A filter package comprising an array of piezoelectric films sandwiched between lower electrodes and an array of upper electrodes covered by an array of silicon membranes with cavities thereover: the lower electrode being coupled to an interposer with a first cavity between the lower electrodes and the interposer; the array of silicon membranes having a known thickness and attached over the upper electrodes with an array of upper cavities, each upper cavity between a silicon membrane of the array and a common silicon cover; each upper cavity aligned with a piezoelectric film, an upper electrode and silicon membrane, the upper cavities having side walls comprising SiO.sub.2; the individual piezoelectric films, their upper electrodes and silicon membranes thereover being separated from adjacent piezoelectric films, upper electrodes and silicon membranes by a passivation material.

A filter package comprising an array of piezoelectric films comprising an array of mixed single crystals that each comprise doped Aluminum Nitride, typically Al.sub.xGa.sub.(1-x)N or Sc.sub.xAl.sub.(1-x)N, that is sandwiched between an array of lower electrodes and an array of upper electrodes comprising metal layers and silicon membranes with cavities thereover: the array of lower electrodes being coupled to an interposer with a first cavity between the array of lower electrodes and the interposer; the array of silicon membranes having a known thickness and attached over the array of upper electrodes with an array of upper cavities, each upper cavity between a silicon membrane of the array and a common silicon cover; each upper cavity aligned with a piezoelectric film, an upper electrode and silicon membrane, the upper cavities having side walls comprising SiO.sub.2; the individual piezoelectric films, their upper electrodes and silicon membranes thereover being separated from adjacent piezoelectric films, upper electrodes and silicon membranes by a passivation material.

An acoustic wave device includes a first piezoelectric layer including a first main surface and a second main surface, a first support portion including a first support substrate that overlaps the first piezoelectric layer in a first direction, a first resonator provided on at least the first main surface of the first piezoelectric layer, a second piezoelectric layer including a third main surface and a fourth main surface, a second support portion including a second support substrate overlapping the second piezoelectric layer in the first direction, and a second resonator provided on at least the third main surface of the second piezoelectric layer. The first resonator and the second resonator each include a functional electrode. The support portion includes a space portion that overlaps at least a portion of the functional electrode of the resonator in a plan view in the first direction.

A bulk acoustic wave resonator including a substrate; an air cavity formed on the substrate; and a resonating part formed on the air cavity and comprising a first electrode, a piezoelectric layer, and a second electrode which are sequentially laminated, wherein a cross section of the air cavity has a short side, a long side opposing the short side, a first lateral side and a second lateral side connecting the short side and the long side to each other, the first and second lateral sides are inclined, and a surface roughness of the first electrode, the piezoelectric layer, the second electrode, or any combination thereof is between 1 nm and 100 nm.

An acoustic resonator that prevents a radio frequency (RF) signal from being coupled to a cap substrate. An electronic device includes a first substrate (device substrate) of piezoelectric material having a top surface on which an electronic circuit including a film bulk acoustic resonator is formed, a second substrate (cap substrate) of low-resistivity material, a bottom surface of which is disposed opposing the top surface of the first substrate, and a side wall disposed between the top surface of the first substrate and the bottom surface of the second substrate. The side wall defines a cavity together with the top surface of the first substrate and the bottom surface of the second substrate, the cavity internally including the electronic circuit. A thin film of high-resistivity material is formed on at least a portion of the bottom surface of the second substrate to prevent an RF signal emitted from the electronic circuit from being coupled to the second substrate.

A filter may include one or more series unit, and a shunt unit disposed between the one or more series unit and ground. The one or more series unit includes a plurality of series resonators which are selectively operated, and each of the plurality of series resonators includes a film bulk acoustic resonator.

A filter may include a plurality of bulk acoustic wave resonators including one or more series resonators and one or more shunt resonators formed by a first electrode, a piezoelectric layer, and a second electrode sequentially stacked on a substrate, a cap accommodating the plurality of bulk acoustic wave resonators therein, and one or more switches provided on the cap.

A filter module includes filters. Each of the filters is configured to control communications bands having overlapping bandwidths each with the other. Each of the communications bands, allocated to any one of the filters, has a different limit frequency from the other.

A piezoelectric thin film resonator includes: a substrate; a piezoelectric film located on the substrate; a lower electrode and an upper electrode facing each other across at least a part of the piezoelectric film; and an insertion film that is inserted between the lower electrode and the upper electrode, is located in an outer peripheral region within a resonance region where the lower electrode and the upper electrode face each other across the piezoelectric film, is located in a region that is located outside the resonance region and surrounds the resonance region, is not located in a center region of the resonance region, and includes a first part, which is located in the resonance region and has a first film thickness, and a second part, which is located outside the resonance region and has a second film thickness, the first film thickness being less than the second film thickness.

A method for forming cavity of bulk acoustic wave resonator comprising following steps of: forming a sacrificial epitaxial structure mesa on a compound semiconductor substrate; forming an insulating layer on the sacrificial epitaxial structure mesa and the compound semiconductor substrate; polishing the insulating layer by a chemical-mechanical planarization process to form a polished surface; forming a bulk acoustic wave resonance structure on the polished surface, which comprises following steps of: forming a bottom electrode layer on the polished surface; forming a piezoelectric layer on the bottom electrode layer; and forming a top electrode layer on the piezoelectric layer, wherein the bulk acoustic wave resonance structure is located above the sacrificial epitaxial structure mesa; and etching the sacrificial epitaxial structure mesa to form a cavity, wherein the cavity is located under the bulk acoustic wave resonance structure.