A modeling method includes the following: acquiring electrical parameters of each sub-structure in a through silicon via (TSV) structure; obtaining an electrical topology network model according to a connection relationship of each TSV structure between two dies; and obtaining a simulation model for simulation based on the electrical topology network model and the electrical parameters.

A semiconductor device and a method of fabricating the semiconductor device are disclosed. The method includes: providing a first wafer including a substrate; forming a hole in the first wafer, which extends through the substrate; forming an insulating dielectric layer over a side wall of the hole; filling the hole with a conductive layer; removing at least part of the insulating dielectric layer situated in correspondence with the substrate, forming an air gap between the conductive layer and the substrate; and forming a closure layer, which closes the air gap. With the present invention, parasitic capacitance present between the conductive layer, the insulating dielectric layer and the substrate is significantly reduced, resulting in an improvement in performance of the semiconductor device.

The present application discloses a semiconductor device with stacked dies and the method for fabricating the semiconductor device with the stacked dies. The semiconductor device includes a first semiconductor die including a first substrate including a first and a second region, a first circuit layer on the first substrate, a control circuit on the first region and in the first circuit layer; and through die vias along the first circuit layer and the second region; a second semiconductor die stacked on the first semiconductor die and including second conductive pads connected to the through die vias and the control circuit; and a third semiconductor die stacked under the first semiconductor die and including third conductive pads connected to the through die vias and the control circuit. The through die vias, the second conductive pads, and the third conductive pads configure transmission channels through which the control circuit is capable to access the second and the third semiconductor die.

An integrated circuit device includes a semiconductor substrate having a first surface and a second surface opposite to the first surface, a first insulating layer on the first surface of the semiconductor substrate, an electrode landing pad positioned on the first surface of the semiconductor substrate and having a sidewall surrounded by the first insulating layer, a top surface apart from the first surface of the semiconductor substrate, and a bottom surface opposite to the top surface, and a through-electrode configured to penetrate through the semiconductor substrate and contact the top surface of the electrode landing pad, wherein a horizontal width of the top surface of the electrode landing pad is less than a horizontal width of the bottom surface of the electrode landing pad and greater than a horizontal width of a bottom surface of the through-electrode in contact with the top surface of the electrode landing pad.

A semiconductor device includes a stack including alternately stacked conductive films and insulating films, wherein the stack includes an opening penetrating the conductive films and the insulating films, and wherein the stack includes a rounded corner that is exposed to the opening. The semiconductor device also includes a first channel film formed in the opening and including a first curved surface surrounding the rounded corner. The semiconductor device further includes a conductive pad formed in the opening, and a second channel film interposed between the first curved surface of the first channel film and the conductive pad.

A semiconductor package includes a first semiconductor chip including a first bonding pad on a first surface of a first substrate, a first through electrode penetrating through the first substrate and electrically connected to the first bonding pad, a first recess with a desired depth in the first substrate from a second surface of the first substrate and exposing an end portion of the first through electrode, and a second bonding pad in the first recess and electrically connected to the first through electrode, a second semiconductor chip stacked on the second surface of the first substrate and including a third bonding pad on a third surface of a second substrate, and a conductive connection member between the second bonding pad and the third bonding pad. At least a portion of the conductive connection member may be in the first recess.

Three-dimensional integrated circuit component(s) are described including a System-on-a-Chip (SoC) die and a separate static random-access memory (SRAM) subcomponent in a vertically stacked arrangement. Such stacked SoC/SRAM integrated circuit components may form part of a system to render artificial reality images.

A semiconductor device including a base substrate B, which includes wire layers, chips C1, C2, C3, C4, C5, and C6 provided on the base substrate B, and a protective film P provided on each of the side faces of the chips C1, C2, C3, C4, C5, and C6.

A semiconductor package may include vertically-stacked semiconductor chips and first, second, and third connection terminals connecting the semiconductor chips to each other. Each of the semiconductor chips may include a semiconductor substrate, an interconnection layer on the semiconductor substrate, penetration electrodes connected to the interconnection layer through the semiconductor substrate, and first, second, and third groups on the interconnection layer. The interconnection layer may include an insulating layer and first and second metal layers in the insulating layer. The first and second groups may be in contact with the second metal layer, and the third group may be spaced apart from the second metal layer. Each of the first and third groups may include pads connected to a corresponding one of the first and third connection terminals in a many-to-one manner. The second group may include pads connected to the second connection terminal in a one-to-one manner.

A bonded structure is disclosed. The bonded structure can comprise a first semiconductor element having a first contact pad. An interposer can include a second contact pad on a first side of the interposer and a third contact pad and a fourth contact pad on a second side of the interposer opposite the first side, the second contact pad bonded to the first contact pad; a second semiconductor element having a fifth contact pad bonded to the third contact pad and a sixth contact pad bonded to the fourth contact pad. A switching circuitry can be configured to switch between a first electrical connection between the second and third contact pads and a second electrical connection between the second and fourth contact pads.