Embodiments described herein provide techniques for using a stress absorption material to improve solder joint reliability in semiconductor packages and packaged systems. One technique produces a semiconductor package that includes a die on a substrate, where the die has a first surface, a second surface opposite the first surface, and a sidewall surface coupling the first surface to the second surface. The semiconductor package further includes a stress absorption material contacting the sidewall surface of the die and a molding compound separated from the sidewall surface of the die by the stress absorption material. The Young's modulus of the stress absorption material is lower than the Young's modulus of the molding compound. One example of a stress absorption material is a photoresist.

A light module has a carrier with a circuit die. On the top side of the carrier, a light-emitting diode die, and a charge store component are electrically connected to the conduction path terminal fields of a transistor by means of die-to-die bondings. The electrical connection between the two dies and the conduction path of the transistor is as short as possible. A terminal field is situated in each case on the top side of the two dies, which terminal fields are connected to one another using a first bonding wire. The charge store component is charged by means of a charging circuit which is electrically connected to the charge store component via a second bonding wire. The second bonding wire is longer than the first bonding wire. The light module may be part of a LIDAR apparatus.

The present application discloses a semiconductor chip, a semiconductor device and an electrostatic discharge (ESD) protection method for a semiconductor device. The semiconductor chip includes an electrical contact, an application circuit, and an ESD protection unit. The application circuit performs operations according to a one signal received by the electrical contact. The ESD protection unit is coupled to the electrical contact. The capacitance of the ESD protection unit is adjustable.

A semiconductor device and a method of manufacturing a semiconductor device are provided. The semiconductor device includes a carrier, an element, and a first electronic component. The element is disposed on the carrier. The first electronic component is disposed above the element. The element is configured to adjust a first bandwidth of a first signal transmitted from the first electronic component.

Disclosed is a semiconductor package comprising a first chip stack including on a substrate a plurality of first semiconductor chips in an offset stack structure and stacked to expose a connection region at a top surface of each of the first semiconductor chips, a second semiconductor chip on the substrate and horizontally spaced apart from the first chip stack, a spacer on the second semiconductor chip, and a second chip stack including third semiconductor chips in an offset stack structure on the first chip stack and the spacer. Each of the first semiconductor chips includes a first chip pad on the connection region and a first wire that extends between the first chip pad and the substrate. The first wire of an uppermost one of the first semiconductor chips is horizontally spaced apart from a lowermost one of the third semiconductor chips.

Disclosed is a semiconductor package comprising a first chip stack including on a substrate a plurality of first semiconductor chips in an offset stack structure and stacked to expose a connection region at a top surface of each of the first semiconductor chips, a second semiconductor chip on the substrate and horizontally spaced apart from the first chip stack, a spacer on the second semiconductor chip, and a second chip stack including third semiconductor chips in an offset stack structure on the first chip stack and the spacer. Each of the first semiconductor chips includes a first chip pad on the connection region and a first wire that extends between the first chip pad and the substrate. The first wire of an uppermost one of the first semiconductor chips is horizontally spaced apart from a lowermost one of the third semiconductor chips.

Electronic device package technology is disclosed. In one example, an electronic device comprises a die (18) having a bond pad (22); and a decoupling capacitor (14) mounted on the die (18) and electrically coupled to the die (18). A method for making an electronic device comprises mounting a decoupling capacitor (14) on a die (18); and electrically coupling the decoupling capacitor (14) to the die (18).

Apparatus and methods are provided for integrated circuit packages having a low z-height. In an example, a method can include mounting a first integrated circuit sub-package to a first package substrate wherein the sub-package substrate spans an opening of the first package substrate, mounting a second integrated circuit package to a second package substrate, and mounting the first package substrate with the second package substrate wherein the mounting includes locating a portion of the second integrated circuit package within the opening of the first package substrate.

Apparatus and methods are provided for integrated circuit packages having a low z-height. In an example, a method can include mounting a first integrated circuit sub-package to a first package substrate wherein the sub-package substrate spans an opening of the first package substrate, mounting a second integrated circuit package to a second package substrate, and mounting the first package substrate with the second package substrate wherein the mounting includes locating a portion of the second integrated circuit package within the opening of the first package substrate.

A wet etching method includes: providing a structure including an etching target film into a process bath containing a first etching solution having a first phosphoric acid concentration; performing a first etching process for etching the etching target film with the first etching solution in the process bath; providing a second etching solution having a second phosphoric acid concentration different from the first phosphoric acid concentration by changing a phosphoric acid concentration in the first etching solution; performing a second etching process for etching the etching target film with the second etching solution in the process bath; providing a third etching solution having a third phosphoric acid concentration different from the first and second phosphoric acid concentrations by changing a phosphoric acid concentration in the second etching solution; and performing a third etching process for etching the etching target film with the third etching solution in the process bath.