A semiconductor device assembly including a semiconductor device having a plurality of pillars disposed on a backside surface of the semiconductor device; and a substrate, including: a solder mask layer disposed on a front side surface of the substrate, a plurality of extended bond pads disposed on the frontside surface of the substrate and surrounded by the solder mask layer, the plurality of extended bond pads each having a top surface higher than a top surface of the solder mask layer, and wherein the semiconductor device is directly attached to the substrate by bonding each of the plurality of pillars of the semiconductor device to the top surface of a corresponding one of the plurality of extended bond pads with a solder connection.

A method to produce a substrate suitable for diffusion bonding is described. A flexible dielectric substrate is provided. An alkaline modification is applied to the dielectric substrate to form a polyamic acid (PAA) anchoring layer on a surface of the dielectric substrate. A NiP seed layer is electrolessly plated on the PAA layer. Copper traces are plated within a photoresist pattern on the NiP seed layer. A surface finishing layer is electrolytically plated on the copper traces. The photoresist pattern and NiP seed layer not covered by the copper traces are removed to complete the substrate suitable for diffusion bonding.

A method to produce a substrate suitable for diffusion bonding is described. A flexible dielectric substrate is provided. An alkaline modification is applied to the dielectric substrate to form a polyamic acid (PAA) anchoring layer on a surface of the dielectric substrate. A NiP seed layer is electrolessly plated on the PAA layer. Copper traces are plated within a photoresist pattern on the NiP seed layer. A surface finishing layer is electrolytically plated on the copper traces. The photoresist pattern and NiP seed layer not covered by the copper traces are removed to complete the substrate suitable for diffusion bonding.

An electronic device and a method for producing an electronic device are disclosed. In an embodiment the electronic device includes a first component and a second component and a sinter layer connecting the first component to the second component, the sinter layer comprising a first metal, wherein at least one of the components comprises at least one contact layer which is arranged in direct contact with the sinter layer, which comprises a second metal different from the first metal and which is free of gold.

An electronic device and a method for producing an electronic device are disclosed. In an embodiment the electronic device includes a first component and a second component and a sinter layer connecting the first component to the second component, the sinter layer comprising a first metal, wherein at least one of the components comprises at least one contact layer which is arranged in direct contact with the sinter layer, which comprises a second metal different from the first metal and which is free of gold.

Provided herein may be an electronic device. The electronic device may include a substrate provided with a plurality of connecting pads including a first metal, a semiconductor chip on an area of the substrate, facing the connecting pads, and including a base substrate including a first surface facing the substrate, and a second surface opposite the first surface, a plurality of connecting terminals on the first surface, facing the connecting pads, and including a second metal, and a non-adhesive polymer layer on the second surface, and a conductive joining layer electrically connecting, and interposed between, respective ones of the connecting pads to the connecting terminals, and including a diffusion layer in which the first metal and the second metal are mixed.

Provided herein may be an electronic device. The electronic device may include a substrate provided with a plurality of connecting pads including a first metal, a semiconductor chip on an area of the substrate, facing the connecting pads, and including a base substrate including a first surface facing the substrate, and a second surface opposite the first surface, a plurality of connecting terminals on the first surface, facing the connecting pads, and including a second metal, and a non-adhesive polymer layer on the second surface, and a conductive joining layer electrically connecting, and interposed between, respective ones of the connecting pads to the connecting terminals, and including a diffusion layer in which the first metal and the second metal are mixed.

A semiconductor chip includes: a base substrate; a conductive pad on one surface of the base substrate; an insulating layer on the one surface of the base substrate and having an opening exposing a portion of the conductive pad; and a bump on the exposed portion of the conductive pad and on the insulating layer around the opening. The bump includes a plurality of concave portions corresponding to the opening and is arranged in a longitudinal direction of the bump.

A semiconductor chip includes: a base substrate; a conductive pad on one surface of the base substrate; an insulating layer on the one surface of the base substrate and having an opening exposing a portion of the conductive pad; and a bump on the exposed portion of the conductive pad and on the insulating layer around the opening. The bump includes a plurality of concave portions corresponding to the opening and is arranged in a longitudinal direction of the bump.

Generally discussed herein are systems, methods, and apparatuses that include conductive pillars that are about co-planar. According to an example, a technique can include growing conductive pillars on respective exposed landing pads of a substrate, situating molding material around and on the grown conductive pillars, removing, simultaneously, a portion of the grown conductive pillars and the molding material to make the grown conductive pillars and the molding material about planar, and electrically coupling a die to the conductive pillars.