A semiconductor memory device may include a cell array structure including first bonding pads, which are electrically connected to memory cells, and a peripheral circuit structure including second bonding pads, which are electrically connected to peripheral circuits and are bonded to the first bonding pads. The cell array structure may include a stack including horizontal conductive patterns stacked in a vertical direction, a vertical structure including vertical conductive patterns , which are provided to cross the stack in the vertical direction, and a power capacitor provided in a planarization insulating layer covering a portion of the stack.

A chip includes a semiconductor substrate, integrated circuits with at least portions in the semiconductor substrate, and a surface dielectric layer over the integrated circuits. A plurality of metal pads is distributed substantially uniformly throughout substantially an entirety of a surface of the chip. The plurality of metal pads has top surfaces level with a top surface of the surface dielectric layer. The plurality of metal pads includes active metal pads and dummy metal pads. The active metal pads are electrically coupled to the integrated circuits. The dummy metal pads are electrically decoupled from the integrated circuits.

A structure and a method of forming are provided. The structure includes a first dielectric layer overlying a first substrate. A first connection pad is disposed in a top surface of the first dielectric layer and contacts a first redistribution line. A first dummy pad is disposed in the top surface of the first dielectric layer, the first dummy pad contacting the first redistribution line. A second dielectric layer overlies a second substrate. A second connection pad and a second dummy pad are disposed in the top surface of the second dielectric layer, the second connection pad bonded to the first connection pad, and the first dummy pad positioned in a manner that is offset from the second dummy pad so that the first dummy pad and the second dummy pad do not contact each other.

A semiconductor memory device is provided, comprising: a memory cell region including a memory cell array; and a peripheral circuit region which at least partially overlaps the memory cell region and includes control logic configured to control operation of the memory cell array, wherein the control logic includes a state machine configured to output a plurality of state signals responsive to operation commands of the memory cell region, the plurality of state signals including a first state signal output from a first output terminal, and a second state signal output from a second output terminal different from the first output terminal, a logical sum calculator configured to perform a logical sum calculation based on at least one of the first state signal or the second state signal, and an accumulation circuit configured to receive an output of the logical sum calculator as a clock signal, and that outputs a toggle signal to one probing pad in response to the clock signal, the accumulation circuit being connected to the probing pad through a Through Hole Via (THV) penetrating the memory cell region.

According to an embodiment of the present invention, a method for forming a coil comprises patterning a first mask on a handle wafer, and depositing a conductive material on exposed portions of the handle wafer to partially define the coil. A second mask is patterned on portions of the first mask and the conductive material. A solder material is deposited on a portion of the conductive material to partially define a support member. The solder material is bonded to a wafer, and the handle wafer is separated from the conductive material.

An integrated circuit structure includes a metal pad, a passivation layer including a portion over the metal pad, a first polymer layer over the passivation layer, and a first Post-Passivation Interconnect (PPI) extending into to the first polymer layer. The first PPI is electrically connected to the metal pad. A dummy metal pad is located in the first polymer layer. A second polymer layer is overlying the first polymer layer, the dummy metal pad, and the first PPI. An Under-Bump-Metallurgy (UBM) extends into the second polymer layer to electrically couple to the dummy metal pad.

A memory package structure includes a substrate, a memory chip and a plurality of resistors. The substrate has a plurality of pins. The pins include a plurality of data pins used to transfer data signal. The memory chip is located on the substrate. A plurality of bonding pads is located on the memory chip. The bonding pads include a plurality of data pads used to receive the data signal from data pins or transfer the data signal from the memory chip. The resistors is located on the substrate. Each data pad is connected to a corresponding one of the data pins through a corresponding one of the resistors.

The embodiments provide an integrated circuit structure and a memory, and relates to the field of semiconductor memory technologies. The integrated circuit structure includes: a pad region, including a plurality of signal pads arranged along a target direction; and a circuit region arranged on one side of the pad region. The circuit region includes a plurality of input/output circuit modules arranged along the target direction and correspondingly connected to the signal pads. Each of the input/output circuit modules is configured to implement a sampling operation of an input signal and write a sampling result into a storage array, and read data stored in the storage array. A size of the circuit region along the target direction is smaller than that of the pad region along the target direction. According to the present disclosure, the performance of a write operation can be improved for the memory.

A semiconductor package including: a base layer; a first chip stack and a second chip stack sequentially stacked over the base layer, each of the first and second chip stacks including a plurality of semiconductor chips which are offset stacked to expose chip pads at one side edge thereof, and the chip pads including stack identification pads for identifying the first chip stack and the second chip stack and chip identification pads for identifying the plurality of semiconductor chips in each of the first and second chip stacks; a first inter-chip wire and a second inter-chip wire connecting power-applied ones of the chip identification pads of the plurality of semiconductor chips of the first and second chip stacks; a first stack wire and second stack wire connecting the chip identification pad of a lowermost semiconductor chip of the first and second chip stacks to the base layer.

A chip includes a semiconductor substrate, integrated circuits with at least portions in the semiconductor substrate, and a surface dielectric layer over the integrated circuits. A plurality of metal pads is distributed substantially uniformly throughout substantially an entirety of a surface of the chip. The plurality of metal pads has top surfaces level with a top surface of the surface dielectric layer. The plurality of metal pads includes active metal pads and dummy metal pads. The active metal pads are electrically coupled to the integrated circuits. The dummy metal pads are electrically decoupled from the integrated circuits.