A method for fabricating an orifice in a semiconductor which can include: removing a first depth of the semiconductor using a first material removal technique and removing a second depth of the semiconductor using a second material removal technique. The method can optionally include: adding a sacrificial layer of material and reducing a depth of the semiconductor by a friction-based material removal technique. In examples, the method fabricates a wafer-scale processor with a set of fastening features.

An integrated circuit assembly that includes a semiconductor wafer having a first coefficient of thermal expansion; an electronic circuit substrate having a second coefficient of thermal expansion that is different than the first coefficient of thermal expansion; and an elastomeric connector arranged between the semiconductor wafer and the electronic circuit substrate and that forms an operable signal communication path between the semiconductor wafer and the electronic circuit substrate.

An electronic package and a method for fabricating an electronic package are provided. An encapsulation layer encapsulates a first electronic component and a plurality of conductive pillars, and is defined with a reservation region and a removal region adjacent to the reservation region. A circuit structure is disposed on the encapsulation layer. The removal region and the circuit structure therewithin are removed for an optical communication element to protrude from a lateral surface of the encapsulation layer when the optical communication element is disposed on the circuit structure, so as to avoid a packaging material used in a subsequent process from being adhered to a protruding portion of the optical communication element.

A semiconductor package having a redistribution structure including a first face and a second face and a first semiconductor chip mounted on the first face. The semiconductor package may further include a first redistribution pad exposed from the second face of the redistribution structure and a second redistribution pad exposed from the second face of the redistribution structure. The semiconductor package may further include a first solder ball being in contact with the first redistribution pad and a second solder ball being in contact with the second redistribution pad. In some embodiments, a first distance of the first redistribution pad is smaller than a second distance of the second redistribution pad, the first and second distances are measured with respect to a reference plane that intersects a lower portion of the first solder ball and a lower portion of the second solder ball.

A fan-out semiconductor package and packaging method thereof are disclosed. In the packaging method, a photosensitive material is used to encapsulate multiple bare chips and multiple passive devices, so multiple metal pads of each bare chip and multiple metal terminals of each passive device are exposed out of the photosensitive material by a photolithography process. The exposed metal pads and the exposed metal terminals are directly and electrically connected to a redistribution layer. In the packaging method, the bare chips and the passive devices are located on the same side of the redistribution layer and encapsulated by the photosensitive material. In addition, in the packaging method, the bare chips are not processed by a wafer bump process and does not use the thinner passive devices with high cost. Therefore, a height of the fan-out semiconductor package of the present invention is decreased and a manufacturing cost is relatively reduced.

An electronic circuit device according to the present invention includes a base substrate having a wiring layer, at least one first electronic circuit element having a first surface fixed to the base substrate and having a connection part on a second surface opposed to the first surface, a re-distribution layer including a photosensitive resin layer, the photosensitive resin layer enclosing the first electronic circuit element on the base substrate and embedding a first wiring photo via, a second wiring photo via, and a wiring, the first wiring photo via electrically connected to the connection part of the first electronic circuit element, the second wiring photo via arranged at the outer periphery of the first electronic circuit element and electrically connected to a connection part of the wiring layer, the wiring arranged on the second surface and electrically connected to the first wiring photo via and the second wiring photo via.

A system and method for fabricating an orifice in a multi-layered semiconductor substrate and singulation of the semiconductor substrate includes adding a sacrificial layer of material to a first surface of a semiconductor substrate; subsequently, removing a first radius of a first depth of material from the semiconductor substrate along a direction normal to the first surface, the removal of the first depth of material uses a first removal technique that removes the first depth of material; and removing a second radius of a second depth of material from the semiconductor substrate along the direction normal to the first surface based on the removal of the first depth of material, the removal of the second depth of material uses a second removal technique.

A package structure includes at least one semiconductor die, an insulating encapsulant and a redistribution structure. The at least one semiconductor die has a plurality of conductive posts, wherein a top surface of the plurality of conductive posts has a first roughness. The insulating encapsulant is encapsulating the at least one semiconductor die. The redistribution structure is disposed on the insulating encapsulant in a build-up direction and is electrically connected to the at least one semiconductor die. The redistribution structure includes a plurality of conductive via portions and a plurality of conductive body portions embedded in dielectric layers, wherein a top surface of the plurality of conductive body portions has a second roughness, and the second roughness is greater than the first roughness.

An embedded component package structure including a dielectric structure, a semiconductor chip and a patterned conductive layer is provided. The semiconductor chip is embedded in the dielectric structure, and the dielectric structure encapsulates the semiconductor chip and has a first thickness. The semiconductor chip having a second thickness, and the first thickness is greater than the second thickness, and a ratio of the first thickness to the second thickness is between 1.1 and 28.4. The patterned conductive layer covers an upper surface of the dielectric structure and extending into a first opening of the dielectric structure. The first opening exposes an electrical pad of the semiconductor chip, and the patterned conductive layer is electrically connected to the electrical pad of the semiconductor chip.

A semiconductor package and a manufacturing method thereof are provided. The semiconductor package includes a semiconductor die an insulating encapsulation laterally covering the semiconductor die. The semiconductor die includes a semiconductor substrate, a plurality of conductive pads distributed over the semiconductor substrate, a plurality of conductive vias disposed on and electrically connected to the conductive pads, and a dielectric layer disposed over the semiconductor substrate and spaced the conductive vias apart from one another. A sidewall of the dielectric layer extends along sidewalls of the conductive vias, the conductive vias are recessed from a top surface of the dielectric layer, and a sloped surface of the dielectric layer is connected to the top surface of the dielectric layer and the sidewall of the dielectric layer.