A memory device including a substrate including a substrate contact pad. The memory device includes a first memory die including a first power supply contact pad electrically coupled to the substrate contact pad and a first power supply circuit on the first memory die. The first memory die further includes a first electrostatic discharge (ESD) power clamp contact pad electrically coupled to the substrate contact pad and a first ESD power clamp circuit on the first memory die. The memory device further includes a second memory die including a second power supply contact pad electrically coupled to the substrate contact pad and a second power supply circuit on the second memory die and a second ESD power clamp contact pad electrically coupled to a second ESD power clamp circuit on the second memory die, wherein the second ESD power clamp contact pad is electrically disconnected from the substrate contact.

To improve yield and reliability at the time when a plurality of semiconductor elements used for a semiconductor device is arranged in parallel. A semiconductor device according to the present invention includes a first submodule which includes a first semiconductor element sandwiched between a first conductor and a second conductor and a first lead wire which transmits a control signal of the first semiconductor element, a second submodule which includes a second semiconductor element sandwiched between a third conductor and a fourth conductor and a second lead wire which transmits a control signal of the second semiconductor element, a fifth conductor which is formed to cover the first conductor and the third conductor and is bonded to the first conductor and the third conductor, and a sixth conductor which is formed to cover the second conductor and the fourth conductor and is bonded to the second conductor and the fourth conductor, in which the first conductor is formed so as not to overlap with a part of the first lead wire facing a first connection portion to be connected to the second lead wire.

An input feedthrough (8) and an output feedthrough (9) provided on the substrate (3) are wire-connected to an input pad (5) and an output pad (6) of the semiconductor chip (4) respectively. A metal seal ring (12) is provided on the substrate (3) is electrically connected to the metal plate (1) by a through-hole (15). A conductive cap (14) is bonded to the metal seal ring (12) and covers a place above the semiconductor chip (4). Both ends of an isolation metal wire (13) are electrically connected to the metal plate (1) and a loop comes into contact with a lower surface of the conductive cap (14). The isolation metal wire (13) constitutes an isolation wall partitioning an inner space into a region including the input feedthrough (8) and a region including the output feedthrough (9).

A disclosed circuit arrangement includes a flexible substrate. A layer of pressure sensitive adhesive (PSA) is directly adhered to a first major surface of the substrate. One or more metal foil pads and electrically conductive wire are attached directly on a surface of the PSA layer. The wire has a round cross-section and one or more portions directly connected to the one or more metal foil pads with one or more weld joints, respectively. An electronic device is attached directly on the surface of the layer of PSA and is electrically connected to the one or more portions of the round wire by one or more bond wires, respectively.

A method of forming a microelectronic device structure comprises coiling a portion of a wire up and around at least one sidewall of a structure protruding from a substrate. At least one interface between an upper region of the structure and an upper region of the coiled portion of the wire is welded to form a fused region between the structure and the wire.

A method of forming a microelectronic device structure comprises coiling a portion of a wire up and around at least one sidewall of a structure protruding from a substrate. At least one interface between an upper region of the structure and an upper region of the coiled portion of the wire is welded to form a fused region between the structure and the wire.

A semiconductor device according to an embodiment includes: a die pad including an upper surface; a semiconductor chip provided on the upper surface, the semiconductor chip including a rectangular shape, and the semiconductor chip including an element region, and a termination region surrounding the element region; a first electrode provided on the semiconductor chip; a second electrode provided on the semiconductor chip; a first connector provided above the termination region, the first connector including a portion covering each of the four sides of the rectangular shape when viewed from above, and the first connector being electrically connected to the first electrode; and a sealing resin sealing a periphery of the semiconductor chip and the first connector.

In a microelectronic package, a first wire bond wire is coupled to an upper surface of a substrate. A first bond mass is coupled to another end of the first wire bond wire. A second wire bond wire is coupled to the upper surface. A second bond mass is coupled to another end of the second wire bond wire. The first and second wire bond wires laterally jut out horizontally away from the upper surface of the substrate for at least a distance of approximately 2 to 3 times a diameter of both the first wire bond wire and the second wire bond wire. The first wire bond wire and the second wire bond wire are horizontal for the distance with respect to being co-planar with the upper surface within +/10 degrees.

In a conventional semiconductor chip, the source electrode and the sense pad electrode for current detection are provided separately and distanced from each other on the front surface of the semiconductor chip. The area occupied by the sense pad electrode must be several times the area of a MOSFET cell unit. Therefore, there is a problem that the area of the sense pad electrode is enlarged relative to the source electrode. Provided is a semiconductor device including a semiconductor substrate; a front surface electrode provided above the semiconductor substrate; a first wire for a first terminal connected to the front surface electrode; and a second wire for current sensing connected to the front surface electrode. A resistance of a path through which current flows through the second wire is higher than a resistance of a path through which the current flows through the first wire.

A disclosed circuit arrangement includes adhesive transfer tape having a layer of pressure sensitive adhesive (PSA) having a first major surface and a second major surface opposite the first major surface. One or more metal foil pads are attached directly to the second major surface of the layer of PSA. Electrically conductive round wire is attached directly to the second major surface of the layer of PSA. The wire has a round cross-section and one or more portions directly connected to the one or more metal foil pads with one or more weld joints, respectively. An electronic device is attached directly to the second major surface of the layer of PSA and is electrically connected to the one or more portions of the round wire by one or more bond wires, respectively.