H01L2224/08221

SEMICONDUCTOR DEVICE

A semiconductor element extends along a first plane, includes opposing first and second surfaces and a third surface extending between respective ends of the first and second surfaces, and includes first and second electrode pads respectively provided in regions including the first and second surfaces. A first conductor is in contact with a first electrode pad and a first electrode. A second conductor is in contact with the second electrode pad and a second electrode. An insulating cover includes a first portion covering the third surface, a second portion connected to the first portion and opposing the first surface, and a third portion connected to the first portion, opposing the second surface, and sandwiching the semiconductor element with the second portion.

INTEGRATED COOLING ASSEMBLIES INCLUDING SIGNAL REDISTRIBUTION AND METHODS OF MANUFACTURING THE SAME
20250253209 · 2025-08-07 ·

The present disclosure provides for integrated cooling systems including an integrated cooling assembly. The integrated cooling assembly includes a semiconductor device having an active side and a backside opposite the active side. The integrated cooling assembly includes a plurality of stacked and bonded layers that collectively form a cold plate, the cold plate comprising (i) a first side and a second side opposite the first side, the first side having a recessed surface, a support feature that extends downwardly from the recessed surface, and sidewalls that extend downwardly from the recessed surface and surround recessed surface and the support feature, and (ii) a first interconnect vertically disposed through the support feature, where the first interconnect is electrically coupled to the semiconductor device through direct hybrid bonds formed between the cold plate and the semiconductor device.

BONDING STRUCTURE AND PACKAGE STRUCTURE

A bonding structure and a package structure are provided. The bonding structure includes a first pad and a wire bundle structure. The wire bundle structure is protruded from the first pad and tapering away from the first pad. The wire bundle structure includes a first portion and a second portion, the first portion is closer to the first pad than the second portion is, and in a cross-sectional view perspective, a width of a first void in the first portion is less than a width of a second void in the second portion.

ELECTRONIC DEVICE COOLING STRUCTURES BONDED TO SEMICONDUCTOR ELEMENTS

A cooling structure having a first side and a second side opposite the first side can be formed through a method comprising, forming an inlet and an outlet in a first substrate, forming at least one channel on the second side of the first substrate, wherein the at least one channel is in fluid communication with the inlet and outlet, forming a plurality of nozzles on the first side of a second substrate, and forming a plurality of channels on the second side of the second substrate opposite the first side of the second substrate. The plurality of channels is aligned with the plurality of nozzles, and the second side of the first substrate is bonded to the first side of the second substrate.

Apparatus for bonding chip band and method for bonding chip using the same

A chip bonding apparatus, includes: a body; a substrate conveyor installed on the body to transfer a substrate; a bonding head conveyor disposed on an upper surface of the body; an alignment unit installed on the body and adjusting a position of the substrate and a position of a chip; and a bonding head installed in the bonding head conveyor and moved and attaching a chip therebelow, wherein the bonding head is provided with a chip bonding unit for attaching the chip in a lower end portion thereof, wherein the chip bonding unit, includes: a chip bonding unit body having an installation groove formed therein; a pushing module having one end portion inserted in the installation groove; and an attachment module having a deformable member deformed by the pushing module; wherein the deformable member is provided with a deformable portion which is deformed by being pressed by the pushing module, and having a bottom surface in contact and exerting a force on the chip to bond the chip to the substrate.

Die bonding systems, and methods of using the same

A die bonding system including a bond head assembly for bonding a die to a substrate is provided. The die includes a first plurality of fiducial markings, and the substrate includes a second plurality of fiducial markings. The die bonding system also includes an imaging system configured for simultaneously imaging one of the first plurality of fiducial markings and one of the second plurality of fiducial markings along a first optical path while the die is carried by the bond head assembly. The imaging system is also configured for simultaneously imaging another of the first plurality of fiducial markings and another of the second plurality of fiducial markings along a second optical path while the die is carried by the bond head assembly. Each of the first and second optical paths are independently configurable to image any area of the die including one of the first plurality of fiducial markings.

Method for bonding chips to a substrate by direct bonding

A process for bonding chips to a substrate by direct bonding includes providing a support with which the chips are in contact, the chips in contact with the support being separate from one another. This bonding process also includes forming a liquid film on one face of the substrate, bringing the chips into contact with the liquid film, where the action of bringing the chips into contact with the liquid film causes attraction of the chips toward the substrate, and evaporating the liquid film in order to bond the chips to the substrate by direct bonding.

PACKAGES WITH POWER SWITCHES AND POWER USER CIRCUITS SEPARATED IN DIFFERENT DIES

A method includes forming a first device die and a second device die. The first device die includes a first integrated circuit, and a first bond pad at a first surface of the first device die. The first integrated circuit is electrically connected to the first bond pad. The second device die includes a power switch that includes a first source/drain region, a second source/drain region, a second bond pad electrically connecting to the first source/drain region, and a third bond pad electrically connecting to the second source/drain region. The method further includes bonding the first device die with the second device die to form a package, with the first bond pad bonding to the third bond pad, and bonding the package to a package component.

SEMICONDUCTOR PACKAGE AND METHOD
20250329608 · 2025-10-23 ·

A device includes a first semiconductor device including a first bonding layer; a second semiconductor device bonded to the first bonding layer of the first semiconductor device; thermal structures disposed beside the second semiconductor device and on the first bonding layer, wherein the thermal structures include a conductive material, wherein the thermal structures are electrically isolated from the first semiconductor device and from the second semiconductor device; an encapsulant disposed on the first bonding layer, wherein the encapsulant surrounds the second semiconductor device and surrounds the thermal structures; and a second bonding layer disposed over the encapsulant, the thermal structures, and the second semiconductor device.

SEMICONDUCTOR DEVICE

A semiconductor device including a first semiconductor die, a second semiconductor die, thermal silicon substrates and an encapsulation is provided. The second semiconductor die is disposed on and electrically connected to the first semiconductor die. The thermal silicon substrates are disposed on the first semiconductor die, wherein the thermal silicon substrates are spaced apart from the second semiconductor die. The encapsulation is disposed on the first semiconductor die. The encapsulation encapsulates the second semiconductor die and the thermal silicon substrates. The encapsulation includes a filling material layer and an insulator, wherein the filling material layer is disposed on the first semiconductor die and located between the second semiconductor die and thermal silicon substrates, and the filling material layer is spaced apart from the second semiconductor die and the thermal silicon substrates by the insulator.