A package structure of a semiconductor device includes a first substrate, a second substrate, and a bonding layer. The bonding layer bonds the first substrate and the second substrate. The bonding layer includes an inner bonding pad pattern and an outer bonding pad pattern formed in a dielectric layer. The outer bonding pad pattern surrounds the inner bonding pad pattern. A first bonding pad density of the outer bonding pad pattern is greater than a second bonding pad density of the inner bonding pad pattern.

Provided is a semiconductor integrated circuit device including a plurality of columns of IO cells and having a configuration capable of reducing wiring delays without causing an increase in the area. The semiconductor integrated circuit device includes a first IO cell column group including an IO cell column closest to a periphery of a chip, and a second IO cell column group including an IO cell column adjacent to the first IO cell column group at the side closer to the core region. At least one of the first IO cell column group or the second IO cell column group includes two or more IO cell columns, and the two or more IO cell columns are aligned in the second direction such that the lower power supply voltage regions face each other or the higher power supply voltage regions face each other.

A method for bonding two superconducting integrated circuits (“chips”), such that the bonds electrically interconnect the chips. A plurality of indium-coated metallic posts may be deposited on each chip. The indium bumps are aligned and compressed with moderate pressure at a temperature at which the indium is deformable but not molten, forming fully superconducting connections between the two chips when the indium is cooled down to the superconducting state. An anti-diffusion layer may be applied below the indium bumps to block reaction with underlying layers. The method is scalable to a large number of small contacts on the wafer scale, and may be used to manufacture a multi-chip module comprising a plurality of chips on a common carrier. Superconducting classical and quantum computers and superconducting sensor arrays may be packaged.

A stacked device includes a stacked structure in which a plurality of semiconductors are electrically connected to each other, the semiconductor includes a surface on which a plurality of terminals are provided, the plurality of terminals include a terminal that bonds and electrically connects the semiconductors to each other and a terminal that bonds the semiconductors to each other and does not electrically connect the semiconductors to each other, an area ratio of the plurality of terminals on the surface of the semiconductor is 40% or higher, and an area ratio of the terminals that bond and electrically connect the semiconductors to each other among the plurality of terminals is lower than 50%.

A semiconductor memory device includes a cell wafer including a first plane and a second plane which are disposed to be adjacent to each other in a first direction and each include a plurality of memory cells; and a peripheral wafer including a row decoder which simultaneously controls the first and second planes and first and second page buffer circuits which control the first and second planes, respectively. The cell wafer includes, on one surface thereof bonded to the peripheral wafer, a first pad which is coupled in common with the first plane and the second plane, and the peripheral wafer includes, on one surface thereof bonded to the cell wafer, a second pad which is coupled with the row decoder and is bonded to the first pad.

A semiconductor apparatus includes included first and second semiconductor components which are stacked on each other. The first component includes a first insulating layer and a first plurality of metal pads. The second component includes a second insulating layer and a second plurality of metal pads. Each of the first plurality of metal pads and each of the second plurality of metal pads are bonded to each other to form each of a plurality of bonding portions. First and second openings along an edge of the apparatus and passing through a bonding face between the first and second insulating layer are formed in the apparatus. A first bonding portion between the first opening and the second opening of the plurality of bonding portions is arranged in a distinctive location.

A semiconductor device includes a substrate, a plurality of pads disposed over the substrate, and a solder mask disposed over the substrate. The substrate includes a pair of first edges parallel to each other, a pair of second edges orthogonal to the pair of first edges, and a center point. The solder mask includes four recess portions exposing an entire top surface and sidewalls of four of the pads in four corners of the regular array, and a plurality of second recess portions exposing a portion of a top surface of other pads in the regular array. A pad size of the four pads in the four corners of the regular array exposed through the first recess portions and a pad size of the other pads exposed through the second recess portions are the same.

A semiconductor device includes a substrate, a plurality of pads disposed over the substrate, and a solder mask disposed over the substrate. The substrate includes a pair of first edges parallel to each other, a pair of second edges orthogonal to the pair of first edges, and a center point. The solder mask includes four recess portions exposing an entire top surface and sidewalls of four of the pads in four corners of the regular array, and a plurality of second recess portions exposing a portion of a top surface of other pads in the regular array. A pad size of the four pads in the four corners of the regular array exposed through the first recess portions and a pad size of the other pads exposed through the second recess portions are the same.

A prepreg is used to fabricate a semiconductor package including a chip and a substrate to mount the chip thereon. The prepreg is in a semi-cured state. The substrate includes a cured product of the prepreg. The chip has: a first chip surface located opposite from the substrate; and a second chip surface located opposite from the first chip surface. The prepreg satisfies the relational expression: 0.9X.sub.2/X.sub.11.0 (I), where X.sub.1 is a coefficient of thermal expansion of the first chip surface of the chip before the chip is mounted on the substrate, and X.sub.2 is a coefficient of thermal expansion of the first chip surface of the chip after the chip has been mounted on the substrate.

A prepreg is used to fabricate a semiconductor package including a chip and a substrate to mount the chip thereon. The prepreg is in a semi-cured state. The substrate includes a cured product of the prepreg. The chip has: a first chip surface located opposite from the substrate; and a second chip surface located opposite from the first chip surface. The prepreg satisfies the relational expression: 0.9X.sub.2/X.sub.11.0 (I), where X.sub.1 is a coefficient of thermal expansion of the first chip surface of the chip before the chip is mounted on the substrate, and X.sub.2 is a coefficient of thermal expansion of the first chip surface of the chip after the chip has been mounted on the substrate.