A method includes patterning a cavity through a first passivation layer of a first package component, the first package component comprising a first semiconductor substrate and bonding the first package component to a second package component. The second package component comprises a second semiconductor substrate and a second passivation layer. Bonding the first package component to the second package component comprises directly bonding the first passivation layer to the second passivation layer; and reflowing a solder region of a conductive connector disposed in the cavity to electrically connect the first package component to the second package component.

The present technology relates to a semiconductor apparatus and electronic equipment that are configured to make it possible to take measures more effectively against malfunctions arising from electromagnetic waves. A semiconductor apparatus includes a first base that transmits at least part of an electromagnetic wave, a first transistor group related to to-be-protected information, and an electromagnetic-wave attenuating unit that is provided in at least part of a region between the first base and the first transistor group and attenuates the electromagnetic wave. The present technology can be applied to a solid-state image pickup apparatus and the like, for example.

A semiconductor storage device includes a first substrate, a second substrate, a first stacked body, and a second stacked body. The first stacked body is provided between the first substrate and the second substrate and includes a first trace, a first pad connected to the first trace, and a first insulator. The second stacked body is provided between the first stacked body and the second substrate and includes a second trace, a second pad connected to the second trace, and a second insulator. The first pad includes a plurality of first electrode portions connected to the first trace. The first insulator is provided between the plurality of first electrode portions. The plurality of first electrode portions are bonded to the second pad.

A semiconductor structure includes a first chip and a second chip. A first conductive contact pad is paced apart from a second conductive contact pad and both of the first conductive contact pad and the second conductive contact pad are connected to a first conductive connecting line. A third conductive contact pad is spaced apart from a fourth conductive contact pad and both of the third conductive contact pad and the fourth conductive contact pad are connected to a second conductive connecting line. The first conductive contact pad and the second conductive contact pad are both in staggered connection with the third conductive contact pad, and the first conductive contact pad and the second conductive contact pad are both in staggered connection with the fourth conductive contact pad.

Disclosed embodiments include a semiconductor chip including a semiconductor substrate having a top surface with a top connection pad disposed therein, and a protection insulation layer comprising an opening therein, the protection insulation layer not covering at least a portion of the top connection pad, on the semiconductor substrate. The protection insulation layer may include: a bottom protection insulation layer, a cover insulation layer comprising a side cover part that covers at least a portion of a side surface of the bottom protection insulation layer and a top cover part disposed apart from the side cover part to cover at least a portion of a top surface of the bottom protection insulation layer. The protection insulation layer may further include a top protection insulation layer on the top cover part.

The present application discloses a semiconductor device with two stress-relieving structures and a method for fabricating the semiconductor device. The semiconductor device includes a semiconductor substrate, a first stress-relieving structure including a first conductive frame positioned above the semiconductor substrate and a plurality of first insulating pillars positioned within the conductive frame, a second stress-relieving structure including a plurality of second conductive pillars positioned above the first stress-relieving structure and a second insulating frame, the plurality of second conductive pillars is positioned within the second insulating frame, and a conductive structure including a supporting portion positioned above the second stress-relieving structure, a conductive portion positioned adjacent to the supporting portion, and a plurality of spacers attached to two sides of the conductive portion. The plurality of second conductive pillars is disposed correspondingly above the plurality of first insulating pillars, and the second insulating frame is disposed correspondingly above the first conductive frame.

A chip package on package structure includes a primary chip stack unit having pins insulated and spaced from each other on a first surface; a first bonding layer disposed on the first surface, where the first bonding layer includes bonding components insulated and spaced from each other, each bonding component includes a bonding part, and any two bonding parts are insulated and have a same cross-sectional area, and the bonding components are separately bonded to the pins; and secondary chip stack units, disposed on a surface of a side that is of the first bonding layer and that is away from the primary chip stack unit, where the secondary chip stack unit has micro bumps insulated and spaced from each other, and each of the micro bumps is bonded to one of the bonding components.

A semiconductor device includes a substrate, a dielectric layer, a plurality of dielectric patterns and a conductive pad. The substrate includes a first surface and a second surface opposite to the first surface. The dielectric layer is disposed at the first surface of the substrate, and the substrate is disposed between the dielectric layer and the second surface of the substrate. The dielectric patterns are disposed on the dielectric layer and between the first surface and the second surface of the substrate. The conductive pad is inserted between the plurality of dielectric patterns and extended into the dielectric layer.

In some examples, a system comprises a first component having a first surface, a first set of nanoparticles coupled to the first surface, and a first set of nanowires extending from the first set of nanoparticles. The system also comprises a second component having a second surface, a second set of nanoparticles coupled to the second surface, and a second set of nanowires extending from the second set of nanoparticles. The system further includes an adhesive positioned between the first and second surfaces. The first and second sets of nanowires are positioned within the adhesive.

A first conductive material having a first hardness is disposed within a recess or opening of a microelectronic component, in a first preselected pattern, and forms a first portion of an interconnect structure. A second conductive material having a second hardness different from the first hardness is disposed within the recess or opening in a second preselected pattern and forms a second portion of the interconnect structure.