A chip package structure is provided. The chip package structure includes a substrate. The chip package structure includes a chip over the substrate. The chip package structure includes a bump and a first dummy bump between the chip and the substrate. The bump is electrically connected between the chip and the substrate, the first dummy bump is electrically insulated from the substrate, and the first dummy bump is wider than the bump. The chip package structure includes a first dummy solder layer under the first dummy bump and having a curved bottom surface facing and spaced apart from the substrate.

A semiconductor device includes a substrate having a first surface, a second surface opposite to the first surface, conductive connections provided on the first surface, and columnar electrodes each extending from a corresponding one of the conductive connections toward the second surface, each of the columnar electrodes having a tapered shape; and a semiconductor chip having a third surface facing the first surface and a plurality of connection bumps provided on the third surface, each of the plurality of connection bumps electrically connected to a corresponding one of the plurality of conductive connections. A first one of the columnar electrodes, located in a first region of a chip region, has a first tapered shape. A second one of the columnar electrodes, located in a second region of the chip region, has a second tapered shape different from the first tapered shape.

A semiconductor device includes a carrier, an under bump metallurgy (UBM) pad on the carrier, and a post on a surface of the UBM pad. In some embodiments, a height of the post to a longest length of the UBM pad is between about 0.25 and about 0.7. A method of manufacturing a semiconductor device includes providing a carrier, disposing a UBM pad on the carrier and forming a post on the UBM pad.

A multilayer structure for a semiconductor device and a method of forming a multilayer structure for a semiconductor device. The multilayer structure comprises: a substrate having an electrically conductive portion thereon; a dielectric layer formed over the substrate; the dielectric layer comprising an opening over at least part of the electrically conductive portion; and a conductive pillar formed on the at least part of the electrically conductive portion; wherein the conductive pillar comprises walls defined by at least the opening of the dielectric layer and an opening of a patterned layer.

A light-emitting device including a substrate with a top surface and a bottom surface opposite to the top surface and a plurality of LED chips disposed on the top surface and configured to generate a top light visible above the top surface and a bottom light visible beneath the bottom surface, each LED chip comprising a plurality of light-emitting surfaces. The substrate has a thickness greater than 200 μm and comprises aluminum oxide, sapphire, glass, plastic, or rubber. The plurality of LED chips has an incident light with a wavelength of 420-470 nm. The top light and the bottom light have a color temperature difference of not greater than 1500K.

Apparatuses and methods using a silicon on insulator (SOI) substrate are described. An example apparatus includes: a substrate including a first surface and a second surface opposite to the first surface; a circuit formed in the first surface; a first electrode through the substrate from the first surface to the second surface; and a first insulative film around the first electrode. The first electrode includes: a first portion formed in the substrate; and a second portion continuous to the first portion and protruding from the second surface. The first insulative film is formed between the first portion of the first electrode in the substrate and extending to a side surface of the second portion of the first electrode.

An illumination device includes a supporting base, and a light-emitting element inserted in the supporting base. The light-emitting element includes a substrate having a supporting surface and a side surface, a light-emitting chip disposed on the supporting surface, and a first wavelength conversion layer covering the light-emitting chip and only a portion of the supporting surface without covering the side surface.

A method of manufacturing a semiconductor device includes forming a first via having a first diameter in a first main surface of a semiconductor substrate having a first thickness, after forming a first insulating film on a bottom surface and a side surface of the first via, forming a first through electrode inside the first via a first barrier metal film, after forming the first through electrode, processing the semiconductor substrate from a second main surface on an opposite side of the first main surface to reduce the first thickness of the semiconductor substrate to a second thickness thinner than the first thickness, after processing the semiconductor substrate, forming a third insulating film on the second main surface of the semiconductor substrate, and after forming the third insulating film, sequentially processing the third insulating film and the semiconductor substrate.

Disclosed herein is a method of forming a device, comprising mounting a plurality of first interconnects on one or more first integrated circuit dies. One or more second integrated circuit dies are mounted on a first side of an interposer. The interposer is mounted at a second side to the first integrated circuit dies, the plurality of first interconnects disposed outside of the interposer. The interposer is mounted to a first side of a substrate by attaching the first interconnects to the substrate, the substrate in signal communication with one or more of the first integrated circuit dies through the first interconnects.

The present invention provides a flow guiding structure of chip, which comprises at least one flow guiding member disposed on a surface of a chip and adjacent to a plurality of connecting bumps disposed on the surface of the chip. When the chip is disposed on a board member, the at least one flow guiding member may guide the conductive medium on the surface of the chip to flow toward the connecting bumps and drive a plurality of conductive particles of the conductive medium to move toward the connecting bumps and thus increasing the number of the conductive particles on the surfaces of the connecting bumps. Alternatively, the flow guiding member may retard the flow of the conductive medium for avoiding the conductive particles from leaving the surfaces of the connecting bumps and thus preventing reduction of the number of the conductive particles on the surfaces of the connecting bumps.