A semiconductor chip includes a semiconductor body having an active device region, one or more metallization layers insulated from the semiconductor body and configured to carry one or more of ground, power and signals to the active device region, and a plurality of contact terminals formed in or disposed on an outermost one of the metallization layers and configured to provide external electrical access to the semiconductor chip. A minimum distance between adjacent ones of the contact terminals is defined for the semiconductor chip. One or more groups of adjacent ones of the contact terminals have an electrical or functional commonality and a pitch less than the defined minimum distance. A single shared solder joint can connect two or more of the contact terminals of the semiconductor chip to one or more of contact terminals of a substrate such as a circuit board, an interposer or another semiconductor chip.

A semiconductor device including: a first formation site and a second formation site for forming a first conductive bump and a second conductive bump; when a first environmental density corresponding to the first formation site is greater than a second environmental density corresponding to the second formation site, a cross sectional area of the second formation site is greater than a cross sectional area of the first formation site; wherein the first environmental density is determined by a number of formation sites around the first formation site in a predetermined range and the second environmental density is determined by a number of formation sites around the second formation site in the predetermined range; wherein a first area having the first environmental density forms an ellipse layout while a second area having the second environmental density forms a strip layout surrounding the ellipse layout.

A die includes a substrate, a metal pad over the substrate, and a passivation layer covering edge portions of the metal pad. A metal pillar is formed over the metal pad. A portion of the metal pillar overlaps a portion of the metal pad. A center of the metal pillar is misaligned with a center of the metal pad.

A die includes a substrate, a metal pad over the substrate, and a passivation layer covering edge portions of the metal pad. A metal pillar is formed over the metal pad. A portion of the metal pillar overlaps a portion of the metal pad. A center of the metal pillar is misaligned with a center of the metal pad.

A die includes a substrate, a metal pad over the substrate, and a passivation layer covering edge portions of the metal pad. A metal pillar is formed over the metal pad. A portion of the metal pillar overlaps a portion of the metal pad. A center of the metal pillar is misaligned with a center of the metal pad.

A semiconductor chip includes a semiconductor body having an active device region, one or more metallization layers insulated from the semiconductor body and configured to carry one or more of ground, power and signals to the active device region, and a plurality of contact terminals formed in or disposed on an outermost one of the metallization layers and configured to provide external electrical access to the semiconductor chip. A minimum distance between adjacent ones of the contact terminals is defined for the semiconductor chip. One or more groups of adjacent ones of the contact terminals have an electrical or functional commonality and a pitch less than the defined minimum distance. A single shared solder joint can connect two or more of the contact terminals of the semiconductor chip to one or more of contact terminals of a substrate such as a circuit board, an interposer or another semiconductor chip.

A semiconductor device including: a first formation site and a second formation site for forming a first conductive bump and a second conductive bump; when a first environmental density corresponding to the first formation site is greater than a second environmental density corresponding to the second formation site, a cross sectional area of the second formation site is greater than a cross sectional area of the first formation site; wherein the first environmental density is determined by a number of formation sites around the first formation site in a predetermined range and the second environmental density is determined by a number of formation sites around the second formation site in the predetermined range; wherein a first area having the first environmental density forms an ellipse layout while a second area having the second environmental density forms a strip layout surrounding the ellipse layout.

A semiconductor device including: a first formation site and a second formation site for forming a first conductive bump and a second conductive bump; when a first environmental density corresponding to the first formation site is greater than a second environmental density corresponding to the second formation site, a cross sectional area of the second formation site is greater than a cross sectional area of the first formation site; wherein the first environmental density is determined by a number of formation sites around the first formation site in a predetermined range and the second environmental density is determined by a number of formation sites around the second formation site in the predetermined range; wherein a first area having the first environmental density forms an ellipse layout while a second area having the second environmental density forms a strip layout surrounding the ellipse layout.