Vertical etch heterolithic integrated circuit devices are described. A method of manufacturing NIP diodes is described in one example. A P-type substrate is provided, and an intrinsic layer is formed on the P-type substrate. An oxide layer is formed on the intrinsic layer, and one or more openings are formed in the oxide layer. One or more N-type regions are implanted in the intrinsic layer through the openings in the oxide layer. The N-type regions form cathodes of the NIP diodes. A dielectric layer deposited over the oxide layer is selectively etched away with the oxide layer to expose certain ranges of the intrinsic layer to define a geometry of the NIP diodes. The intrinsic layer and the P-type substrate are vertically etched away within the ranges to expose sidewalls of the intrinsic layer and the P-type substrate. The P-type substrate forms the anodes of the NIP diodes.

A display device may include: a substrate including a display area and a non-display area; and at least one pixel disposed in the display area, and including at least one pixel having an emission area formed to emit light. The at least one pixel may include: a plurality of first electrodes disposed on the substrate and arranged in a column direction; second electrodes spaced apart from the first electrodes; a first connection line extending in the column direction, and connecting each of the first electrodes to the first electrodes adjacent thereto; a light emitting element electrically connected to at least one of the first electrodes and at least one of the second electrodes; and an insulating pattern overlapping the first connection line.

A dipole alignment device includes an electric field forming part including a stage, and a probe part which form an electric field on the stage; an inkjet printing apparatus including at least one inkjet head which sprays ink including dipoles and a solvent with the dipoles dispersed therein onto the stage; a transportation part comprising a first moving part which moves the electric field forming part in at least one direction; and a light irradiation apparatus including a light irradiation part which applies light to the ink sprayed onto the stage.

A semiconductor device includes a first semiconductor die, a second semiconductor die, a dielectric layer, a first redistribution layer and a second redistribution layer. The first semiconductor die includes a first bonding pad and a second bonding pad. The second semiconductor die includes a third bonding pad and a fourth bonding pad. The dielectric layer covers the first semiconductor die and the second semiconductor die, and defines a first opening exposing the first bonding pad and the second bonding pad and a second opening exposing the third bonding pad and the fourth bonding pad. The first redistribution layer is disposed on the dielectric layer, and electrically connects the first bonding pad and the third bonding pad. The second redistribution layer is disposed on the dielectric layer, and electrically connects the second bonding pad and the fourth bonding pad.

A package structure including a device die, an insulating encapsulant, and a first redistribution circuit is provided. The device die includes a first semiconductor die and a second semiconductor die. The first semiconductor die is stacked over and electrically connected to the second semiconductor die. The insulating encapsulant laterally encapsulates the device die. The insulating encapsulant includes a first encapsulation portion and a second encapsulation portion connected to the first encapsulation portion. The first encapsulation portion is disposed on the second semiconductor die and laterally encapsulates the first semiconductor die. The second encapsulation portion laterally encapsulates the first insulating encapsulation and the second semiconductor die. The first redistribution circuit structure is disposed on the device die and a first surface of the insulating encapsulant, and the first redistribution circuit structure is electrically connected to the device die.

A package structure including IPD and method of forming the same are provided. The package structure includes a die, an encapsulant laterally encapsulating the die, a first RDL structure disposed on the encapsulant and the die, an IPD disposed on the first RDL structure and an underfill layer. The IPD includes a substrate, a first connector on a first side of the substrate and electrically connected to the first RDL structure, a guard structure on a second side of the substrate opposite to the first side and laterally surrounding a connector region, and a second connector disposed within the connector region and electrically connected to a conductive via embedded in the substrate. The underfill layer is disposed to at least fill a space between the first side of the IPD and the first RDL structure. The underfill layer is separated from the connector region by the guard structure.

A semiconductor device may include a semiconductor chip in an encapsulant. A first insulation layer may be disposed on the encapsulant and the semiconductor chip. A horizontal wiring and a primary pad may be disposed on the first insulation layer. A secondary pad may be disposed on the primary pad. A second insulation layer covering the horizontal wiring may be disposed on the first insulation layer. A solder ball may be disposed on the primary pad and the secondary pad. The primary pad may have substantially the same thickness as a thickness of the horizontal wiring.

A semiconductor package includes: a first die; a second die stacked on an upper surface of the first die, the second die including a second semiconductor substrate and a second seal ring structure that extends along a perimeter of the second semiconductor substrate; a third die stacked on the upper surface of the first die, the third die including a third semiconductor substrate and a third seal ring structure that extends along a perimeter of the third semiconductor substrate; and a connection circuit that extends through the second seal ring structure and the third seal ring structure, in a lateral direction perpendicular to the stacking direction of the first die and the second die, to electrically connect the second semiconductor substrate and the third semiconductor substrate.

An image sensor packaging method, an image sensor packaging structure and a lens module are disclosed by the present invention provides. With the image sensor packaging method, a plurality of image sensor chips are embedded in a molding layer, thus allowing a greatly reduced thickness and improved slimness of the resulting packaging structure. Moreover, in this packaging method, instead of bonding wires, solder pads are externally connected by thin film metal layer formed on non-photosensitive surface area located on the same side as light-sensing surfaces. This allows a reduced impact on the light-sensing surfaces as well as a shorter distance from each solder pad to a corresponding one of the light-sensing surfaces along the direction parallel to the light-sensing surfaces, when compared to the use of bonding wires. As a result, the size of the image sensor chips is allowed to be further reduced, and using a packaging structure resulting from such image sensor chips to make a lens module is beneficial to space design thereof. For example, it can facilitate miniaturization of the lens module.

The present disclosure provides an image capturing assembly and its packaging method, a lens module and an electronic device. The packaging method includes: providing a photosensitive chip; mounting an optical filter on the photosensitive chip; providing a carrier substrate and temporarily bonding the photosensitive chip and functional components on the carrier substrate; and forming an encapsulation layer on the carrier substrate and at least between the photosensitive chip and the functional components.