A chip package structure is provided. The chip package structure includes a chip. The chip package structure includes a conductive bump over and electrically connected to the chip. The chip package structure includes a ring-like structure over and electrically insulated from the chip. The ring-like structure surrounds the conductive bump, and the ring-like structure and the conductive bump are made of a same material.

A semiconductor package includes a redistribution substrate and a semiconductor chip thereon. The redistribution substrate includes a ground under-bump pattern, signal under-bump patterns laterally spaced apart from the ground under-bump pattern, first signal line patterns disposed on the signal under-bump patterns and coupled to corresponding signal under-bump patterns, and a first ground pattern coupled to the ground under-bump pattern and laterally spaced apart from the first signal line pattern. Each of the signal and ground under-bump patterns includes a first part and a second part formed on the first part and that is wider than the first part. The second part of the ground under-bump pattern is wider than the second part of the signal under-bump pattern. The ground under-bump pattern vertically overlaps the first signal line patterns. The first ground pattern does not vertically overlap the signal under-bump patterns.

A semiconductor chip may include: a body portion including a front surface and a back surface; penetrating electrodes penetrating the body portion; and back connection electrodes disposed over the back surface of the body portion and connected to the penetrating electrodes, wherein the penetrating electrodes include a power penetrating electrode for transmitting a power voltage and a ground penetrating electrode for transmitting a ground voltage, the back connection electrodes include a power back connection electrode connected to the power penetrating electrode and a ground back connection electrode connected to the ground penetrating electrode, and one power back connection electrode is connected with two or more power penetrating electrodes, and one ground back connection electrode is connected with two or more ground penetrating electrodes.

Provided is a wafer-level package with metal shielding structure and the manufacturing method for producing the same. The wafer-level package includes first conductive structures for securing a die unit to a substrate, and is featured by disposing one or more second conductive structures that are located at the front surface of the die unit and proximate to a side surface of the die unit. The second conductive structure does not electrically connected to the internal circuitry of the die unit. After the wafer is cut, a metal shielding layer is formed on the back surface and the side surfaces of the die unit. Afterwards, the die unit is mounted on the substrate to allow the second conductive structure to connect to the ground structure on the substrate and connect to the metal shielding layer. Thus, EMI shielding function is generated to efficiently suppress EMI and miniaturize the package.

A semiconductor device includes a die body having a frontside and a transistor having an active area formed in the die body, the active area being bounded by an outer periphery. An interconnect structure is formed over the frontside of the die body and contains patterned electrically conductive material defining first, second, and third contacts electrically coupled to first, second, and third subregions, respectively, within the active area of the transistor. A frontside input/output (I/O) interface is formed in an outer portion of the interconnect structure. The frontside I/O interface contains first, second, and third contact pads, the first contact pad being electrically connected to the first contact, the second contact pad being electrically connected to the second contact, and the third contact pad being electrically connected the third contact, wherein the third contact pad is positioned at a location overlying the active area of the transistor.

A chip package structure is provided. The chip package structure includes a substrate. The chip package structure includes a chip over the substrate. The chip package structure includes a bump and a first dummy bump between the chip and the substrate. The bump is electrically connected between the chip and the substrate, the first dummy bump is electrically insulated from the substrate, and the first dummy bump is wider than the bump. The chip package structure includes a first dummy solder layer under the first dummy bump and having a curved bottom surface facing and spaced apart from the substrate.

A semiconductor package may comprise: a first passivation layer forming an electrical connection with one or more first bumps; a substrate layer including a second passivation layer and a silicon layer; a back-end-of-line (BEOL) layer formed on the substrate layer; and a third passivation layer formed on the BEOL layer forming an electrical connection with one or more second bumps, wherein the substrate layer includes a first signal TSV (Through Silicon Via) which transmits a first signal between the BEOL layer and a first lower pad, a second signal TSV which transmits a second signal between the BEOL layer and a second lower pad, and a ground TSV which is disposed between the first signal TSV and the second signal TSV and formed so that one end thereof is connected to the BEOL layer and the other end thereof floats.

Disclosed is a semiconductor package comprising a first semiconductor chip and at least one second semiconductor chip on the first semiconductor chip. The second semiconductor chip includes first and second test bumps that are adjacent to an edge of the second semiconductor chip and are on a bottom surface of the second semiconductor chip. The first and second test bumps are adjacent to each other. The second semiconductor chip also includes a plurality of data bumps that are adjacent to a center of the second semiconductor chip and are on the bottom surface of the second semiconductor chip. A first interval between the second test bump and one of the data bumps is greater than a second interval between the first test bump and the second test bump. The one of the data bumps is most adjacent to the second test bump.

A semiconductor system includes a semiconductor chip comprising a RF circuit, a buffer layer over the RF circuit and a plurality of bumps over the buffer layer, wherein the plurality of bumps comprising at least one functional bump electrically connected to the RF circuit, and at least one dummy bump which is maintained at a distance from the RF circuit and prevented from being electrically connected to the RF circuit by the buffer layer, a conductive layer disposed over the semiconductor chip and coupled to the plurality of bumps through a plurality of vias, a feedline structure disposed over the conductive layer, wherein the feedline structure is electrically coupled to the RF circuit, and a plurality of antennas disposed over the feedline structure, wherein at least one antenna of the plurality of antennas is coupled to the RF circuit through the feedline structure.

A light emitting diode (LED) chip is bonded to a substrate. The LED chip includes a plurality of electrodes that each corresponds to a contact on the substrate. The plurality of electrodes are exposed to one or more laser beams for coupling the LED chip to the substrate. The laser beams may be directed to one or more edges or corners of the plurality of electrodes, where the edges or corners lie outside emission areas of LEDs on the LED chip.