According to one embodiment, a memory device includes a substrate, a memory layer, and a circuit layer. The memory layer includes first to third regions arranged in a first direction. The circuit layer includes first and second transfer regions, and first and second sense amplifier regions. The first and second transfer regions are shifted in the first direction and arranged in a second direction. In a third direction, the first sense amplifier region overlaps the first region, and the second sense amplifier region overlaps the second region. The first sense amplifier region and the first transfer region are arranged in the first direction, and the second sense amplifier region and the second transfer region are arranged in the first direction.

An image sensor package includes a first substrate portion including a first substrate and an upper wiring structure, the upper wiring structure including a stacked structure including a plurality of upper wiring patterns and a plurality of upper wiring vias. The image sensor package includes a second substrate portion including a second substrate and a lower wiring structure, the second substrate defining a trench portion and a via hole. The lower wiring structure includes a stacked structure including a plurality of lower wiring patterns and a plurality of lower wiring vias. The lower wiring structure is in contact with the upper wiring structure, and the plurality of lower wiring patterns include a plurality of lower patterns at different vertical levels. The image sensor package includes a via electrode portion covering an inner sidewall and a bottom surface of the via hole.

A display device includes a substrate including a first surface, a second surface opposite to the first surface, a first chamfered surface extending from one side of the first surface, a second chamfered surface extending from one side of the second surface, and a side surface connecting the first chamfered surface to the second chamfered surface, a pixel on the first surface of the substrate and including a light emitting element to emit light, a plurality of front pad parts on an edge of the first surface of the substrate and electrically connected to the pixel, a plurality of rear pad parts on an edge of the second surface of the substrate, and a plurality of side surface connection lines on the side surface of the substrate electrically connecting the plurality of front pad parts to the plurality of rear pad parts.

Integrated circuit (IC) structures methods of assembling an integrated circuit structure are described in which various etching sequences including plasma etching are utilized to remove direct bonded interfaces at die corners or edges that are at high-risk for non-bonding or delamination. In an embodiment, a laser etching operation is first performed to remove molding compound at local areas between adjacent components, following by a plasma dicing operation through the direct bonded structures.