A microelectronic device has a bump bond structure including an electrically conductive pillar with an expanded head, and solder on the expanded head. The electrically conductive pillar includes a column extending from an I/O pad to the expanded head. The expanded head extends laterally past the column on at least one side of the electrically conductive pillar. In one aspect, the expanded head may have a rounded side profile with a radius approximately equal to a thickness of the expanded head, and a flat top surface. In another aspect, the expanded head may extend past the column by different lateral distances in different lateral directions. In a further aspect, the expanded head may have two connection areas for making electrical connections to two separate nodes. Methods for forming the microelectronic device are disclosed.

In some examples, a multi-chip module (MCM), comprises a first and a second die-attach pad (DAP); a first die comprising a first set of microelectronic devices; a second die comprising a first capacitor and a second capacitor; and a third die comprising a second set of microelectronic devices, where the first and second dies are positioned on the first DAP, and the third die is positioned on the second DAP. The first set of microelectronic devices couples to the first capacitor via a first inter-die connection and the second set of microelectronic devices couples to the second capacitor via a second inter-die connection.

A microelectronic device has a bump bond structure including an electrically conductive pillar with an expanded head, and solder on the expanded head. The electrically conductive pillar includes a column extending from an I/O pad to the expanded head. The expanded head extends laterally past the column on at least one side of the electrically conductive pillar. In one aspect, the expanded head may have a rounded side profile with a radius approximately equal to a thickness of the expanded head, and a flat top surface. In another aspect, the expanded head may extend past the column by different lateral distances in different lateral directions. In a further aspect, the expanded head may have two connection areas for making electrical connections to two separate nodes. Methods for forming the microelectronic device are disclosed.

A process-invariant RC circuit is formed by patterning a metal layer using the same mask pattern to form a metal layer resistor and a metal layer capacitor. The same mask pattern results in the metal layer resistor and the metal layer capacitor each having a plurality of longitudinally-extending fingers having the same width and separation.

A semiconductor device assembly includes a substrate and a die coupled to the substrate, the die including a first contact pad electrically coupled to a first circuit on the die including an active circuit element, a first TSV electrically coupling the first contact pad to a first backside contact pad, and a second contact pad electrically coupled to a second circuit including only passive circuit elements. The substrate includes a substrate contact electrically coupled to the first and second contact pads. The assembly can further include a second die including a third contact pad electrically coupled to a third circuit including a second active circuit element, and a fourth contact pad electrically coupled to a fourth circuit on the second die including only passive circuit elements. The substrate contact can be electrically coupled to the third contact pad, but electrically disconnected from the fourth contact pad.

There is provided a solid-state imaging device capable of reducing the number of wiring layers and achieving downsizing with flexible layout designing. The solid-state imaging device includes a first semiconductor chip including a first electrode pad, first wiring connected to a first electrode pad through a first via, and a logic circuit, which are formed therein, and a second semiconductor chip connected to the first semiconductor chip and including a second electrode pad, second wiring connected to the second electrode pad through a second via, and a pixel array, which are formed therein. The first electrode pad and the second electrode pad are bonded as being shifted from each other on a bonding surface of the first semiconductor chip and the second semiconductor chip. A total length of the shifted and bonded first and second electrode pads in an extending-direction of the wiring having a longer pitch of the first and second wiring is twice or more of an extending-direction length of the wiring having the longer pith.

A semiconductor device has an interposer including a plurality of conductive vias formed through the interposer. A first semiconductor die is disposed over the interposer. A second semiconductor die is disposed over a first substrate. The first semiconductor die and second semiconductor die are power semiconductor devices. The interposer is disposed over the second semiconductor die opposite the first substrate. A second substrate is disposed over the first semiconductor die opposite the interposer. The first substrate and second substrate provide heat dissipation from the first semiconductor die and second semiconductor die from opposite sides of the semiconductor device. A plurality of first and second interconnect pads is formed in a pattern over the first semiconductor die and second semiconductor die. The second interconnect pads have a different area than the first interconnect pads to aid with alignment when stacking the assembly.

In order to inhibit forming cracks under a pad opening during ball bonding without increasing a chip size, a protective film includes a pad opening that exposes a part of a topmost layer metal film of the chip. A second metal film provided under the pad opening has a ring shape that defines a rectangular opening under the pad opening. The opening edge of the opening in the second metal film extends inwardly beyond the edge of the overlying pad opening. Vias connect the second metal film and the topmost layer metal film, and all of these vias are located outside the pad opening in plan view.

A semiconductor device assembly includes a substrate and a die coupled to the substrate, the die including a first contact pad electrically coupled to a first circuit on the die including an active circuit element, a first TSV electrically coupling the first contact pad to a first backside contact pad, and a second contact pad electrically coupled to a second circuit including only passive circuit elements. The substrate includes a substrate contact electrically coupled to the first and second contact pads. The assembly can further include a second die including a third contact pad electrically coupled to a third circuit including a second active circuit element, and a fourth contact pad electrically coupled to a fourth circuit on the second die including only passive circuit elements. The substrate contact can be electrically coupled to the third contact pad, but electrically disconnected from the fourth contact pad.

A semiconductor device includes: a semiconductor substrate with a first conductivity type; a semiconductor layer with a second conductivity type formed on the semiconductor substrate; a drain region with the second conductivity type and a source region with the second conductivity type formed to be spaced apart from each other in a surface region of the semiconductor layer; a drain buffer region with the second conductivity type formed in the semiconductor substrate directly under the drain region and in the semiconductor layer; a conductivity type well region with the second conductivity type formed on the semiconductor layer between the drain region and the drain buffer region; and a drain metal formed on the drain region to be electrically connected to the drain region and to overlap the well region in a plan view.