A semiconductor device includes a signal processing circuit configured to generate an output signal, an output pad, an output line connecting the signal processing circuit to the output pad, the output signal from the signal processing circuit being output from the output pad through the output line, a shorting pad formed in the output line, a switch connected between the shorting pad and the output pad, and configured to connect the signal processing circuit to the output pad when the switch is on, and disconnect the signal processing circuit from the output pad when the switch is off, and a wiring line connecting the shorting pad to the output pad.

A semiconductor die includes a semiconductor body having first and second active portions. The first active portion includes first source regions. The second active portion includes second source regions. A gate structure extends from a first surface into the semiconductor body and has a longitudinal gate extension along a lateral first direction. A first load pad and the first source regions are electrically connected. A second load pad and the second source regions are electrically connected. A gap laterally separates the first and second load pads. A lateral longitudinal extension of the gap is parallel to the first direction or deviates therefrom by not more than 60 degree. A connection structure electrically connects the first and second load pads. The connection structure is formed in a groove extending from the first surface into the semiconductor body and/or in a wiring layer formed on the first surface.

A semiconductor device includes a gate interconnect, extending in a first direction, and configured to transmit an input signal, and a transistor including gate electrodes extending in a second direction perpendicular to the first direction, and spaced apart from one another, and connected to the gate interconnect, and source and drain regions alternately arranged along the first direction, so that each gate electrode is sandwiched between the source and drain region which are adjacent to each other. The semiconductor device also includes drain interconnects, arranged above the drain regions, and connected to the drain regions, respectively, an output interconnect, connected to the drain interconnects, and configured to transmit an output signal output from the drain regions, and stubs connected to the drain interconnects, respectively. At least one of the stubs is connected to one of the drain interconnects at an end opposite from the gate interconnect.

Example embodiments relate to power amplifier devices and semiconductor dies. One example power amplifier device includes a semiconductor die having a first input terminal and a first output terminal. The power amplifier device also includes a power transistor integrated on the semiconductor die and including a second input terminal and a second output terminal arranged at an input side and output side of the power transistor, respectively. The power transistor has an output capacitance. Further, the power amplifier device includes a shunt network that includes a plurality of first bondwires arranged in series with a first capacitor. The first capacitor is arranged near the input side of the power transistor. At one end of the shunt network one end of the plurality of first bondwires is coupled to the second output terminal. Additionally, the power amplifier includes a pair of coupled lines formed on the semiconductor die.

An increased accuracy in detecting deterioration of a semiconductor device can be achieved. A first metal pattern and a second metal pattern are connected to a controller. A bonding wire connects the first metal pattern and an emitter electrode. A linear conductor is connected between a first electrode pad and a second electrode pad. First bonding wires connect the first electrode pad and the second metal pattern. Second bonding wires connect the second electrode pad and the second metal pattern. The controller detects the deterioration of the semiconductor device when a potential difference between the first metal pattern and the second metal pattern is above a threshold.

A lead frame is provided with a die pad portion, a first lead portion, a second lead portion, and an extension portion extending from a corner portion neighborhood of the die pad portion to the outside of the die pad portion. The first lead portion has a first terminal portion and a first lead post portion positioned on a side closer to the die pad portion relative to the first terminal portion and electrically connected to the first terminal portion. The second lead portion has a second terminal portion, a third terminal portion positioned between the first terminal portion and the second terminal portion, and a second lead post portion positioned on a side closer to the die pad portion relative to the second terminal portion and the third terminal portion and electrically connected to the second terminal portion and the third terminal portion.

A semiconductor package including a die carrier, at least one semiconductor die disposed on the die carrier, a potting compound at least partially covering the die carrier and the semiconductor die, and at least one structure that is configured to withstand a change of the volume of the potting compound occurring under changed external conditions in a targeted manner.

A transistor device includes a semiconductor substrate having a first major surface and transistor cells formed therein. Each transistor cell includes a drift region of a first conductivity type, a body region of an opposing second conductivity type arranged on the drift region, a source region of the first conductivity type arranged on the body region, a columnar field plate trench extending into the first major surface and including a field plate, and a gate trench structure extending into the first major surface and including a gate electrode. A first metallization structure on the first major surface provides a first contact pad for wire bonding. At least one of depth and doping level of the body region is locally increased within the transistor cells located within one or more first areas of the first major surface. One or more of the first areas are located underneath the first contact pad.

In a described example, an apparatus includes a transistor formed on a semiconductor substrate, the transistor including: a transistor gate and an extended drain between the transistor gate and a transistor drain contact; a transistor source contact coupled to a source contact probe pad; a first dielectric layer covering the semiconductor substrate and the transistor gate; a source field plate on the first dielectric layer and coupled to a source field plate probe pad spaced from and electrically isolated from the source contact probe pad; and the source field plate capacitively coupled through the first dielectric layer to a first portion of the extended drain.

A chip package structure and an electronic equipment may reduce probability of short circuit failure during chip packaging and improve chip reliability. The chip package structure includes: a chip, a substrate, and a lead; the chip is disposed above the substrate; wherein the chip includes a pin pad and a test metal key, and the lead is configured to electrically connect the pin pad and the substrate; the test metal key is disposed in an edge region of the chip that is not under the lead.