Transistors, devices, systems, and methods are discussed related to transistors including 2D material channels and heterogeneous 2D materials on the 2D material channels and coupled to source and drain metals, and their fabrication. The 2D material channels of the transistor allow for gate length scaling, improved switching performance, and other advantages and the heterogeneous 2D materials improve contact resistance of the transistor devices.

Embodiments described herein may be related to apparatuses, processes, and techniques related to a transistor structure that includes a monolayer within an oxide material on a gate metal. There may be a stack of these structures. The monolayer, which may include a semiconductor material, in embodiments may include multiple monolayer sheets that are stacked on top of each other. Other embodiments may be described and/or claimed.

A semiconductor device comprising an active region, and a gate having side portions and a middle portion, whereby the middle portion is arranged between the side portions. The side portions and the middle portion of the gate may be arranged over the active region. The middle portion may be horizontally wider than the side portions. A first gate contact may be arranged over the middle portion.

A stacked transistor architecture has a fin structure that includes lower and upper portions separated by an isolation region built into the fin structure. Upper and lower gate structures on respective upper and lower fin structure portions may be different from one another (e.g., with respect to work function metal and/or gate dielectric thickness). One example methodology includes depositing lower gate structure materials on the lower and upper channel regions, recessing those materials to re-expose the upper channel region, and then re-depositing upper gate structure materials on the upper channel region. Another example methodology includes depositing a sacrificial protective layer on the upper channel region. The lower gate structure materials are then deposited on both the exposed lower channel region and sacrificial protective layer. The lower gate structure materials and sacrificial protective layer are then recessed to re-expose upper channel region so that upper gate structure materials can be deposited.

A semiconductor device according to an embodiment may include a board, an insulation layer disposed on the board, a threshold voltage control layer disposed on the insulation layer, a first semiconductor layer disposed on the threshold voltage control layer, and a second semiconductor layer disposed on the threshold voltage control layer to cover a portion of the first semiconductor layer. A negative differential resistance device according to an embodiment has an advantageous effect in that the gate voltage enables a peak voltage to be freely controlled within an operation range of the device by forming the threshold voltage control layer.

The technology of this disclosure relates to an IGBT chip integrating a temperature sensor, and relates to the field of power device technologies, to improve accuracy of temperature monitoring of the IGBT chip. The IGBT chip integrating the temperature sensor includes a cell region, an emitter pad, a gate pad, a gate finger structure, a temperature sensing module, and a conductive shielding structure. The emitter pad is electrically connected to emitters of a plurality of IGBT cells. The gate finger structure is connected between the gate pad and gates of the plurality of IGBT cells. The temperature sensing module includes a temperature sensor, an anode pad, a cathode pad, and a metal lead. The temperature sensor and at least a part of the metal lead are located in the gate finger structure and are insulated from the gate finger structure.

A method for forming a high-electron mobility transistor is disclosed. A substrate is provided. A buffer layer is formed over the substrate. A GaN channel layer is formed over the buffer layer. An AlGaN layer is formed over the GaN channel layer. A GaN source layer and a GaN drain layer are formed on the AlGaN layer within a source region and a drain region, respectively. A gate recess is formed in the AlGaN layer between the source region and the drain region. A p-GaN gate layer is then formed in and on the gate recess.

An integrated circuit including a substrate with a fin extending from a surface of the substrate. The fin includes a source region, a drain region, and a body region. The source region includes an outer region having a first conductivity type complementary to a second conductivity type of an outer region of the body and an interior-positioned conductive region having the second conductivity type.

A semiconductor device includes a first region that contains a first conductive type impurity and is provided on a substrate, a second region that is provided in the first region and contains the first conductive type impurity at a higher concentration than the first region, a first structure that is provided on the substrate on one side of the second region in a first direction along the substrate and has a first sidewall at least on the second region side, a second structure that is provided on the substrate on the other side of the second region in the first direction and has a second sidewall at least on the second region side, and a contact that passes between the first and second sidewalls facing each other across the second region, extends to the second region, and is electrically connected to the second region.

A semiconductor structure comprises a substrate having a first side and a second side opposite the first side, and a gate for at least one transistor device disposed above the first side of the substrate. The structure may further include a buried power rail at least partially disposed in the substrate and a gate tie-down contact connecting the gate to the buried power rail from the second side of the substrate. The structure may further or alternatively include one or more source/drain regions disposed over the first side of the substrate, and a gate contact connecting to a portion of the gate from the second side of the substrate, the portion of the gate being adjacent to at least one of the one or more source/drain regions.