A semiconductor package includes a substrate portion including a core layer having a device accommodating portion formed therein, and a buildup layer stacked on each of opposing sides of the core layer; an electronic device disposed in the device accommodating portion; and heat dissipating conductors disposed in the buildup layer to externally emit heat generated by the electronic device.

The present disclosure relates to evaluation of a mounted resistor formed between a bump and electrodes.

A display device of the present disclosure includes a display panel formed in a transparent substrate and a display driver driving the display panel. A plurality of bumps is formed on a connection surface of the display driver. A plurality of electrodes is formed on the transparent substrate and corresponds in position to the plurality of bumps. COG mounting enables the bumps on the display driver side to electrically connect to the electrodes on the transparent substrate side. On the connection surface of the display driver, the bumps, which are for use in signal transmission, further include a first evaluation-oriented bump (TA[i]) and a second evaluation-oriented bump (TB[i]). Evaluation-oriented electrodes (EL[i]) are disposed on the transparent substrate and correspond in position to the first evaluation-oriented bump (TA[i]) and the second evaluation-oriented bump (TB[i]). Upon completion of COG mounting, a resistance value evaluation circuit (140a) disposed on the display driver generates evaluation signal (DET[i]) corresponding to resistance value (RA[i]+RB[i]) between the evaluation-oriented electrodes and the first and second evaluation-oriented bumps.

A method of manufacturing a semiconductor device may include forming an adhesive film on a surface of a semiconductor chip, mounting the semiconductor chip on a substrate such that the adhesive film contacts an upper surface of the substrate, and bonding the semiconductor chip and the substrate curing the adhesive film by simultaneously performing a thermo-compression process and an ultraviolet irradiation process on the adhesive film disposed between the substrate and the semiconductor chip.

A semiconductor device includes a first electronic component, a second electronic component, a third electronic component, a plurality of first interconnection structures, and a plurality of second interconnection structures. The second electronic component is between the first electronic component and the third electronic component. The first interconnection structures are between and electrically connected to the first electronic component and the second electronic component. Each of the first interconnection structures has a length along a first direction substantially parallel to a surface of the first electronic component and a width along a second direction substantially parallel to the surface and substantially perpendicular to the first direction. The length is larger than the width. The second interconnection structures are between and electrically connected to the second electronic component and the third electronic component.

A semiconductor chip is mounted on a mounting substrate. The semiconductor chip includes plural first bumps on a surface facing the mounting substrate. The plural first bumps each have a shape elongated in a first direction in plan view and are arranged in a second direction perpendicular to the first direction. The mounting substrate includes, on a surface on which the semiconductor chip is mounted, at least one first land connected to the plural first bumps. At least two first bumps of the plural first bumps are connected to each first land. The difference between the dimension of the first land in the second direction and the distance between the outer edges of two first bumps at respective ends of the arranged first bumps connected to the first land is 20 m or less.

A semiconductor chip is mounted on a mounting substrate. The semiconductor chip includes plural first bumps on a surface facing the mounting substrate. The plural first bumps each have a shape elongated in a first direction in plan view and are arranged in a second direction perpendicular to the first direction. The mounting substrate includes, on a surface on which the semiconductor chip is mounted, at least one first land connected to the plural first bumps. At least two first bumps of the plural first bumps are connected to each first land. The difference between the dimension of the first land in the second direction and the distance between the outer edges of two first bumps at respective ends of the arranged first bumps connected to the first land is 20 m or less.

Millimeter wave (mmWave) technology, apparatuses, and methods that relate to transceivers, receivers, and antenna structures for wireless communications are described. The various aspects include co-located millimeter wave (mmWave) and near-field communication (NFC) antennas, scalable phased array radio transceiver architecture (SPARTA), phased array distributed communication system with MIMO support and phase noise synchronization over a single coax cable, communicating RF signals over cable (RFoC) in a distributed phased array communication system, clock noise leakage reduction, IF-to-RF companion chip for backwards and forwards compatibility and modularity, on-package matching networks, 5G scalable receiver (Rx) architecture, among others.

A semiconductor device assembly that includes a substrate having a first side and a second side, the first side having at least one dummy pad and at least one electrical pad. The semiconductor device assembly includes a first semiconductor device having a first side and a second side and at least one electrical pillar extending from the second side. The electrical pillar is connected to the electrical pad via solder to form an electrical interconnect. The semiconductor device assembly includes at least one dummy pillar extending from the second side of the first semiconductor device and a liquid positioned between an end of the dummy pillar and the dummy pad. The surface tension of the liquid pulls the dummy pillar towards the dummy pad. The surface tension may reduce or minimize a warpage of the semiconductor device assembly and/or align the dummy pillar and the dummy pad.

A lateral power semiconductor device with a metal interconnect layout for low on-resistance. The metal interconnect layout includes first, second, and third metal layers, each of which include source bars and drain bars. Source bars in the first, second, and third metal layers are electrically connected. Drain bars in the first, second, and third metal layers are electrically connected. In one embodiment, the first and second metal layers are parallel, and the third metal layer is perpendicular to the first and second metal layers. In another embodiment, the first and third metal layer are parallel, and the second metal layer is perpendicular to the first and third metal layers. A nonconductive layer ensures solder bumps electrically connect to only source bars or only drain bars. As a result, a plurality of available pathways exists and enables current to take any of the plurality of available pathways.

A lateral power semiconductor device with a metal interconnect layout for low on-resistance. The metal interconnect layout includes first, second, and third metal layers, each of which include source bars and drain bars. Source bars in the first, second, and third metal layers are electrically connected. Drain bars in the first, second, and third metal layers are electrically connected. In one embodiment, the first and second metal layers are parallel, and the third metal layer is perpendicular to the first and second metal layers. In another embodiment, the first and third metal layer are parallel, and the second metal layer is perpendicular to the first and third metal layers. A nonconductive layer ensures solder bumps electrically connect to only source bars or only drain bars. As a result, a plurality of available pathways exists and enables current to take any of the plurality of available pathways.