A semiconductor device includes standard cells in a first direction parallel to an upper surface of a substrate and a second direction intersecting the first direction, and filler cells between ones of the standard cells. Each of the standard cells includes an active region, a gate structure that intersects the active region, source/drain regions on the active region on both sides of the gate structure, and interconnection lines. Each of the filler cells includes a filler active region and a filler gate structure that intersects the filler active region. The standard cells include first to third standard cells in first to third rows sequentially in the second direction, respectively. First interconnection lines are arranged with a first pitch, second interconnection lines are arranged with a second pitch, and third interconnection lines are arranged with a third pitch different from the first and second pitches.

There are provided an Integrated Circuit (IC) unit, a method of manufacturing the same, and an electronic device including the IC unit. According to an embodiment, the IC unit includes a first source/drain layer, a channel layer and a second source/drain layer for a first device and a first source/drain layer, a channel layer and a second source/drain layer for a second device stacked in sequence on a substrate. In the first device, the channel layer includes a first portion and a second portion separated from each other. The first source/rain layer and the second source/drain layer each extend integrally to overlap both the first portion and the second portion of the channel layer. The IC unit further includes a first gate stack surrounding a periphery of the first portion and also a periphery of the second portion of the channel layer of the first device, and a second gate stack surrounding a periphery of the channel layer of the second device.

There are provided a semiconductor device, a method of manufacturing the same, and an electronic device including the device. According to an embodiment, the semiconductor device may include a substrate, and a first device and a second device formed on the substrate. Each of the first device and the second device includes a first source/drain layer, a channel layer and a second source/drain layer stacked on the substrate in sequence, and also a gate stack surrounding a periphery of the channel layer. The channel layer of the first device and the channel layer of the second device are substantially co-planar with each other, and the respective second source/drain layers of the first device and the second device are stressed differently.

A semiconductor device includes a substrate, an N-well area formed in the substrate, a first P-channel metal oxide semiconductor (PMOS) transistor having active regions formed in the N-well area, and a first N-channel metal oxide semiconductor (NMOS) transistor having active regions formed in the substrate. The first NMOS transistor includes a first N-type active region overlapping each of the substrate and the N-well area, when viewed from above a plane parallel to a top surface of the substrate.

An electronic device includes a plurality of CMOS control elements arranged in a two-dimensional array, where each CMOS control element of the plurality of CMOS control elements includes semiconductor devices. The plurality of CMOS control elements each including a PMOS semiconductor device portion comprising a high voltage PMOS device and a low voltage PMOS device and an NMOS semiconductor device portion comprising a high voltage NMOS device and a low voltage NMOS device. The plurality of CMOS control elements are arranged in the two-dimensional array such that the PMOS semiconductor device portion of a CMOS control element of the plurality of CMOS control elements is only adjacent to other PMOS semiconductor device portions of adjacent CMOS control elements of the plurality of CMOS control elements, and such that the NMOS semiconductor device portion of a CMOS control element of the plurality of CMOS control elements is only adjacent to other NMOS semiconductor device portions of adjacent CMOS control elements of the plurality of CMOS control elements.

A semiconductor chip includes a chip body including a signal input/output circuit, a chip pad structure disposed on a surface of the chip body, the chip pad structure including first and second chip pads, the two chip pads having different surface areas, and a chip pad selection circuit disposed in the chip body and electrically connected to the signal input/output circuit and the chip pad structure. The chip pad selection circuit is configured to selectively and electrically connect one of the first and second chip pads to the signal input/output circuit.

A method of forming a VNW SRAM device with a vertical cross-couple/PD/PU contact landed on a PD/PU gate and a bottom nRX and pRX interface and the resulting device are provided. Embodiments include forming a first and a second bottom nRX and pRX over an NW upon a p-sub, the pRX formed between the nRX; forming fins over the first nRX, the first pRX, the second pRX, and over the second nRX; forming a first GAA perpendicular to and over the second pRX and nRX, a second GAA perpendicular to and over the first nRX and pRX, a third GAA perpendicular to and over a portion the first nRX, and a fourth GAA perpendicular to and over a portion of the second nRX; and forming a first and a second metal gate contact on the first GAA, nRX, and pRX and on the second GAA, pRX, and nRX, respectively.

An integrated circuit having an epitaxial source and drain, which reduces gate burnout and increases switching speed so that is suitable for high voltage applications, is provided. The integrated circuit includes a semiconductor substrate having a high voltage N-well (HVNW) and a high voltage P-well (HVPW). The integrated circuit further includes a high-voltage device on the semiconductor substrate. The high-voltage device includes an epitaxial p-type source disposed in the HVNW, an epitaxial p-type drain disposed in the HVPW, and a gate arranged between the epitaxial p-type source and the epitaxial p-type drain on a surface of the semiconductor substrate.

A method of forming a VNW SRAM device with a vertical cross-couple/PD/PU contact landed on a PD/PU gate and a bottom nRX and pRX interface and the resulting device are provided. Embodiments include forming a first and a second bottom nRX and pRX over an NW upon a p-sub, the pRX formed between the nRX; forming fins over the first nRX, the first pRX, the second pRX, and over the second nRX; forming a first GAA perpendicular to and over the second pRX and nRX, a second GAA perpendicular to and over the first nRX and pRX, a third GAA perpendicular to and over a portion the first nRX, and a fourth GAA perpendicular to and over a portion of the second nRX; and forming a first and a second metal gate contact on the first GAA, nRX, and pRX and on the second GAA, pRX, and nRX, respectively.

Provided is a semiconductor memory device. The semiconductor memory device includes a peripheral circuit gate pattern on a first substrate, an impurity region in the first substrate and spaced apart from the peripheral circuit gate pattern, a cell array structure on the peripheral circuit gate pattern, a second substrate between the peripheral circuit gate pattern and the cell array structure, and a via that is in contact with the impurity region and disposed between the first substrate and the second substrate. The via electrically connects the first and second substrates to each other.