A semiconductor device including a first die and a second die bonded to one another. The first die includes a first passivation layer over a substrate, and first bond pads in the first passivation layer. The second die includes a second passivation layer, which may be bonded to the first passivation layer, and second bond pads in the second passivation layer, which may be bonded to the first bond pads. The second bond pads include inner bond pads and outer bond pads. The outer bond pads may have a greater diameter than the inner bond pads as well as the first bond pads.

Power semiconductor devices are provided. In one example, a semiconductor device includes a semiconductor vertical power device structure. The semiconductor device includes a first metallization layer on the semiconductor structure. The first metallization layer includes one or more metal structures. The semiconductor device includes a second metallization layer at least partially overlapping the first metallization layer. The semiconductor device includes an insulating layer between the first metallization layer and the second metallization layer. The insulating layer includes an insulating portion. The insulating portion may be patterned to insulate the one or more metal structures of the first metallization layer.

A semiconductor device and electronic system, the device including a cell structure stacked on a peripheral circuit structure, wherein the cell structure includes a first interlayer dielectric layer and first metal pads exposed at the first interlayer dielectric layer and connected to gate electrode layers and channel regions, the peripheral circuit structure includes a second interlayer dielectric layer and second metal pads exposed at the second interlayer dielectric layer and connected to a transistor, the first metal pads include adjacent first and second sub-pads, the second metal pads include adjacent third and fourth sub-pads, the first and third sub-pads are coupled, and a width of the first sub-pad is greater than that of the third sub-pad, and the second sub-pad and the fourth sub-pad are coupled, and a width of the fourth sub-pad is greater than that of the second sub-pad.

A semiconductor package and a manufacturing method for the semiconductor package are provided. The semiconductor package at least has chip and a redistribution layer. The redistribution layer is disposed on the chip. The redistribution layer includes joining portions having first pads and second pads surrounding the chip. The first pads are arranged around a location of the chip and the second pads are arranged over the location of the chip. The second pads located closer to the chip are narrower than the first pads located further away from the chip.

Wirebond bondpads on semiconductor packages that result in reduced cross-talk and/or interference between vertical wires are disclosed. The vertical wirebonds may be disposed in the semiconductor package with stacked dies, where the wires are substantially normal to the bondpads to which the vertical wirebonds are attached on the dies. The wirebond pads may include signal pads that carry input/output (I/O) to/from the die package, as well as ground bondpads. The vertical wirebond bondpads may have widths that are greater than the space between adjacent bondpads. Bondpads may be fabricated to be larger than the size requirements for reliable wirebond formation on the bondpads. For a fixed pitch bondpad configuration, the size of the signal bondpads adjacent to the ground bondpads may be greater than half of the pitch. By increasing the size (e.g., width) of the signal bondpads adjacent to a ground line relative to the space therebetween, improved cross-talk performance may be achieved.

A semiconductor device and electronic system, the device including a cell structure stacked on a peripheral circuit structure, wherein the cell structure includes a first interlayer dielectric layer and first metal pads exposed at the first interlayer dielectric layer and connected to gate electrode layers and channel regions, the peripheral circuit structure includes a second interlayer dielectric layer and second metal pads exposed at the second interlayer dielectric layer and connected to a transistor, the first metal pads include adjacent first and second sub-pads, the second metal pads include adjacent third and fourth sub-pads, the first and third sub-pads are coupled, and a width of the first sub-pad is greater than that of the third sub-pad, and the second sub-pad and the fourth sub-pad are coupled, and a width of the fourth sub-pad is greater than that of the second sub-pad.

Some implementations described herein provide a semiconductor structure. The semiconductor structure includes a first wafer including a first metal structure within a body of the first wafer. The semiconductor structure also includes a second wafer including a second metal structure within a body of the second wafer, where the first wafer is coupled to the second wafer at an interface. The semiconductor structure further includes a metal bonding structure coupled to the first metal structure and the second metal structure and extending through the interface.

A semiconductor device includes a first pad defined on one surface of a first chip; a second pad defined on one surface of a second chip which is stacked on the first chip, and bonded to the first pad; a first resistor element defined in the first chip, and coupled to the first pad; and a second resistor element defined in the second chip, and coupled to the second pad.

A semiconductor device includes a substrate, plugs and a storage node pad structure. The plugs are disposed on the substrate and include first plugs with a conductive material and second plugs with an insulating material. The storage node pad structure is disposed on the plugs and includes first extension pads and at least one second extension pad. The first extension pads have a predetermined first length in a first direction and are separated from each other and arranged as an array along the first direction, being in physical contact with one of the first plugs. The at least one second extension pad has a length greater than the predetermined first length and is in physical contact with at least one of the plugs.

A semiconductor package is provided. The semiconductor package includes: a first stack including a first semiconductor substrate; a through via that penetrates the first semiconductor substrate in a first direction; a second stack that includes a second face facing a first face of the first stack, on the first stack; a first pad that is in contact with the through via, on the first face of the first stack; a second pad including a concave inner side face that defines an insertion recess, the second pad located on the second face of the second stack; and a bump that connects the first pad and the second pad, wherein the bump includes a first upper bump on the first pad, and a first lower bump between the first upper bump and the first pad.