709736 · 2023-07-25 · ·

A memory system includes dynamic random-access memory (DRAM) components that include interconnected and redundant component data interfaces. The redundant interfaces facilitate memory interconnect topologies that accommodate considerably more DRAM components per memory channel than do traditional memory systems, and thus offer considerably more memory capacity per channel, without concomitant reductions in signaling speeds. The memory components can be configured to route data around defective data connections to maintain full capacity and continue to support memory transactions.

COMMAND AND ADDRESS INTERFACE REGIONS, AND ASSOCIATED DEVICES AND SYSTEMS
20230005514 · 2023-01-05 ·

Memory devices are disclosed. A memory device may include a command and address (CA) interface region including a first CA input circuit configured to generate a first CA output AND a second CA input circuit configured to generate a second CA output. The first CA input circuit and the second CA input circuit are arranged in a mirror relationship. The CA interface region further includes a swap circuit configured to select one of the first CA output and the second CA output for a first internal CA signal and select the other of the first CA output and the second CA output for a second internal CA signal. Memory systems and systems are also disclosed.

COMMAND AND ADDRESS INTERFACE REGIONS, AND ASSOCIATED DEVICES AND SYSTEMS
20230005514 · 2023-01-05 ·

Memory devices are disclosed. A memory device may include a command and address (CA) interface region including a first CA input circuit configured to generate a first CA output AND a second CA input circuit configured to generate a second CA output. The first CA input circuit and the second CA input circuit are arranged in a mirror relationship. The CA interface region further includes a swap circuit configured to select one of the first CA output and the second CA output for a first internal CA signal and select the other of the first CA output and the second CA output for a second internal CA signal. Memory systems and systems are also disclosed.

Semiconductor structure and manufacturing method thereof

A semiconductor structure includes a semiconductor substrate; a first pad and a second pad on a first top surface of the semiconductor substrate; a circuit board including a second top surface, a recess indented from the second top surface into the circuit board, a polymeric pad disposed on the second top surface and corresponding to the first pad, and an active pad disposed within the recess and corresponding to the second pad; a first bump disposed between and contacting the polymeric pad and the first pad; and a second bump disposed between and contacting the active pad and the second pad, wherein a height of the first bump is substantially shorter than a height of the second bump.

Semiconductor structure and manufacturing method thereof

A semiconductor structure includes a semiconductor substrate; a first pad and a second pad on a first top surface of the semiconductor substrate; a circuit board including a second top surface, a recess indented from the second top surface into the circuit board, a polymeric pad disposed on the second top surface and corresponding to the first pad, and an active pad disposed within the recess and corresponding to the second pad; a first bump disposed between and contacting the polymeric pad and the first pad; and a second bump disposed between and contacting the active pad and the second pad, wherein a height of the first bump is substantially shorter than a height of the second bump.

SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING OF A SEMICONDUCTOR DEVICE
20230028579 · 2023-01-26 · ·

A semiconductor device is provided that includes a lead frame, a die attached to the lead frame using a first solder, a source clip and a gate clip attached to the die using a second solder, and a drain clip attached to the lead frame. The semiconductor device is inverted, so that the source clip and the gate clip are positioned on the bottom side of the semiconductor device, and the lead frame is positioned on the top side of the semiconductor device so that the lead frame is a top exposed drain clip.

SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING OF A SEMICONDUCTOR DEVICE
20230028579 · 2023-01-26 · ·

A semiconductor device is provided that includes a lead frame, a die attached to the lead frame using a first solder, a source clip and a gate clip attached to the die using a second solder, and a drain clip attached to the lead frame. The semiconductor device is inverted, so that the source clip and the gate clip are positioned on the bottom side of the semiconductor device, and the lead frame is positioned on the top side of the semiconductor device so that the lead frame is a top exposed drain clip.

Testing a circuit in a semiconductor device
RE049390 · 2023-01-24 · ·

A method of testing a semiconductor device includes providing a first wafer that includes a first surface, a second surface that is allocated at an opposite side of the first surface, a first electrode penetrating the first wafer from the first surface to the second surface, and a pad formed on the first surface and coupled electrically with the first electrode, providing a second wafer that includes a second electrode penetrating the second wafer, stacking the first wafer onto the second wafer to connect the first electrode with the second electrode such that the second surface of the first wafer faces the second wafer, probing a needle to the pad, and supplying, in such a state that the first wafer is stacked on the second wafer, a test signal to the first electrode to input the test signal into the second wafer via the first electrode and the second electrode.

Testing a circuit in a semiconductor device
RE049390 · 2023-01-24 · ·

A method of testing a semiconductor device includes providing a first wafer that includes a first surface, a second surface that is allocated at an opposite side of the first surface, a first electrode penetrating the first wafer from the first surface to the second surface, and a pad formed on the first surface and coupled electrically with the first electrode, providing a second wafer that includes a second electrode penetrating the second wafer, stacking the first wafer onto the second wafer to connect the first electrode with the second electrode such that the second surface of the first wafer faces the second wafer, probing a needle to the pad, and supplying, in such a state that the first wafer is stacked on the second wafer, a test signal to the first electrode to input the test signal into the second wafer via the first electrode and the second electrode.