A method includes forming a first transistor including forming a first gate stack, epitaxially growing a first source/drain region on a side of the first gate stack, and performing a first implantation to implant the first source/drain region. The method further includes forming a second transistor including forming a second gate stack, forming a second gate spacer on a sidewall of the second gate stack, epitaxially growing a second source/drain region on a side of the second gate stack, and performing a second implantation to implant the second source/drain region. An inter-layer dielectric is formed to cover the first source/drain region and the second source/drain region. The first implantation is performed before the inter-layer dielectric is formed, and the second implantation is performed after the inter-layer dielectric is formed.

An SRAM array circuit in which a horizontal N-well of a well tap cell in a first row separated from a horizontal N-well of a well tap cell in a second row by a P-type substrate region is disclosed. The well tap cells include a bilateral P-type well tap disposed in the P-type substrate region between the horizontal N-wells in the first and second rows providing ground voltage to the P-type substrate on both sides of a column of well tap cells in the SRAM array circuit, rather than one P-type well tap for each side. Well tap cells without a vertical N-well reduces width, which corresponds to a reduction in width of the SRAM array circuit. The bilateral P-type well tap in a P-type implant region may include a plurality of folded fingers providing the ground voltage to the P-type substrate.

Integrated circuit devices may include a stacked structure including an upper transistor on a substrate and a lower transistor between the substrate and the upper transistor. The upper transistor may include an upper gate electrode, an upper active region in the upper gate electrode, and an upper gate insulator between the upper gate electrode and the upper active region. The upper active region may include an inner layer including a first semiconductor material and an outer layer that extends between the inner layer and the upper gate insulator and includes a second semiconductor material that is different from the first semiconductor material. The lower transistor may include a lower gate electrode, a lower active region in the lower gate electrode, and a lower gate insulator between the lower gate electrode and the lower active region.

A method for manufacturing a SRAM cell includes forming a first p-well in a semiconductor substrate; forming a first semiconductor fin extending within the first p-well; forming a first mask layer over the first semiconductor fin; patterning the first mask layer to expose a first channel region of the first semiconductor fin, while leaving a second channel region of the first semiconductor fin covered by the first mask layer; with the patterned first mask layer in place, doping the first channel region of the first semiconductor fin with a first dopant; after doping the first channel region of the first semiconductor fin, removing the first mask layer from the second channel region; and forming a first gate structure extending across the first channel region of the first semiconductor fin and a second gate structure extending across the second channel region of the first semiconductor fin.

An electronic circuit device includes a plurality of logic circuit elements which output an output signal by performing a preset operation on an input signal. Transistors constituting the logic circuit elements each have a gate electrode provided on a substrate, an insulating layer electrically insulating the gate electrode, a source electrode, a drain electrode, and a semiconductor layer. Input signal wiring, to which the input signal is applied, is connected to the gate electrode and provided inside the insulating layer on the substrate. Output signal wiring, from which the output signal is taken out, is connected to the source electrode or the drain electrode and provided inside the insulating layer on the substrate. An electronic circuit performing a preset processing is constituted with the plurality of logic circuit elements.

A method of manufacturing a memory device includes an nMOS region and a pMOS region in a substrate. A first gate is defined within the nMOS region, and a second gate is defined in the pMOS region. Disposable spacers are simultaneously defined about the first and second gates. The nMOS and pMOS regions are selectively masked, one at a time, and LDD and Halo implants performed using the same masks as the source/drain implants for each region, by etching back spacers between source/drain implant and LDD/Halo implants. All transistor doping steps, including enhancement, gate and well doping, can be performed using a single mask for each of the nMOS and pMOS regions. Channel length can also be tailored by trimming spacers in one of the regions prior to source/drain doping.

One illustrative method disclosed herein includes performing a first plurality of epitaxial deposition processes to form a first plurality of semiconductor materials selectively above the N-active region while masking the P-active region, performing a second plurality of epitaxial deposition processes to form a second plurality of semiconductor materials selectively above the P-active region while masking the N-active region, forming an N-type transistor in and above the N-active region and forming a P-type transistor in and above the P-active region.

Apparatuses and methods are disclosed. One such apparatus includes a well having a first type of conductivity formed within a semiconductor structure having a second type of conductivity. A boundary of the well intersects an active area of a tap to the well.

Structures and formation methods of a semiconductor device are provided. The semiconductor device includes a semiconductor substrate with a first lattice constant and having a PMOS region and an NMOS region. The semiconductor device further includes first and second fin structures over the PMOS region and NMOS region respectively. The first fin structure includes a buffer layer with a second lattice constant and a first channel layer. The lattice constant difference between the first channel layer and the buffer layer is smaller than that between the first channel layer and the semiconductor layer. The first channel layer has a third lattice constant, which is greater than the second lattice constant. The first lattice constant is greater than the second lattice constant. The second fin structure includes a second channel layer. The second channel layer has a fourth lattice constant which is less than the first lattice constant.

A method includes forming a first semiconductor fin and a second semiconductor fin over a substrate; forming a first gate structure over the substrate and crossing the first semiconductor fin; forming a second gate structure over the substrate and crossing the second semiconductor fin; forming a first gate spacer on a sidewall of the first gate structure; and forming a second gate spacer on a sidewall of the second gate structure, wherein in a top view, an outer sidewall of the first gate spacer farthest from the first gate structure is coterminous with an outer sidewall of the second gate spacer farthest from the second gate structure, and an inner sidewall of the first gate spacer in contact with the first gate structure is misaligned with an inner sidewall of the second gate spacer in contact with the second gate structure.