The present disclosure relates to a wafer level chip scale package with a rhombus shape which includes a semiconductor chip with a rhombus shape and a solder ball array including a plurality of solder balls formed on one surface of the semiconductor chip. Among four interior angles of the semiconductor chip, two of the four interior angles facing each other in a short diagonal direction are approximately 120?, and two of the four interior angles facing each other in a long diagonal direction are approximately 60?.

The present disclosure relates to an integrated chip structure having a first substrate including a plurality of transistor devices disposed within a semiconductor material. An interposer substrate includes vias extending through a silicon layer. A copper bump is disposed between the first substrate and the interposer substrate. The copper bump has a sidewall defining a recess. Solder is disposed over the copper bump and continuously extending from over the copper bump to within the recess. A conductive layer is disposed between the first substrate and the interposer substrate and is separated from the copper bump by the solder.

Provided is a disclosure for optimizing the number of semiconductor devices on a wafer/substrate. The optimization comprises laying out, cutting, and packaging the devices efficiently.

In some embodiments, the present disclosure relates to a method of integrated chip bonding. The method is performed by forming a metal layer on a substrate, and forming a solder layer on the metal layer. The solder layer is reflowed. The metal layer and the solder layer have sidewalls defining a recess that is at least partially filled by the solder layer during reflowing of the solder layer.

Provided is a disclosure for optimizing the number of semiconductor devices on a wafer/substrate. The optimization comprises laying out, cutting, and packaging the devices efficiently.

An image pickup apparatus includes: an image pickup device including a light receiving surface, an opposite surface, and an inclined surface, and provided with light receiving surface electrodes formed on the light receiving surface; cover glass joined so as to cover the light receiving surface; and a wiring board including second bond electrodes, wherein back surfaces of the light receiving surface electrodes being exposed to an opposite surface side, extended wiring patterns extended from the respective back surfaces of the light receiving surface electrodes through the inclined surface to the opposite surface, each of the extended wiring patterns including a first bond electrode, and the first bond electrode and the second bond electrode being bonded through a bump.

A display device includes, on a TFT substrate, a driver IC having a first bump and a second bump, a first terminal and a second terminal connecting respectively to the first bump and the second bump, and wiring interconnecting the first terminal and the second terminal. The driver IC also includes a resistance detection circuit that detects resistance between the first bump and the second bump.

A display device includes, on a TFT substrate, a driver IC having a first bump and a second bump, a first terminal and a second terminal connecting respectively to the first bump and the second bump, and wiring interconnecting the first terminal and the second terminal. The driver IC also includes a resistance detection circuit that detects resistance between the first bump and the second bump.

A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wiring to reduce irregularities caused by the wiring and space in the top wiring layer. A surface protection film formed to cover the top wiring layer is flattened by CMP.

In some embodiments, the present disclosure relates to a semiconductor structure. The semiconductor structure may have a first conductive structure and a second conductive structure arranged over a first substrate. A bump structure is arranged between the first conductive structure and a second substrate. A solder layer is configured to electrically couple the first conductive structure and the bump structure. The bump structure has a recess that is configured to reduce a protrusion of the solder layer in a direction extending from the first conductive structure to the second conductive structure.